• Title/Summary/Keyword: 50nm

Search Result 2,606, Processing Time 0.028 seconds

Organic-layer thickness dependent electrical and electrical and optical properties of organic light-eitting diodes (유기물층 두께변화에 따른 유기발광 소자의 전기적 및 광학적 특성)

  • An, Hui-Chul;Joo, Hyun-Woo;Na, Su-Hwan;Han, Wone-Keun;Kim, Tae-Wan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2008.04a
    • /
    • pp.27-28
    • /
    • 2008
  • We have studied an organic layer-thickness dependent electrical and optical properties of organic light-emitting diodes in a device structure of ITO/TPD/$Alq_3$/LiF/Al. While a hole-transport layer thickness of TPD was varied from 35 to 65nm, an emissive layer thickness of $Alq_3$ was varied from 50 to 100nm. A ratio of those two layers was kept to about 2:3. Variation of the layer thickness changes a traverse time of injected carriers across the organic layer, so that it may affect on the chance of probability of exciton formation. Current-voltage-luminance characteristics of the devices show that there are typical rectifying behaviors, and the luminance reaches about $30,000cd/m^2$. Thickness-dependent current efficiency shows that there is a gradual increase of the efficiency as the total layer thickness increases. The efficiency becomes saturated to be about 10cd/A when the total thickness is above 140nm. They show that emission was from the $Alq_3$ layer, because the peak wavelength is about 525nm. View angle-dependent emission spectra show that the emission intensity decreases as the angle increases.

  • PDF

Electrospinning Fabrication of Juniperus Chinensis Extracts Loaded PU Nanoweb (전기방사를 이용한 향나무 추출물 함유 PU 나노웹 제조)

  • Kim, Jeong-Hwa;Lee, Jung-Soon
    • Science of Emotion and Sensibility
    • /
    • v.19 no.3
    • /
    • pp.43-50
    • /
    • 2016
  • The uniform nanofibers of polyurethane with different contents of Juniperus Chinensis extracts were successfully prepared by electrospinning method. Polyurethane is widely used as functional polymers in the industrials, medical field as their properties can be tailor-made by adjusting their compositions. Juniperus Chinensis has been reported for anti-tumor, anti-bacterial, anti-fungal, and anti-viral activities. PU/Juniperus Chinensis extracts composite nanofibers were produced at different Juniperus Chinensis extracts concentrations (0.25, 0.5, 1, 1.5wt.%). The effects of the major parameters in electrospinning process such as tip to collector distance (TCD), voltage, polymer concentration on the average diameter of electrospun nanoweb were investigated. As results, 12wt% PU solution concentration, 8kV applied voltage and 15cm tip to collector distance were identified as optimum conditions for electrospinning the composite nanofibers. The diameter and morphology of the nanocomposite nanofibers were confirmed by a scanning electron microscopy (SEM). The resulting fibers exhibited a uniform diameter ranging from 435nm~547nm. It has been found that the average diameters of fibers decreased by the adding of Juniperus Chinensis extracts. These nanowebs can be used for medical materials, protective clothing, and antimicrobial filters.

$CO_2$ 클러스터 세정을 이용한 오염입자 제거에 관한 연구

  • Choe, Hu-Mi;Jo, Yu-Jin;Lee, Jong-U;Kim, Tae-Seong
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2013.02a
    • /
    • pp.482-482
    • /
    • 2013
  • 반도체 소자의 미세화와 더불어 세정공정의 중요성이 차지하는 비중이 점점 커지고, 이에 따라 세정 기술 개발에 대한 요구가 증대되고 있다. 기존 세정 기술은 화학약품 위주의 습식 세정 방식으로 표면 손상, 화학 반응, 부산물, 세정 효율 등 여러 가지 어려움이 있다. 따라서 건식세정 방식이 활발하게 도입되고 있으며 대표적인 것이 에어로졸 세정이다. 에어로졸 세정은 기체상의 작동기체를 이용하여 에어로졸을 형성하고 표면 오염물질과 직접 물리적 충돌을 함으로써 세정한다. 하지만 이 또한 생성되는 에어로졸 내 발생 입자로 인해 패턴 손상이 발생하며 이러한 문제점을 극복하기 위하여 본 연구에서는 가스클러스터 장치를 이용한 세정 특성 평가에 관한 연구를 수행하였다. 가스 클러스터란 작동기체의 분자가 수십에서 수백 개 뭉쳐 있는 형태를 뜻하며 이렇게 형성된 클러스터는 수 nm 크기를 형성하게 된다. 그리고 짧은 시간의 응축에 의해 수십 nm 크기까지 성장하게 된다. 에어로졸 세정과 다르게 클러스터가 성장할 환경과 시간을 형성하지 않음으로써 작은 클러스터를 형성하게 되며 이로 인해 패턴 손상을 최소화 하고 상대적으로 높은 효율로 오염입자를 제거하게 된다. 클러스터 세정 장비를 이용한 표면 처리는 충돌에 의한 제거에 기반한다. 따라서 생성 및 가속되는 클러스터로부터 대상으로 전달되는 운동량의 정도가 세정 특성에 영향을 미치며 이는 생성되는 클러스터의 크기에 종속적이다. 생성 클러스터의 크기 분포는 분사 거리, 유량, 분사 각도, 노즐 냉각 온도 등의 변수에 관한 함수이다. 따라서 본 연구에서는 $CO_2$ 클러스터를 이용한 세정 특성을 평가하기 위하여 이러한 변수에 따라서 오염 입자의 종류, 크기에 따른 PRE (particle removal efficiency)를 평가하고 다양한 선폭의 패턴을 이용하여 손상 실험을 수행하였다. 제거 효율에 사용된 입자는 $CeO_2$$SiO_2$이며, 각각 30, 50, 100, 300 nm 크기를 정량적으로 오염시킨 쿠폰 웨이퍼를 제조하여 세정 효율을 평가하였다. 정량적 오염에는 SMPS (scanning mobility particle sizer)를 이용한 크기 분류와 정전기적 입자 부착 시스템이 사용되었다. 또한 패턴 붕괴 평가에는 35~180 nm 선폭을 가지는 Poly-Si 패턴을 이용하였다. 실험 결과 클러스터 형성 조건에 따라 상대적으로 낮은 패턴 붕괴에서 95% 이상의 높은 오염입자 제거효율을 전반적으로 보이는 것을 확인할 수 있었다. 따라서 이론적 계산에 기반하여 세정에 요구되는 클러스터 크기를 가정하고, 이를 통하여 세정에 적용할 경우 높은 기존 세정 방법의 단점을 보완하면서 높은 세정 효율을 가지는 대체 세정 방안으로 이용할 수 있음을 확인하였다.

  • PDF

Improving Efficiencies of DSC by Down-conversion of LiGdF4:Eu (Eu이 도핑된 LiGdF4의 Down-conversion을 이용한 염료감응형 태양전지의 효율 향상)

  • 김현주;송재성;김상수
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.17 no.3
    • /
    • pp.323-328
    • /
    • 2004
  • Down-conversion of Eu$^{3+}$ doped LiGdF$_4$ (LGF) for increasing the cell efficiency on dye-sensitized Ti $O_2$ solar cells has been studied. The dye sensitized solar cell (DSC) consisting of mesoporous Ti $O_2$ electrode deposited on transparent substrate, an electrolyte containing I$^{[-10]}$ /I$_3$$^{[-10]}$ redox couple, and Pt counter electrode is a promising alternative to the inorganic solar cell. The structure of DSC is basically a sandwich type, viz., FTO glass/Ru-red dye-absorbed Ti $O_2$/iodine electrolyte/sputtered Pt/FTO glass. The cell without down converter had open circuit potential of approximately 0.66 Volt, the short circuit photocurrent density of 1.632 mA/$\textrm{cm}^2$, and fill factor of about 50 % at the excitation wavelength of 550 nm. In addition, 5.6 mW/$\textrm{cm}^2$ incident light intensity beam was used as a light source. From this result, the calculated monochromatic efficiency at the wavelength of 550 nm of this cell was about 9.62 %. The incident photon to current conversion efficiency (IPCE) of N3 used as a dye in this work is about 80 % at around 590 nm and 610 nm, which is the emission spectrum of Eu$^{3+}$ doped LGF, results in efficiency increasing of DSC.C.

2-Wavelength Organic Light-Emitting Diodes Using Bebq2 Selectively Doped with (pq)2Ir(acac) (Bebq2에 (pq)2Ir(acac)가 선택 도핑된 2-파장 유기발광다이오드)

  • Kim, Min-Young;Ji, Hyun-Jin;Jang, Ji-Geun
    • Korean Journal of Materials Research
    • /
    • v.21 no.4
    • /
    • pp.212-215
    • /
    • 2011
  • New organic light-emitting diodes with structure of indium-tin-oxide[ITO]/N,N'-diphenyl-N, N'-bis-[4-(phenyl-m-tolvlamino)-phenyl]-biphenyl-4,4'-diamine[DNTPD]/1,1-bis-(di-4-poly-aminophenyl) cyclohexane[TAPC]/bis(10-hydroxy-benzo(h)quinolinato)beryllium[Bebq2]/Bebq2:iridium(III)bis(2-phenylquinoline-N,C2')acetylacetonate[(pq)2Ir(acac)]/ET-137[electron transport material from SFC Co]/LiF/Al using the selective doping of 5%-(pq)2Ir(acac) in a single Bebq2 host in the two wavelength (green, orange) emitter formation were proposed and characterized. In the experiments, with a 300${\AA}$-thick undoped emitter of Bebq2, two kinds of devices with the doped emitter thicknesses of 20${\AA}$ and 40${\AA}$ in the Bebq2:(pq)2Ir(acac) were fabricated. The device with a 20${\AA}$-thick doped emitter is referred to as "D-1" and the device with a 4${\AA}$-thick doped emitter is referred to as "D-2". Under an applied voltage of 9V, the luminance of D-1 and D-2 were 7780 $cd/m^2$ and 6620 $cd/m^2$, respectively. The electroluminescent spectrum of each fabricated device showed peak emissions at the same two wavelengths: 508 nm and 596 nm. However, the relative intensity of 596 nm to 508 nm at those wavelengths was higher in the D-2 than in the D-1. The D-1 and D-2 devices showed maximum current efficiencies of 5.2 cd/A and 6.0 cd/A, and color coordinates of (0.31, 0.50) and (0.37, 0.48) on the Commission Internationale de I'Eclairage[CIE] chart, respectively.

Analysis of Subthreshold Behavior of FinFET using Taurus

  • Murugan, Balasubramanian;Saha, Samar K.;Venkat, Rama
    • JSTS:Journal of Semiconductor Technology and Science
    • /
    • v.7 no.1
    • /
    • pp.51-55
    • /
    • 2007
  • This paper investigates the subthreshold behavior of Fin Field Effect Transistor (FinFET). The FinFET is considered to be an alternate MOSFET structure for the deep sub-micron regime, having excellent device characteristics. As the channel length decreases, the study of subthreshold behavior of the device becomes critically important for successful design and implementation of digital circuits. An accurate analysis of subthreshold behavior of FinFET was done by simulating the device in a 3D process and device simulator, Taurus. The subthreshold behavior of FinFET, was measured using a parameter called S-factor which was obtained from the $In(I_{DS})\;-\;V_{GS}$ characteristics. The value of S-factor of devices of various fin dimensions with channel length $L_g$ in the range of 20 nm - 50 nm and with the fin width $T_{fin}$ in the range of 10 nm - 40 nm was calculated. It was observed that for devices with longer channel lengths, the value of S-factor was close to the ideal value of 60 m V/dec. The S-factor increases exponentially for channel lengths, $L_g\;<\;1.5\;T_{fin}$. Further, for a constant $L_g$, the S factor was observed to increase with $T_{fin}$. An empirical relationship between S, $L_g$ and $T_{fin}$ was developed based on the simulation results, which could be used as a rule of thumb for determining the S-factor of devices.

Damage studies on irradiated tungsten by helium ions in a plasma focus device

  • Seyyedhabashy, Mir mohammadreza;Tafreshi, Mohammad Amirhamzeh;bidabadi, Babak Shirani;Shafiei, Sepideh;Nasiri, Ali
    • Nuclear Engineering and Technology
    • /
    • v.52 no.4
    • /
    • pp.827-834
    • /
    • 2020
  • Damage of tungsten due to helium ions of a PF device was studied. The tungsten was analyzed by SEM and AFM after irradiation. SEM revealed fine bubbles of helium atoms with diameters of a few nanometers, which join and form larger bubbles and blisters on the surface of tungsten. This observation confirmed the results of molecular dynamics simulation. SEM analysis after etching of the irradiated surface indicated cavities with depth range of 35-85 nm. The average fluence of helium ion of the PF device was calculated about 5.2 × 1015 cm-2 per shot, using Lee code. Energy spectrum of helium ions was estimated using a Thomson parabola spectrometer as a function of dN/dE ∝ E-2.8 in the energy range of 10-200 keV. The characteristics of helium ion beam was imported to SRIM code. SRIM revealed that the maximum DPA and maximum helium concentration occur in the depth range of 20-50 nm. SRIM also showed that at depth of 30 nm, all of the tungsten atoms are displaced after 20 shots, while at depth of higher than 85 nm the destruction is insignificant. There is a close match between SRIM results and the measured depths of cavities in SEM images of tungsten after etching.

The Effects of Silica Nanoparticles in Macrophage Cells

  • Kim, Seungjae;Jang, Jiyoung;Kim, Hyojin;Choi, Hoon;Lee, Kangtaek;Choi, In-Hong
    • IMMUNE NETWORK
    • /
    • v.12 no.6
    • /
    • pp.296-300
    • /
    • 2012
  • Silica nanoparticles, which are applicable in many industrial fields, have been reported to induce cellular changes such as cytotoxicity in various cells and fibrosis in lungs. Because the immune system is the primary targeting organ reacting to internalized exogenous nanoparticles, we tried to figure out the immunostimulatory effect of silica nanoparticles in macrophages using differently sized silica nanoparticles. Using U937 cells we assessed cytotoxicity by CCK-8 assay, ROS generation by CM-$H_2DCFDA$, intracellular $Ca^{{+}{+}}$ levels by staining with Fluo4-AM and IL-8 production by ELISA. At non-toxic concentration, the intracellular $Ca^{{+}{+}}$ level has increased immediately after exposure to 15 nm particles, not to larger particles. ROS generation was detected significantly in response to 15 nm particles. However, all three different sizes of silica nanoparticles induced IL-8 production. 15 nm silica nanoparticles are more stimulatory than larger particles in cytotoxicity, intracellular $Ca^{{+}{+}}$ increase and ROS generation. But IL-8 production was induced to same levels with 50 or 100 nm particles. Therefore, IL-8 production induced by silica nanoparticles may be dependent on other mechanisms rather than intracellular $Ca^{{+}{+}}$ increase and ROS generation.

Property change of organic light-emitting diodes due to a SAM treatment of the ITO surface (ITO 표면의 SAM형 습식 개질에 의한 유기 발광 소자의 특성 변화)

  • Na, Su-Hwan;Joo, Hyun-Woo;An, Hui-Chul;Kim, Tae-Wan;Song, Min-Jong;Lee, Ho-Sik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2008.11a
    • /
    • pp.314-315
    • /
    • 2008
  • We have studied a property change of organic light-emitting diodes (OLED)s due to a surface reformation of indium-tin-oxide(ITO) substrate. An ITO is widely used as a transparent electrode in light-emitting diodes, and the OLEDs device performance is sensitive to the surface properties of the ITO. The ITO surface reformation could reduce the Schottky barrier at the ITO/organic interface and increase the adhesion of the organic layer onto the electrode. We have studied the characteristics of OLEDs with a treatment by a wet processing of the ITO substrate. The self-assembled monolayer(SAM) was used for wet processing. The characteristics of OLEDs were improved by SAM treatment of an ITO in this work. The OLEDs with a structure of ITO/TPD(50nm)/$Alq_3$(70nm)/LiF(0.5nm)/Al(100nm) were fabricated, and the surface properties of ITO were investigated by using seneral characterization techniques. Self-assembled monolayer introduced at the anode/organic interface gave an improvement in turn-on voltage, luminance and external quantum efficiency compared to the device without the SAM layer. SAM-treatment time of the ITO substrate was made to be 0/10/15/20/25min. The current efficiency of the device with 15min. treated SAM layer was increased by 3 times and the external quantum efficiency by 2.6 times.

  • PDF

Surface Properties of WO3/Ag/WO3 Transparent Electrode Film with Multilayer Structures (적층구조에 적용하기 위한 WO3/Ag/WO3 투명전극막의 표면 특성 제어)

  • Kang, Dong-Soo;Lee, Boong-Joo;Kwon, Hong-Kyu;Shin, Paik-Kyun
    • The Transactions of The Korean Institute of Electrical Engineers
    • /
    • v.64 no.9
    • /
    • pp.1323-1329
    • /
    • 2015
  • The WO3/Ag/WO3 transparent thin films are fabricated by the RF magnetron sputtering. This has a transmittance of front and rear about 90% in the visible light range and surface resistance of 6.41Ω/□. In this paper, we analyzed the surface characteristics caused by the working pressure and O2 plasma surface treatment to apply a transparent electrode that was prepared to the laminated structure with other materials. The working pressure was changed in the WO3 film to 10mTorr, 7mTorr, and 5mTorr, it showed a lower than roughness of conventional ITO. In addition, by 55.5774 J/m2 at 5mTorr, it shows the hydrophobic property with lower process pressure. O2 plasma surface treatment was changed at the condisions of the RF power to 150W, 100W, and 50W and the process time to 240s, 180s, 120s, and 60s. The surface roughness are the maximum roughness(Rmax) 6.437nm and the average roughness(Rq) 0.827nm at RF power 150W, and the maximum roughness (Rmax) 6.880nm and the average roughness (Rq) 0.839nm at process time 240sec. It showed a lower value than the surface treatment. also about working pressure and process time is increased, it showed the hydrophobic.