• 제목/요약/키워드: 50nm

검색결과 2,608건 처리시간 0.03초

에피택셜 VO2 박막의 상전이에 대한 미시적 이해 (Nanoscopic Understanding of Phase Transition of Epitaxial VO2 Thin Films)

  • 김동욱;손아름
    • 한국표면공학회지
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    • 제50권3호
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    • pp.141-146
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    • 2017
  • We investigated configuration of metallic and insulating domains in $VO_2$ thin films, while spanning metal-insulator phase transition. Kelvin probe force microscopy, of which spatial resolution is less than 100 nm, enables us to measure local work function (WF) at the sample surface. The WF of $VO_2$ thin films decreased (increased) as increasing (decreasing) the sample temperature, during the phase transition. The higher and lower WF regions corresponded to the insulating and metallic domains, respectively. The metallic fraction, estimated from the WF maps, well explained the temperature-dependent resistivity based on the percolation model. The WF mapping also showed us how the structural defects affected the phase transition behaviors.

Polarization-Independent Multiwavelength-Switchable Filter Based on Polarization Beam Splitter and Fiber Coupler

  • Lee, Yong-Wook
    • Journal of Electrical Engineering and Technology
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    • 제4권3호
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    • pp.405-409
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    • 2009
  • A polarization-independent multiwavelength-switchable fiber filter is proposed based on a polarization beam splitter and fiber coupler, which can function as a polarization-independent transmission or reflection-type interleaving filter. The proposed filter consists of a polarization beam splitter and a Sagnac birefringence loop composed of a 50:50 coupler, high birefringent fibers, and two quarter-wave plates. In the proposed filter, a transmission-type interleaver with a channel isolation > 18 dB or a reflection-type one with a channel isolation of ${\sim}3$ dB, whose channel spacing and switching displacement were 0.8 and 0.4 nm in common, respectively, could be obtained. A channel interleaving operation could be performed by the proper control of waveplates within the Sagnac birefringence loop.

마이크로광조형법을 이용한 미세삼차원구조물의 제조공정 중 형상정밀도 및 경화특성에 관한 연구 (Shape accuracy and curing characteristics of photopolymer during fabrication of three-dimensional microstructures using microstereolithography)

  • 정대준;김성훈;정성호
    • 한국정밀공학회지
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    • 제21권1호
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    • pp.46-50
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    • 2004
  • The curing characteristics of a liquid photopolymer during microstereolithography and the shape accuracy of thereby fabricated microstructures were investigated experimentally. A He-Cd laser with a wavelength of 442nm and a photopolymer consisted of a commercial resin from SK chemical and a photoinitiat or were used for the experiment. By varying the laser beam power and scanning speed of the focused laser beam, minimum curing thickness of 50 ${\mu}ㅡ$ was obtained. The distortion of solidified structure due to adhesion force was measured and the optimum fabrication conditions were determined. Also, the feasibility of direct fabrication of three-dimensional microstructures by Super IH process was examined.

나노 용사용 분말 제조에 관한 연구 (Synthesis of the nanostructured powder for thermal spray coating)

  • 하국현;이구현
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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    • pp.50-50
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    • 2003
  • 용사 공정은 소재의 표면 특성을 개질하기 위한 가장 효과적인 공정의 하나로서, 최근 항공기용 엔진 부품을 포함하여 자동차, 및 각종 산업 분야에 폭 넓게 사용되고 있으나, 산업 환경의 고도화로 용사 코팅층의 다양한 분야에서의 고특성화가 요구되고 있다. 소재의 나노화는 이러 한 소재의 고 특성화 요구에 부응할 수 있는 새로운 기술로서, 현재 많은 분야에서 응용이 진행되고 있다. 특히 최근에는 나노기술을 용사 공정에 응용하기 위한 시도가 진행되고 있으나, 나노 분말 제조 기술이 아직 확립되어 있지 않고, 또한 나노 분말을 용사 공정에 응용하기 위한 기술의 부족으로 나노 용사공정에의 적용은 제한을 받고 있다. 이를 위해서는 나노분말 제조 기술의 개발이 이루어져야하고, 나노 분말 제조 기술과 용사 분말 제조 기술 그리고 용사 기술의 접목이 이루어 져야하는 어려움이 있다. 본 연구에서는 나노 용사용 분말을 제조하기 위 한 원료용 나노 분말을 화학적 공정에 의하여 제조 한 후, 이 분말의 유동도 및 밀도 제어를 위한 후 처리 공정을 개발하였다. 제조된 분말의 입자 크기는 약 150nm였으며, 용사 분말 제조후 분말의 겉보기 겉보기 밀도가 3.8g/cc로서 일반 용사용 분말에 비하여 우수하였다.

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Pseudomonase sp. 960903에 의한 acetylcholinesterase 억제제의 생산 및 정제 (Production and Purification of Acetylcholinesterase Inhibitor from Pseudomonas sp960903)

  • 김경자
    • 한국미생물·생명공학회지
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    • 제28권6호
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    • pp.322-328
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    • 2000
  • To screen agent for the treat-ment of Alzhimers Disease several strains of bacteria producing acetylcholinesterase inhibitor ware isolated from soil. Strain 960903 showed strong acetylcholinesteras inhibitory activity and low butyrylcholinesterse inhibitory activity. The strain 960903 was identified as Pseudomonas sp. Acetylcholinesterase inhibitor ws highly achieved in fermentation medium containing soluble starch 3.0%, glycerol 1.0%, pharmamedia 0.5%, KCI 0.3%, $CaCO_3$ 0.2%, MgS $O_4$..$7H_2$O 0.05%, $KH_2$$PO_4$ 0.05%(pH6.5) at $30^{\circ}C$ for 4 days. Acetylcholinesterase inhibitor was purified by Diaion WA-30($OH^{-}$) column charomatography and cellulose column chromatography. Acetylcholinesterase inhibi-tor showd the maximum wavelength at 205 nm and was soluble in water, acetic acid, ethanol, methanol and dime-thyl sulfoxide. The concentration of 50% inhibition($IC_{50}$) of inhibitor against acetylcholinesterase was 25$\mu\textrm{g}$/ml. The inhibitor was inactivated on heating ar $100^{\circ}C$ fro 15 min and more stable in acidic region than alkaline region.n.

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촉매담지 세라믹 필터를 이용한 황산화물과 질소산화물의 제거에 관한 연구 (A Study on the Removal of SOx and NOx Using Catalytic Ceramic Filters)

  • 홍민선;이동섭
    • 한국대기환경학회지
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    • 제14권5호
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    • pp.455-464
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    • 1998
  • Removal teals of Soxmox were performed using low density ceramic filters doped with various catalysts. Disc type (50 mmO.Dx10 mmt) low density ceramic filters were doped with three different catalysts such as Cu to remove SOx and NOx, and Mn and Co to remove NOx. The air permeabilities and specific surface areas were 40~50cc/min.cm2.cmH2O and 4.1~8.88 m2/g, respectively. Also, the peak pore sizes of catalyst support were 3~5nm. Tests were focused to search optimum operating temperatures for different catalysts. It was found that as the CuO content increases, SOx removal efficiency was increased. NOx removal efficiencies for Mn, Cu and Co, were 85% at 30$0^{\circ}C$, 90% at 40$0^{\circ}C$ and 90% at 45$0^{\circ}C$, respectively.

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수계-비수계 용매를 이용한 흑연분말의 $ZrO_2$ 수열코팅 (Preparation of $ZrO_2$ Coated Graphite Powders in Aqueous and Nonaqueous Solution)

  • 김정환;이태근;이기강;이석근
    • 한국결정학회지
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    • 제14권2호
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    • pp.67-72
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    • 2003
  • Graphite powders were coated with ZrO₂ by the controlled hydrolysis of a DI water, ethanol and DI water+ethanol solutions. The hydrolysis process was carried out with temperature control because of the low wettability of Zr ions to the surface of the graphite. PVA was added to the solution for the enhancement of metal ion adsorption. The surface of the graphite powders coated with ZrO₂ was observed by SEM and TEM. There are two types of ZrO₂ particles with the condition of ZrOCl₂°§8H₂O aqueous solutions were used; (a) primary particles a few nm in size and (b) secondary particles with ∼0.1 ㎛ size were obtained. The graphite powders coated in 50% ethanol-50% DI water solution of Zr(SO₄)₂ㆍ4H₂O have the relatively uniform coating layer and the starting temperature of oxidation was 100℃ higher than the raw graphite.

Electromagnetic interference(EMI) shielding efficiency(SE) charhcteristics of IMI multilayer/PMMA structure for plasma display panel(PDP) filter.

  • Lee, Jung-Hyun;Sohn, Sang-Ho;Cho, Yong;Lee, Sang-Gul
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.872-876
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    • 2006
  • This study was made to examine the electromagnetic interference(EMI) shielding effect (SE) of multilayered thin films in which indium-tin oxide(ITO) and Ag were deposited alternately from 3layer to 9 layer on Poly Methyl Meth Acrylate(PMMA) substrate at room temperature using a PF sputtering. We measured optical and electrical characteristics by UV-spectrometer and 4 point probe. The measurement of EMI SE in frequency range from 50MHz to 1.5GHz was performed by using ASTM D4935-89 method. We compared the measured EMI SEs with theoretical simulation data. We obtained relatively low resistivity and high transmittance from the EMI SE multilayers. In this study, we obtain good optical electrical characteristics with a minimun transmittance of about 60% at 550nm wavelength and sheet resistance of $2{\sim}3ohm/sq$., respectivity. Measured EMI SEs were over 50dB and similar to theoretical simulation data.

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Electrical and Optical Properties of ITO Films Sputtered by RF -bias Voltage and In-Sn Alloy Target

  • Kim, Hyun-Hoo;Shin, Sung-Ho
    • Transactions on Electrical and Electronic Materials
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    • 제5권4호
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    • pp.153-157
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    • 2004
  • ITO thin films were deposited on PET and soda-lime glass substrates by a dc reactive magnetron sputtering of In-Sn alloy metal target without substrate heater and post-deposition thermal treatment. The dependency of rf-bias voltage and substrate power during deposition processing was investigated to control the electrical and optical properties of ITO films. The range of rf bias voltage is from 0 to -80 V and the substrate power is applied from 10 to 50 W. The minimum resistivity of ITO film is 5.4${\times}$10$^{-4}$ $\Omega$cm at 50 W power and rf-bias voltage of -20 V. The best transmittance of ITO films at 550 nm wavelength is 91 % in the substrate power of 30 W and rf-bias voltage of -80 V.

플라스틱 마이크로 채널 기판 사출성형 시 보압의 영향 (Effects of Packing Pressure and Time on Injection Molding of Plastic Micro-channel Plates)

  • 우상원;박시환
    • 한국생산제조학회지
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    • 제25권3호
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    • pp.224-229
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    • 2016
  • Recently, polymeric micro-fluidic biochips with numerous micro patterns on the surface were fabricated by injection molding for realizing low-cost mass production of devices. To evaluate the effects of process parameters on large-scale micro-structure replication, a $50{\times}50mm^2$ tool insert with surface structures having a patterns of trapezoidal shapes (height: $30{\mu}m$) was employed. During injection molding, PMMA was used; packing phase parameters and mold temperature were investigated. The replicated surface textures were quantitatively characterized by confocal laser microscopy with 10-nm resolution. The degree of replication at low mold temperatures was found to be higher than that at high mold temperature at the beginning of the packing stage. Thereafter, the degree of replication increased to a greater extent at higher mold temperatures; application of higher mold temperatures improved the degree of replication.