• Bulletin of the Korean Chemical Society
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• 제35권3호
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• pp.725-730
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• 2014

The effect the diameter of silver nanorod arrays whose distance between the nanorods was uniform at 65 nm have on Surface-enhanced Raman Scattering (SERS) has been studied by varying the diameter from 28 to 51 nm. Nanorod length was fixed at approximately 62 nm, which is the optimum length for SERS by excitation with a 632.8 nm laser line. The transverse and longitudinal modes of the surface plasmon of these silver nanorods were near 400 and 630 nm, respectively. The extinction of the longitudinal mode increased with increasing nanorod diameter, while the transverse mode did not change significantly. High-quality SERS spectra of p-aminothiophenol and benzenethiol adsorbed on the tips of the silver nanorods were observed by excitation with a 632.8 nm laser line. The SERS enhancement increased with increasing nanorod diameter. We concluded that the SERS enhancement increases when the diameter of silver nanorods is increased mainly by increasing the excitation efficiency of the longitudinal mode. The enhancement factor for the silver nanorods with a 51 nm diameter was approximately $2{\times}10^7$.

• 한국광학회지
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• 제21권1호
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• pp.1-5
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• 2010

본 논문에서는 실리콘 태양전지의 흡수효율 증가를 위해 도파모드 공진 특성을 이용한 격자 구조를 제안하였다. 도파모드 공진을 이용함으로써 두께를 ~200 nm 수준으로 줄이면서도 높은 흡수율을 기대할 수 있는 태양전지 설계가 가능함을 확인하였다. 제안된 구조는 은으로 된 반사경 위에 격자구조를 갖는 Poly-Si 유전체 층이 존재하는 1-D 구조로서 각 구조변수들 즉 격자의 주기, 유전체 두께, 격자 간격 및 깊이 등이 흡수 효율에 어떤 영향을 미치는지 알아보고, 변수들의 조절을 통해 최적의 구조를 찾고자 시도하였다. PSO알고리즘을 사용하여 제안된 구조의 적절성을 확인 하였으며, 이로부터 65.8%의 유효 흡수율을 얻을 수 있었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.65-65
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• 2010

Extreme ultraviolet lithography (EUVL) is expected to be applied for making patterns below 32 nm in device industry. An ultrathin EUV photoresist (PR) of a few nm in thickness is required to reduce minimum feature size further. Here, we show that pentacene molecular layers can be employed as a new EUV resist for the first time. Dots and lines in nm scale are successfully realized using the new molecular resist. We clearly provide the mechanism for forming the nanopatterns with scanning photoemission microscope (SPEM), EUV interference lithography (EUV-IL), atomic force microscope (AFM), photoemission spectroscopy (PES), etc. The molecular PR has several advantages over traditional polymer EUV PRs; for example, high thermal/chemical stability, negligible outgassing, ability to control the height and width on the nanometer scale, leaving fewer residuals, no need for a chemical development process and thus reduction of chemical waste to make the nanopatterns. Besides, it could be applied to any substrate to which pentacene bonds chemically, such as $SiO_2$, SiN, and SiON, which is of importance in the device industry.

• 대한화학회지
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• 제65권2호
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• pp.125-132
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• 2021

An electrochromic nickel oxide thin film was fabricated on a flexible PET/ITO substrate using a nanocrystallite- dispersed coating sol and bar coater. Nanocrystalline NiOx of 3-4 nm crystallite size was first synthesized by base precipitation and thermal conversion. This NiOx nanocrystallite powder was mechanically dispersed in an alcoholic solvent mixed with a silane binder to prepare a coating sol for thin film. This sol method is different from the normal sol-gel method in that it does not require the conversion of precursor by heat treatment. Therefore, this method provides a very facile method to prepare NiOx thin films on any kind of substrate and it can be easily applied to mass production. The electrochromic performance of this NiOx thin film on PET/ITO electrode with a thickness of about 400 nm was investigated in a nonaqueous LiClO4 electrolyte solution by cyclic voltammetric and repeated chronoamperometric measurements in conjunction with spectrophotometry. The visible light modulation of 44% and the colorization efficiency of 41 ㎠/C at 550 nm were obtained at the step potentials of -0.8/+1.2 V vs Ag and a duration of 30 s.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.370-370
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• 2010

최근 자연모사를 통한 초저마찰 연구가 활발히 진행되고 있으며 리소그라피, 레이져 가공법 등의 다양한 방법을 통해 표면구조 제어가 시도되고 있다. 본 연구에서는 자장여과 아크 플라즈마 이온 소스를 이용한 WC-Co 및 SCM 415 금속소재의 표면구조 형상제어를 통해 저마찰 특성을 시도하였다. 자장여과 아크 소스는 90도 꺽힘형이며 5개의 자장 코일을 통해 아크 음극에서 발생된 고밀도($10^{13}\;cm^{-3}$ 이상) 플라즈마를 표면처리 대상 기판까지 확산시켰다. 공정 압력은 알곤가스 1 mTorr, 아크 방전 전류는 25 A, 플라즈마 수송 덕트 전압은 10 V이다. 기판 전압은 비대칭 펄스 (-80 %/+5 %)로 -600 V에서 -800 V까지 인가되었으며 -600 V 비대칭 펄스 인가시기판으로 입사하는 알곤 이온 전류 밀도는 약 $4.5\;mA/cm^2$ 이다. WC-Co 시편의 경우 -600 V 전압 인가시, 이온빔 처리 전 46.4 nm(${\pm}12.7\;nm$)의 조도를 갖는 시편이 5분, 10분, 20분동안 이온빔 처리함에 따라 72.8 nm(${\pm}3\;nm$), 108.2 nm(${\pm}5.9\;nm$), 257.8 nm(${\pm}24.4\;nm$)의 조도를 나타내었다. SCM415 시편의 경우 -800 V 인가시, 이온빔 처리 전 20.4 nm(${\pm}2.9\;nm$)의 조도를 갖는 시편이 20분동안 이온빔 처리함에 따라 275.1 nm(${\pm}43\;nm$)의 조도를 나타내었다. 또한 주사전자현미경을 통한 표면 형상 관찰 결과, 이온빔 식각을 통해 생성된 거친 표면에 $3-5\;{\mu}m$ 직경의 돌기들이 산발적으로 생성됨을 확인했다. 마찰계수 측정 결과 SCM415 시편의 경우, 이온빔 처리전 마찰계수 0.65에서 조도 275.1 nm 시편의 경우 0.48로 감소하였다. 본 연구를 통해 이온빔 식각을 이용한 금속표면 제어 및 저마찰 특성 향상의 가능성을 확인하였다.

• 전기학회논문지
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• 제65권11호
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• pp.1835-1839
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• 2016

In this study, ZnO nanorods were grown by a hydrothermal method. $SiO_2/Si$ wafers and glass were used as substrates. ~20 nm-thick ZnO thin films were rf magnetron sputtered for seed layers. The precursor was prepared by mixing zinc nitrate hexahydrate and hexamethylenetetramine (hexamine) in DI water. The concentration of zinc nitrate hexahydrate was fixed at 0.05 mol, and that of hexamine was varied between 0 mol to 0.1 mol. The reactor containing substrates and precursor was put in an oven maintained at $90^{\circ}C$ for 1 h. X-ray diffraction was carried out to analyze the crystallinity of ZnO nanorods, and a field emission scanning electron microscope was employed to observe the morphology of nanorods. Transmittance and absorbance were measured by a UV-Vis spectrophotometer. Photoluminescence measurements were conducted using 266 nm light.

• JSTS:Journal of Semiconductor Technology and Science
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• 제15권4호
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• pp.437-444
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• 2015

A high output power voltage controlled oscillator (VCO) in the U-band was implemented using a 65 nm CMOS process. The proposed VCO used a transmission line to increase output voltage swing and overcome the limitations of CMOS technologies. Two varactor banks were used for fine tuning with a 5% frequency tuning range. The proposed VCO showed small variation in output voltage and operated at 51.55-54.18 GHz. The measured phase noises were -51.53 dBc/Hz, -91.84 dBc/Hz, and -101.07 dBc/Hz at offset frequencies of 10 kHz, 1 MHz, and 10 MHz, respectively, with stable output power. The chip area, including the output buffer, is $0.16{\times}0.16mm^2$ and the maximum output power was -0.11 dBm. The power consumption was 33.4 mW with a supply voltage of 1.2-V. The measured $FOM_P$ was -190.8 dBc/Hz.

• JSTS:Journal of Semiconductor Technology and Science
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• 제16권5호
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• pp.535-541
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• 2016

A low phase noise META-VCO based-on meta-structure was designed using 65 nm CMOS process. We used a meta-structure to get good phase noise characteristics. The measured phase noises are -67.8 dBc/Hz, -96.37 dBc/Hz, and -107.37 dBc/Hz at 100 kHz, 1 MHz, and 10 MHz offset respectively. The META-VCO operates 8.45~8.77 GHz according to VCTRL, and the output power is -19.12 dBm. The power consumption is 28 mW with 1.2-V supply voltage. The calculated FOM is -140.76 dBc/Hz.

• 마이크로전자및패키징학회지
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• 제11권1호
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• pp.59-64
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• 2004

고분자 전해질 연료전지의 성능은 촉매 지지 물질의 특성에 의존한다. 본 연구에서는 백금 촉매의 지지체로서 CNF(carbon nanofibre)와 CNT(carbon nanotube)를 사용하였다. CNF와 CNT는 기상화학증착법과 메카노케미컬 공정에 의해 처리된 촉매를 이용하여 합성되었다. 백금은 고분자 전해질 연료전지의 적용을 위하여 CNF와 CNT로 지지되었다. 그 결과, 65 nm의 직경을 가지는 twisted CNF로 준비된 MEA가 가장 우수한 I-V 특성을 나타내는 것이 확인되었다.

• JSTS:Journal of Semiconductor Technology and Science
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• 제16권6호
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• pp.817-824
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• 2016

A simultaneous bidirectional transceiver over a single wire has been developed in a 65 nm CMOS technology for a command and control bus. The echo signals of the simultaneous bidirectional link are cancelled by controlling the decision level of receiver comparators without power-hungry operational amplifier (op-amp) based circuits. With the clock information embedded in the rising edges of the signals sent from the source side to the sink side, the data is recovered by an open-loop digital circuit with 20 times blind oversampling. The data rate of the simultaneous bidirectional transceiver in each direction is 75 Mbps and therefore the overall signaling bandwidth is 150 Mbps. The measured energy efficiency of the transceiver is 56.7 pJ/b and the bit-error-rate (BER) is less than $10^{-12}$ with $2^7-1$ pseudo-random binary sequence (PRBS) pattern for both signaling directions.