• Journal of the Korean Society of Manufacturing Process Engineers
• /
• v.6 no.2
• /
• pp.22-27
• /
• 2007

In this study, the two methods of stiffness measurement(Spring constant) of cantilever were proposed for quantitative measurement in Atomic Force Microscopy(AFM). As the 1st method for the measurement of stiffness, the probe method, which is used in the measurement of the semiconductor mechanical and electrical properties, was applied to the measurement of the cantilever. Experiments by the probe method were performed finding the resistance value of cantilever. As the results, the resistance was measured differently along with the dimension and the thickness of cantilever that determined the stiffness(spring constant) of the lever. As the 2nd method, the vibration characteristics(Dunkerley expression) is used to obtain the stiffness of the complex structure which is combined by AFM cantilever and the standard cantilever. We measured the resonant frequency from the complex structure using the micro stages and stereo microscope. As the results, we confirmed that the vibration characteristics(Dunkerley expression) is effected the micro complex structure of AFM cantilever.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
• /
• 2002.10b
• /
• pp.55-56
• /
• 2002

Nanotribological characteristics of hydrophobic surfaces were studied experimentally using an atomic force microscope (AFM). Two kinds of thiolic self-assembled monolayers (SAM) having different spacer chains and their mixture were deposited onto gold-coated mica, where the deposited SAM resulted in the hydrophobic nature. Results showed that the mixed thiolic SAMs resulted in low adhesion and friction in nano-scale contact. It was argued that the water wetting characteristics played a central role on nano-scale adhesion and friction. Also the effect of mixing the thiolic SAMs were discussed on the basis of real area on contact and the stiffness of the SAM layers.

• Journal of the Korean Society for Precision Engineering
• /
• v.25 no.8
• /
• pp.88-95
• /
• 2008

Young's modulus of electroplated nickel thin film is systematically investigated using the resonance method of atomic force microscope. Thin layers of nickel to be measured are electroplated onto the surface of an AFM silicon cantilever and Young's modulus of plated nickel film is investigated as a function of process conditions such as the plating temperature and applied current density. It is found that Young's modulus of plated nickel thin film is as high as that of bulk nickel at low plating temperature or low current density, but decreases with increasing plating temperature or current density. The results imply that the plating rate increases as increasing the plating temperature or current density, therefore, slow plating rate produces a dense plating material due to the sufficient time fur nickel ions to form a dense coating.

• Journal of the Korean Society of Manufacturing Technology Engineers
• /
• v.20 no.4
• /
• pp.395-400
• /
• 2011

Scanning Probe Lithography is a method to localized oxidation on single crystal silicon wafer surface. This study demonstrates nanometer scale non contact lithography process on (100) silicon (p-type) wafer surface using AFM(Atomic force microscope) apparatuses and pulse controlling methods. AFM-based experimental apparatuses are connected the DC pulse generator that supplies ultra short pulses between conductive tip and single crystal silicon wafer surface maintaining constant humidity during processes. Then ultra short pulse durations are controlled according to various experimental conditions. Non contact lithography of using ultra short pulse induces electrochemical reaction between micro-scale tip and silicon wafer surface. Various growths of oxides can be created by ultra short pulse non contact lithography modification according to various pulse durations and applied constant humidity environment.

• International Journal of Precision Engineering and Manufacturing
• /
• v.7 no.4
• /
• pp.18-22
• /
• 2006

Although many efforts have been made in making nanometer-sized holes, there is still a major challenge in fabricating individual single-digit nanometer holes in a more controllable way for different materials, size distribution and hole shapes. In this paper we describe our efforts to use a top down approach in nanofabrication method to make single-digit nanoholes. There are three major steps towards the fabrication of a single-digit nanohole. 1) Preparing the freestanding thin film by epitaxial deposition and electrochemical etching. 2) Making sub-micro holes ($0.2{\mu}\;to\;0.02{\mu}$) by focused ion beam (FIB), electron beam (EB), atomic force microscope (AFM), and others methods. 3) Reducing the hole size to less than 10 nm by epitaxial deposition, FIB or EB induced deposition and micro coating. Preliminary work has been done on thin films (30 nm in thickness) preparation, sub-micron hole fabrication, and E-beam induced deposition. The results are very promising.

• Electrical & Electronic Materials
• /
• v.10 no.7
• /
• pp.700-705
• /
• 1997

Transparent conducting indium tin oxide (TC-ITO) thin films are deposited on soda lime glass by a dc magnetron sputtering technique having the unbalanced-magnet structure in order to improve the electrical/material characteristics and to avoid the surface damages. The material properties are measured by the x-ray diffractometer (XRD) and atomic force microscope (AFM). The (400) peak as the preferred orientation of <100> direction for ITO thin films is stabilized with the increase of substrate temperature. The surface roughness estimated by AFM 3D image at the substrate temperature of 40$0^{\circ}C$ is extremely uniform. The best resistivity of ITO films (5500 $\AA$ thick) at 40$0^{\circ}C$ is about 1.3$\times$10$^{-4}$ $\Omega$cm on the position of 4 cm from substrate center.

• Journal of the Korean Society for Precision Engineering
• /
• v.21 no.6
• /
• pp.145-152
• /
• 2004

Depth-sensing indentation is wifely used for evaluation of mechanical properties of thin films. It is generally accepted that the most significant source of uncertainty in nanoindentation measurement is the geometry of the indenter tip. Therefore the successful application of the technique requires accurate calibration of the indenter tip geometry. The direct measurement of geometry of a Berkovich indenter was determined using a atomic force microscope. The indentation geometrical calibration of contact area was performed by analyzing the indenter tip profile. The equations of area functions were proposed for nanoscale thin films..

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2004.07b
• /
• pp.1042-1045
• /
• 2004

ITO thin films ($\sim150nm$) are deposited on glass substrates by different deposition condition. The sheet resistance of ITO thin films measured by using a four probe station. The microstructure of these films is determined using a X-ray diffractometer (XRD) and a scanning electron microscope (SEM) and a atomic force microscope (AEM). The sheet resistance of ITO thin films compared $s_11$ values by using a near field scanning microwave microscope.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.17 no.8
• /
• pp.875-881
• /
• 2004

Fundamental results obtained from an atomic force microscope (AFM) chemically-induced direct nano-lithography process are presented, which is regarded as a simple method for fabrication nm-scale devices such as superconducting flux flow transistors (SFFTs) and single electron tunneling transistors (SETs). Si cantilevers with Pt coating and with 30 nm thick TiO coating were used as conducting AFM tips in this study. We observed the surfaces of superconducting strip lines modified by AFM anodization' process. First, superconducting strip lines with scan size 2 ${\mu}{\textrm}{m}$${\times}$2 ${\mu}{\textrm}{m}$ have been anodized by AFM technology. The surface roughness was increased with the number of AFM scanning, The roughness variation was higher in case of the AFM tip with a positive voltage than with a negative voltage in respect of the strip surface. Second, we have patterned nm-scale oxide lines on ${YBa}-2{Cu}_3{O}_{7-x}$ superconducting microstrip surfaces by AFM conductive cantilever with a negative bias voltage. The ${YBa}-2{Cu}_3{O}_{7-x}$ oxide lines could be patterned by anodization technique. This research showed that the critical characteristics of superconducting thin films were be controlled by AFM anodization process technique. The AFM technique was expected to be used as a promising anodization technique for fabrication of an SFFT with nano-channel.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2004.05a
• /
• pp.152-152
• /
• 2004

카본나노튜브(Carbon Nanotube)는 다른 물질과 구별되는 날카로움(Sharpness), 고세장비(High Aspect Ratio), 높은 기계적 강성(Stiffness), 고탄성(high Elasticity), 그리고 반도체(semi-conducting)와 도체(Metallic) 성질 때문에, 카본나노튜브는 많은 연구에 적용되고 있으며, 카본나노튜브가 부착된 AFM(Atomic Force Microscope) 팁을 이용한 AFM 측정은 CNT 응용에 있어서 매우 큰 효과를 내는 응용분야 중 하나이다. AEM 팁에 카본나노튜브를 붙이는 이전 연구는 대부분 화학증착법(Chemical Vapor Deposition)에 의해 이루어 졌으며, 매우 효과적인 방법이지만 고가의 장비와 고온의 챔버내에서 이루어진다는 문제점을 가지고 있다.(중략)