• 제목/요약/키워드: AZO electrode

검색결과 72건 처리시간 0.029초

스퍼트링 방법으로 증착된 투명전극용 AZO의 구조적 특성

  • 정영진;박재형;이승진;손창식
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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    • pp.94.1-94.1
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    • 2010
  • RF 마크네트론 스퍼트를 이용하여 유리 기판 위에 태양전지 투명전극용 Al 도핑된 ZnO(AZO)를 증착하였다. Si 박막 태양전지용 투명전극으로 사용될 AZO의 광학 및 구조적 특성을 향상시키기 위해서 증착온도 및 Ar 가스의 유량비를 조절하여 증착하였다. 상온에서 500도 범위 내에서 증착하였고, 10에서 40 sccm의 범위 내에서 Ar의 유량을 변화시켰다. 증착된 AZO의 광학적 특성은 UV-spectrometer를 이용하여 측정하였고, 구조적 특성은 XRD를 이용하여 측정하였다. 가스의 유량비에 따라 광학 및 구조적 특성의 의존성을 나타내고, 가스 유량비를 조절하여 태양전지용 투명전극의 광학 및 구조적 특성의 최적화를 이룰 수 있다.

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FBAR용 $ZnO/AZO/SiO_2/Si$ 박막의 결정학적 특성에 관한 연구 (Crystallography properties of $ZnO/AZO/SiO_2/Si$ thin film for FBAR)

  • 강태영;금민종;손인환;김경환
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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    • pp.880-883
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    • 2003
  • ZnO thin films for Film Bulk Acoustic Resonator(FBAR) were prepared by FTS (Facing Target Sputtering) system. The FTS methode enable to generate high density plasma, and it has a high deposition rate at 1mTorr pressure. Therefore, the ZnO thin films were deposited on $AZO/SiO_2/Si$ substrates with oxygen gas flow rate, and the other sputtering conditions were fixed such as a sputtering current of 0.8A, a substrate temperature at room temperature. AZO bottom electrode were deposited on $SiO_2/Si$ substrate and by Zn:Al(Al:2wt%) metal target. ZnO thin film thickness and the c-axis preferred orientation of ZnO thin film were evaluated by ${\alpha}-step$ and XRD.

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TCO 응용을 위한 패턴된 기판위에 증착된 AZO 박막의 특성 연구 (Conformal coating of Al-doped ZnO thin film on micro-column patterned substrate for TCO)

  • 최미경;안철현;공보현;조형균
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.28-28
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    • 2009
  • Fabrications of antireflection structures on solar cell were investigated to trap the light and to improve quantum efficiency. Introductions of patterned substrate or textured layer for Si solar cell were performed to prevent reflectance and to increase the path length of incoming light. However, it is difficult to deposit conformally flat electrode on perpendicular plane. ZnO is II-VI compound semiconductor and well-known wide band-gap material. It has similar electrical and optical properties as ITO, but it is nontoxic and stable. In this study, Al-doped ZnO thin films are deposited as transparent electrode by atomic layer deposition method to coat on Si substrate with micro-scale structures. The deposited AZO layer is flatted on horizontal plane as well as perpendicular one with conformal 200 nm thickness. The carrier concentration, mobility and resistivity of deposited AZO thin film on glass substrate were measured $1.4\times10^{20}cm^{-3}$, $93.3cm^2/Vs$, $4.732\times10^{-4}{\Omega}cm$ with high transmittance over 80%. The AZO films were coated with polyimide and performed selective polyimide stripping on head of column by reactive ion etching to measure resistance along columns surface. Current between the micro-columns flows onto the perpendicular plane of deposited AZO film with low resistance.

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대향타겟스퍼터링법에 의한 FBAR용 AZO(ZnO:Al) 전극의 제작 (Preparation AZO(ZnO:Al) thin film for FBAR by FTS method)

  • 금민종;신성권;가출현;추순남;김경환
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.172-175
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    • 2003
  • ZnO:Al thin film for application to FBAR's bottom electrode using ZnO piezoelectric thin film were prepared by FTS, in order to improve the crystallographic properties of ZnO thin films because the ZnO:Al thin film and ZnO thin films structure is equal each other. So we prepared the ZnO:Al thin film with oxygen gas flow rate. Thickness and c-axis preferred orientation and electric properties of ZnO:Al bottom electrode were evaluated by $\alpha$-step, XRD and 4-point probe..

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AZO(ZnO-Ag-ZnO) 전극을 이용한 Bottom emission Organic Light Emitting Diode 제작 (Application of AZO electrode for bottom emission organic light emitting diode)

  • 김종연;한진우;강희진;문현찬;김종환;최성호;박광범;김태하;김휘운;서대식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 학술대회 및 기술세미나 논문집 디스플레이 광소자
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    • pp.58-59
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    • 2006
  • Top emission OLED 소자에 사용되는 ITO(Indium-Tin-Oxide)의 저항을 개선하여 보다 낮은 저항을 가지는 전극을 제작하기 위해 AZO(ZnO-Ag-ZnO)를 제작하였다. AZO박막은 기존의 ITO 박막이 수십 $\Omega$을 나타내던 것과 비교하여 $8{\Omega}$으로 매우 낮은 저항을 나타내었다. 투과율은 84%로 기존의 ITO 박막과 유사한 성능을 나타내었다.

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Synthesis and Characterization of Al-Doped Zinc Oxide Films by an Radio Frequency Magnetron Sputtering Method for Transparent Electrode Applications

  • Seo, Jae-Keun;Ko, Ki-Han;Cho, Hyung-Jun;Choi, Won-Seok;Park, Mun-Gi;Seo, Kyung-Han;Park, Young;Lim, Dong-Gun
    • Transactions on Electrical and Electronic Materials
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    • 제11권1호
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    • pp.29-32
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    • 2010
  • In this study, transparent and conductive Al-doped zinc oxide (AZO) films were prepared on a glass substrate by an radio frequency (RF) magnetron sputtering method using a 150-nm-thick AZO target (Al: 2 wt.%) at room temperature. We investigated the effects of RF power between 100-350 W (in steps of 50 W) on the structural, electrical, and optical properties of the AZO films. The thickness and cross-sectional images of the films were observed by field emission scanning electron microscopy. The thicknesses of all films were kept constant at 150 nm and grown on a glass substrate. The grain sizes of the AZO films were determined with the X-ray diffraction by using the Scherrer' equation, and their electrical properties were investigated using a Hall effect electronic transport measurement system. The transmittance of the AZO films was also measured by an ultraviolet-visible spectrometer.

Properties of ZnO:Al films on polymer substrates by low temperature process

  • Jung, Yu-Sup;Kim, Kyung-Hwan
    • 반도체디스플레이기술학회지
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    • 제8권3호
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    • pp.57-60
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    • 2009
  • Transparent electrode ZnO:Al(AZO)films were deposited on a PES (polyethersulfone) polymer substrate for thin film solar cells applications. A PES substrate with a thickness of 0.2mm and transmittance > 90% in the visible range was used because it is light weight and can deform easily. AZO thin films were prepared at a fixed DC power, $PO_2\;=\;P(O_2)/[P(O_2)\;+\;P(Ar)]$, and various substrate temperatures. The properties of AZO thin films were examined by X-ray diffraction, UV/VIS spectroscopy, four-point probe, Hall measurements, and field emission scanning electron microscopy. The lowest resistivity of all the films was $4.493\;{\times}\;10^{-4}\;[\Omega-cm]$ and the transmittance was > 80% in the visible range.

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F 농도 조절을 통한 AZO 박막의 광학적 전기적 특성 향상 (Improvement of Optical and Electrical Properties of AZO Thin Films by Controlling Fluorine Concentration)

  • 장수영;장준성;조은애;;김지훈;문종하;김진혁
    • 한국재료학회지
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    • 제31권3호
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    • pp.150-155
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    • 2021
  • Zinc oxide (ZnO) based transparent conducting oxides (TCO) thin films, are used in many applications such as solar cells, flat panel displays, and LEDs due to their wide bandgap nature and excellent electrical properties. In the present work, fluorine and aluminium-doped ZnO targets are prepared and thin films are deposited on soda-lime glass substrate using a RF magnetron sputtering unit. The aluminium concentration is fixed at 2 wt%, and the fluorine concentration is adjusted between 0 to 2.0 wt% with five different concentrations, namely, Al2ZnO98(AZO), F0.5AZO97.5(FAZO1), F1AZO97(FAZO2), F1.5AZO96.5(FAZO3), and F2AZO96(FAZO4). Thin films are deposited with an RF power of 40 W and working pressure of 5 m Torr at 270 ℃. The morphological analysis performed for the thin film reveals that surface roughness decreases in FAZO1 and FAZO2 samples when doped with a small amount of fluorine. Further, optical and electrical properties measured for FAZO1 sample show average optical transmissions of over 89 % in the visible region and 82.5 % in the infrared region, followed by low resistivity and sheet resistance of 3.59 × 10-4 Ωcm and 5.52 Ω/sq, respectively. In future, these thin films with excellent optoelectronic properties can be used for thin-film solar cell and other optoelectronics applications.

RF 마그네트론 스퍼터링으로 증착된 Al이 도핑 된 ZnO (AZO) 박막의 특성에 대한 연구 (A Study on the Properties of Al doped ZnO (AZO) Thin Films Deposited by RF Magnetron Sputtering)

  • 윤의중;정명희;박노경
    • 대한전자공학회논문지SD
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    • 제47권7호
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    • pp.8-16
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    • 2010
  • 본 연구에서는 산소분압조건이 radio 주파수(RF) 마그네트론 스퍼터링으로 증착된 Al이 도핑된 ZnO (AZO) 박막의 성질에 미치는 영향을 조사하였다. Hall, photoluminescence (PL), X-ray photoelectron spectroscopy (XPS) 측정들은 0.9의 산소분압으로 증착된 AZO 박막의 경우 p형 전도도를 나타내었지만 반면에 0 - 0.6 범위의 산소분압으로 증착된 AZO 박막의 경우는 n형 전도도가 관찰 되었다는 것을 보여주고 있다. 또한 PL 및 XPS 결과는 zinc vacancies 와 oxygen interstitials등과 같은 억셉터 같은 결함들이 0.9의 산소분압으로 증착된 AZO 박막 내에서 증가해서 그 결과 p형 전도도의 AZO 박막을 형성하였다는 것을 알려주고 있다. Hall 결과는 0 - 0.6 범위의 산소분압으로 증착된 AZO 박막을 투명 박막 트랜지스터 응용에서 전극층으로 사용할 수 있음을 가리키고 있다. X-ray diffraction 해석으로부터 더 큰 산소분압으로 증착 된 AZO 박막 들이 더 큰 tensile 스트레스 뿐 만 아니라 더 작은 grain 크기를 가지면서 더 악화 된 결정질 특성을 가진다는 사실을 확인 하였는데 이는 증착 도중에 더 많은 산소원자들이 주입되는 것과 관련이 있음을 알 수 있었다. atomic force 마이크로스코프의 연구에서 산소분압을 사용하여 증착된 박막에서 더 완만한 표면 거칠기를 관찰하였는데 산소원자들의 주입이 더 큰 비저항을 초래하였다는 것을 Hall 측정으로도 확인할 수 있었다.

Dielectric $Bi_3NbO_7$ thin film grown on flexible substrates by Nano Cluster Deposition

  • Lee, Hyun-Woo;Yoon, Soon-Gil
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 추계학술대회 논문집
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    • pp.10-10
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    • 2009
  • Transparent BNO thin films were grown on Al-doped ZnO (AZO)/Ag/AZO/polyethersulfon (PES) (abbreviated as AAAP) transparent electrodes at a low temperature by the NCD technique. The BNO films grown on the crystallized AZO/Ag/AZO (AAA) electrodes exhibit an amorphous phase with a root mean square (rms) roughness of approximately 2 nm in the range of deposition temperature. The capacitors (Pt/BNO/AAAP) with BNO films grown at $100^{\circ}C$ show a dielectric constant of 24 and dissipation factor of 8% at 100 kHz, a leakage current density of about $8{\times}10^{-6}A/cm^2$ at an applied voltage of 1.0V. The optical transmittances of the BNO/AAAP exhibited above 80% at wavelength of 550nm at all of deposition temperature. The mechanical stability of the BNO/AAA as well as AAA electrode with the PES substrates through the bending was ensured for flexible electronic device applications. The transparent BNO capacitors grown on AAAP are powerful candidate for integration with the transparent solar cells.

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