• Title/Summary/Keyword: Active diode

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Design and Fabrication of a High Speed Blocking Device of Transient Overvoltages for info-communication Facilities (정보통신기기용 과도이상전압 고속도차단장치의 설계 및 제작)

  • Gil, Gyeong-Seok
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.48 no.1
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    • pp.51-56
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    • 1999
  • This paper presents a new transient overvoltage blocking device (TOBD) for info-communication facilities with low power and high frequency bandwidth. Conventional protection devices have some problems such as low frequency bandwidth, low energy capacity and high remnant voltage. In order to improve these limitations, thehybrid type TOBD, which consists of a gas tube, avalanche diodes and junction typefield effect transistors (JFETs), was designed and fabricated. The TOBD differs from the conventional protection devices in configuration, and JFETs were used as an active non-linear element and a high speed switching diode with low capacitance limits high current. Therefore the avalanche dilde with low energy capacity are protected fromthe high current, and the TOBD has a very small input capacitance. From the performance test using combination surge generator, which can produce $1.2/50\mus\;4.2kV_{max}\; 8/20\mus\; 2.1kA_{max}$, it is confirmed that proposed TOBD has an excellent protection performance in tight clamping voltage and limiting current characteristics.

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Dynamic range expansion of active pixel sensor with output voltage feedback (출력 전압 피드백을 통한 능동 화소 센서의 동작 범위 확장)

  • Seo, Min-Woong;Seo, Sang-Ho;Kong, Jae-Sung;Shin, Jang-Kyoo
    • Journal of Sensor Science and Technology
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    • v.18 no.4
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    • pp.274-279
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    • 2009
  • In this paper, a wide dynamic range active pixel sensor(APS) with output voltage feedback structure has been designed by a 2-poly 4-metal 0.35 $\mu$m standard CMOS technology. We presented a novel APS with output voltage feedback, which exhibits a wide dynamic range. The dynamic range increases at the cost of an additional diode and an additional MOSFET. The output voltage feedback structure enables the control of the output voltage level by itself, as incident light power varies. It is confirmed that the light level which the output voltage level of proposed APS is saturated is about 120,000 lux, which is higher than that of a conventional 3-transistor APS.

Development of 40 inch Full Color AMOLED Display

  • Chung, K.;Huh, J.M.;Sung, U.C.;Chai, C.C.;Lee, J.H.;Kim, H.;Lee, S.P.;Goh, J.C.;Park, S.K.;Ko, C.S.;Koh, B.S.;Shin, K.J.;Choi, J.H.;Jung, J.H.;Kim, N.D.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07a
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    • pp.781-784
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    • 2005
  • We have developed technology to fabricate large-size active matrix organic light-emitting diode (AMOLED) displays with good color purity. Using these innovations, we have developed a 40inch diagonal WXGA AMOLED full color display. Because the TFT circuitry occupies a large portion of the pixel structure, an efficient white emission OLED is essential to integrate the device onto the active matrix backplane. The development of these technologies enables OLED displays to fulfill the requirements for larger size applications such as HDTVs

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A Study on Mass Transport for InGaAsP/InP Buried Heterostructure Laser Diode (매립형 InGaAsP/InP 레이저 다이오드 제작을 위한 질량 이동 현상에 관한 연구)

  • Choi, In-Hoon;Lee, Jong-Min;Sin, Dong-Suk;Singer, K.E.
    • Korean Journal of Materials Research
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    • v.8 no.5
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    • pp.419-423
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    • 1998
  • The conditions for optimizing mass transport for making buried heterostructure (BH) InGaAsP/lnP lasers are discussed. The double heterostructure InGaAsP/lnP laser structures were grown by Liquid Phase Epitaxy (LPE) and etched into mesas. The active layer was selectively etched along [llO] and the mass transport was carried out in the LPE reactor to cover the sides of the active layer and form a BH structure. The threshold temperature for the appreciable mass transport is measured to be 670$670^{\circ}C$ when the holding time is set to 40 min. The width of the region re¬filled by mass transport is observed to increase as the temperature increases.

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4.1” Transparent QCIF AMOLED Display Driven by High Mobility Bottom Gate a-IGZO Thin-film Transistors

  • Jeong, J.K.;Kim, M.;Jeong, J.H.;Lee, H.J.;Ahn, T.K.;Shin, H.S.;Kang, K.Y.;Park, J.S.;Yang, H,;Chung, H.J.;Mo, Y.G.;Kim, H.D.;Seo, H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.145-148
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    • 2007
  • The authors report on the fabrication of thin film transistors (TFTs) that use amorphous indium-gallium-zinc oxide (a-IGZO) channel and have the channel length (L) and width (W) patterned by dry etching. To prevent the plasma damage of active channel, a 100-nm-thckness $SiO_{x}$ by PECVD was adopted as an etch-stopper structure. IGZO TFT (W/L=10/50${\mu}m$) fabricated on glass exhibited the high performance mobility of $35.8\;cm^2/Vs$, a subthreshold gate voltage swing of $0.59V/dec$, and $I_{on/off}$ of $4.9{\times}10^6$. In addition, 4.1” transparent QCIF active-matrix organic light-emitting diode display were successfully fabricated, which was driven by a-IGZO TFTs.

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A New AMOLED Pixel Circuit Employing a-Si:H TFTs for High Aperture Ratio

  • Shin, Hee-Sun;Lee, Jae-Hoon;Jung, Sang-Hoon;Kim, Chang-Yeon;Han, Min-Koo
    • Journal of Information Display
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    • v.6 no.2
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    • pp.12-15
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    • 2005
  • We propose a new pixel design for active matrix organic light emitting diode (AM-OLED) displays using hydrogenated amorphous silicon thin-film transistors (a-Si:H TFTs). The pixel circuit is composed of five TFTs and one capacitor, and employs only one additional control signal line. It is verified by SPICE simulation results that the proposed pixel compensates the threshold voltage shift of the a-Si:H TFTs and OLED.

Poly-Si TFT Technology

  • Noguchi, Takashi;Kim, D.Y.;Kwon, J.Y.;Park, Y.S.
    • Information Display
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    • v.5 no.1
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    • pp.25-30
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    • 2004
  • Poly-Si TFT(Thin Film Transistor) technology are reviewed and discussed. Poly-Si TFTs fabricated on glass using low-temperature process were studied extensively for the application to LCD (Liquid Crystal Display) as well as to OLED(Organic Light Emitting Diode) Display. Currently, one of the application targets of the poly-Si TFT is emphasized on the highly functional SOG(System on Glass). Improvement of device characteristics such as an enhancement of carrier mobility has been studied intensively by enlarging the grain size. Reduction of the voltage and shrinkage of the device size are the trend of AM FPD(Active Matrix Flat Panel Display) as well as of Si LSI, which will arise a peculiar issue of uniformity for the device performance. Some approaches such as nucleation control of the grain seed or lateral grain growth have been tried, so far.

Trends on Display Technology and Standardization (디스플레이 기술 및 표준화 동향)

  • Ahn, S.D.;Kang, S.Y.;Cho, S.H.
    • Electronics and Telecommunications Trends
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    • v.30 no.6
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    • pp.1-11
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    • 2015
  • 최근 디스플레이 산업은 Liquid Crystal Display(LCD)산업의 성숙 및 동북아 선도업체를 중심으로 과점화 양상에 따라, 국가 간 주도권 경쟁을 위한 경쟁 치열해지고 있으며, 디스플레이 시장정체 극복 및 경쟁국 간의 기술시장의 우위를 선점하기 위하여 차세대 디스플레이 개발을 추진하고 있다. 차세대 디스플레이는 기능이 다양화 된 디스플레이, Active Matrix Organic Light Emitting Diode(AMOLED), 플렉서블 디스플레이, 투명 디스플레이와 같은 새로운 디스플레이 및 자동차 교육, 광고 의료 분야와 융합되는 신시장 창출형 융합 디스플레이로 발전하고 있다. 본고에서는 차세대 디스플레이의 최근 기술동향 및 디스플레이 국제 표준 기술동향 및 이슈를 살펴보고자 한다.

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A Novel Hybrid Five-Level Inverter for Medium-Voltage Applications (중전압 응용을 위한 새로운 하이브리드 5-레벨 인버터)

  • Dao, Ngoc Dat;Lee, Dong-Choon
    • Proceedings of the KIPE Conference
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    • 2016.07a
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    • pp.485-486
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    • 2016
  • This paper proposes a new hybrid five-level voltage-source inverter topology, based on the conventional five-level active neutral-point-clamped topology (5L-ANPC), where the lower number of switching devices is required, resulting in saving the cost. The operating principle and control method of the proposed topology is described. The comparison of THD, power losses, loss distribution, and cost of components are evaluated among the proposed topology, the 5L-ANPC and 5L-DCI (diode-clamped inverters) topology.

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Optimization of the InGaN/GaN quantum well structure for 470 mm RC-LED with variation of quantum well thickness and Indium composition (양자우물 두께와 인듐조성 변화에 의한 470 mm RC-LED InGaN/GaN 양자우물 구조의 최적화)

  • Im, Jae-Mun;Park, Chang-Yeong;Park, Gwang-Uk;Lee, Yong-Tak
    • Proceedings of the Optical Society of Korea Conference
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    • 2009.02a
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    • pp.509-510
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    • 2009
  • The optical gain of InGaN/GaN multi quantum well (MQW) resonant-cavity light-emitting diode (RC-LED) with different Indium composition and well width in the multi-quantum well was investigated. The optimized optical gain was obtained by simulating active region InGaN/GaN with some test values of well width and Indium composition. By simulation tool, we could simulate on several cases, and then we got exact well width and Indium composition that makes optical gain maximum due to the short wavelength of 470 nm for blue light emission.

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