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Dependence of the Heterojunction Diode Characteristics of ZnO/ZnO/p-Si(111) on the Buffer Layer Thickness (버퍼막 두께에 따른 ZnO/ZnO/p-Si(111) 이종접합 다이오드 특성 평가)

  • Heo, Joo-Hoe;Ryu, Hyuk-Hyun;Lee, Jong-Hoon
    • Korean Journal of Materials Research
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    • v.21 no.1
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    • pp.34-38
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    • 2011
  • In this study, the effects of an annealed buffer layer with different thickness on heterojunction diodes based on the ZnO/ZnO/p-Si(111) systems were reported. The effects of an annealed buffer layer with different thickness on the structural, optical, and electrical properties of zinc oxide (ZnO) films on p-Si(111) were also studied. Before zinc oxide (ZnO) deposition, different thicknesses of ZnO buffer layer, 10 nm, 30 nm, 50 nm and 70 nm, were grown on p-Si(111) substrates using a radio-frequency sputtering system; samples were subsequently annealed at $700^{\circ}C$ for 10 minutes in $N_2$ in a horizontal thermal furnace. Zinc oxide (ZnO) films with a width of 280nm were also deposited using a radio-frequency sputtering system on the annealed ZnO/p-Si (111) substrates at room temperature; samples were subsequently annealed at $700^{\circ}C$ for 30 minutes in $N_2$. In this experiment, the structural and optical properties of ZnO thin films were studied by XRD (X-ray diffraction), and room temperature PL (photoluminescence) measurements, respectively. Current-voltage (I-V) characteristics were measured with a semiconductor parameter analyzer. The thermal tensile stress was found to decrease with increasing buffer layer thickness. Among the ZnO/ZnO/p-Si(111) diodes fabricated in this study, the sample that was formed with the condition of a 50 nm thick ZnO buffer layer showed a strong c-axis preferred orientation and I-V characteristics suitable for a heterojunction diode.

The Inclusion Complex Formation of Cyclodextrin and Congo Red in Aqueous Solution (수용액상에서 Cyclodextrin과 Congo Red 간의 복합체 형성)

  • Kim, Chang Suk;Kim, Dong Won;Bahn, Woo Kyoung
    • Analytical Science and Technology
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    • v.15 no.2
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    • pp.115-119
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    • 2002
  • The formation of inclusion complexes between cyclodextrin(CD) and Congo red was studied by spectrophotometric methods at various temperatures. The cavity sizes are 0.49 nm, 0.62 nm for $\alpha$-and $\beta$-CD, respectively. Therefore, $\alpha$-CD was not found to form an inclusion complex with Congo red due to steric hinderance. In the $\beta$-CD use two $\beta$-CD molecules formed an inclusion complex with one molecule of Congo red, from the slope of the S-shaped curve increased. Two prominent isosbestic points appear at 346 nm and 478 nm. The formation constants were decreased with the increasing temperatures, due to low binding energy between $\beta$-CD and Congo red. The thermodynamic parameters were calculated from the plot of $lnK_f$ vs 1/T. The $\Delta$H, $\Delta$S and $\Delta$G were -50.73 kJ/mol, $-108.96J/K{\cdot}mol$ and -18.26 kJ/mol, respectively.

Effects of Rapid Thermal Annealing on the Properties of AZO Thin Films Grown by Radio-frequency Magnetron Sputtering (라디오파 마그네트론 스퍼터링으로 증착된 AZO 박막의 특성에 대한 급속 열처리 효과)

  • Cho, Shin-Ho
    • Journal of the Korean Vacuum Society
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    • v.18 no.5
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    • pp.377-383
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    • 2009
  • Aluminum-doped zinc oxide (AZO) thin films were deposited on sapphire substrate by using radio-frequency magnetron sputtering and were performed in the temperature range of $600-900^{\circ}C$ by rapid thermal annealing (RTA). The crystallographic structure and the surface morphology were investigated by using X-ray diffraction and scanning electron microscopy, respectively. The crystallinity of the films was improved with increasing the annealing temperature and the average size of crystalline grains was found to be 50 nm. All the thin films showed an average transmittance of 92% in the wavelength range of 400-1100 nm. As the annealing temperature was increased, the bandgap energy was decreased and the violet photoluminescence (PL) signal at 400 nm replaced the ultraviolet PL signal. The electrical properties of the thin films showed a significant dependence on the annealing temperature.

Fine Structure in Magnetization Reversal of Permalloy/Cu Multilayer (Permalloy/Cu 다층막 자화반전의 미세 구조)

  • 이긍원;염민수;장인우;변상진;이제형;박병기
    • Journal of the Korean Magnetics Society
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    • v.11 no.5
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    • pp.179-183
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    • 2001
  • Magnetoresistance and Planar Hall effect of Glass/Ni$\sub$83/Fe$\sub$17/(2 nm)/[Cu(2 nm)Ni$\sub$83/Fe$\sub$17/(20 nm)]$\sub$50/ multilayer were measured. Repeated saw tooth like planar Hall effect signal was observed in the range of magnetization reversal process, while no sign of such saw tooth was observed in Magnetoresistance diagram. For the reason of saw tooth like signal, it is supposed that subsequent abrupt domain wall motion of each magnetic layer in the process of magnetization reversal process was observed in planar Hall effect in transverse direction to the current direction. This fine structure of planar Hall effect was observed for applied fields in any direction. Magnetoresistance curve did not show this fine structure of magnetization reversal, of course, since only net magnetization of each layer has to do with the resistivity. Extended research on the reason of this sawtooth like signal should be conducted.

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Synthesis of Titanium Dioxide Nanoparticles with a High Crystalline Characteristics (높은 결정성을 갖는 이산화티탄 나노입자의 합성)

  • Kim, Ki-Chul
    • Journal of Convergence for Information Technology
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    • v.7 no.5
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    • pp.53-58
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    • 2017
  • In the age of oil exhaustion, low cost, semi-transparent solar cell, the dye-sensitized solar cell (DSC) has attracted significant attention since 1991 of $Gr{\ddot{a}}tzel$ report. To enhance the light-harvest capability of the photoelectric electrode, and efficiency of photoelectric transformation of the DSC, scattering layer of various structure have been proposed to photoelectric electrode materials. The scattering center of scattering layer needs the large titanium dioxide nanoparticles of 250 - 300 nm in diameter. In this study, the large sized $TiO_2$ nanocyrstals of around 300 nm were synthesized using the modified sol-gel process. According to the analysis of XRD and TEM, the synthesized $TiO_2$ nanoparticles exhibit single crystals of anatase phase. The optical transmittance of the synthesized titanium dioxide film prepared by spin coating is around 50% at 550 nm. It is suitable for scattering layer as a scattering center, and expected to enhance the efficiency of photoelectric transformation of the DSC.

A Study on the Millbase Dispersion for LCD Color Filters (LCD 컬러필터용 밀베이스의 분산 연구)

  • Jung, Il-Bong;Ahn, Suk-Chul;Nam, Su-Yong
    • Clean Technology
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    • v.14 no.1
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    • pp.21-28
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    • 2008
  • The properties of the dispersion of the red, green, and blue pigments were investigated for the manufacture of the millbase of LCD color filters. Their physical properties and viscosity were controlled to apply to the screen printing in order to substitute the existing photolithography method. The best dispersion properties were obtained with dispersant BYK-2000 and monomer EB-140. The millbase was pre-mixed at 500 rpm for 30 min, and dispersed at 4000 rpm for 5 - 6 hour by Torus Mill. The resulting particle sizes were $100{\sim}110\;nm$ for red, $50{\sim}70\;nm$ for green, and $60{\sim}80\;nm$ for blue. When the millbase viscosity was 200-300 cps in the low viscosity formulation, an efficient impact of the beads on pigments was achieved. The dispersion properties were confirmed from the rheological behavior and color characteristics.

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The Vertical Alignment of CNTs and Ni-tip Removal by Etching at ICPHFCVD (ICPHFCVD에 의한 탄소나노튜브의 수직 배향과 에칭을 이용한 Ni-tip의 제거)

  • 김광식;장건익;장호정;류호진
    • Journal of the Microelectronics and Packaging Society
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    • v.9 no.4
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    • pp.55-60
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    • 2002
  • This paper presents a technique for the preparation of vertically grown CNTs by ICPHFCVD(inductively coupled plasma hot filament chemical vapor deposition) below $580^{\circ}C$. Purification of the CNTs(carbon nanotubes) using RE(radio frequency) plasma in a one step process, based on the different etching property of the Ni-tip, amorphous carbon and carbonaceous materials is also discussed. After purifying the grown materials. CNTs shown the multi walled and hollow typed structure. The typical outer and inner diameters or CNT were 50 nm and 25 nm, respectively. The graphitic wall was composed of 82 layers and the distance between wall and wall was 0.34 nm. From the results of TEM observation, the Ni catalyst at the tip of the carbon nanotubes were effectively removed by using a RF plasma etching, continuously.

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Physicochemical Properties of Antioxidant Fractions Extracted from Freeze-Dried Coffee by Various Solvents (동결건조 커피의 순차용매 분획별 특성과 항산화 효과)

  • Rhi, Ju-Won;Shin, Hyo-Sun
    • Korean Journal of Food Science and Technology
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    • v.28 no.1
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    • pp.109-116
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    • 1996
  • The relationship between antioxidant activities and physicochemical properties of several fractions obtained from freeze-dried (FD) coffee were investigated. The nine kinds of fraction were consecutively extracted from FD coffee with solvents in increasing order of polarity, and the higher polarity of the solvent the higher extraction yield of the fraction. The antioxidant activities of the fractions were determined by Rancimat and oven test on edible oils. The antioxidant activities of the fractions increased in the order of acetone>ethanol>methanol>50% methanol/water>water fraction, and the antioxidant activities of them were higher on lard than on soybean oil. The antioxidant activity of each fraction was strongly related to the contents of total phenol, total nitrogen content and acidity, whereas color intensity, reducing power, carboxylic acid content showed little contribution to the activity. All fractions had three peaks maxima at 208, 275 and 324 nm on UV-visible spectra, but the only one at 324 nm was linealy proportional to the antioxidant activities of the fractions.

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Anti-Reflection Coating Application of SixOy-SixNy Stacked-Layer Fabricated by Reactive Sputtering (반응성 스퍼터링으로 제작된 SixOy-SixNy 적층구조의 반사방지 코팅 응용)

  • Gim, Tzang-Jo;Lee, Boong-Joo;Shina, Paik-Kyun
    • Journal of the Korean Vacuum Society
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    • v.19 no.5
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    • pp.341-346
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    • 2010
  • In this paper, anti-reflection coating was investigated for decreasing the reflection in visible range of 400~650 [nm] through four staked layers of $Si_xO_y$ and $Si_xN_y$ thin films prepared by reactive sputtering method. Si single crystal of 6 [inch] diameter was used as a sputtering target. Ar and $O_2$ gases were used as sputtering gases for reactive sputtering for the $Si_xO_y$ thin film, and Ar and $N_2$ gases were used for reactive sputtering for the $Si_xN_y$ thin film. DC pulse power of 1900 [W] was used for the reactive sputtering. Refractive index and deposition rate were 1.50 and 2.3 [nm/sec] for the $Si_xO_y$, and 1.94 and 1.8 [nm/sec] for the $Si_xN_y$ thin film, respectively. Considering the simulation of the four layer anti-reflection coating structure with the above mentioned films, the $Si_xO_y-Si_xN_y$ stacked four-layer structure was prepared. The reflection measurement result for that structure showed that a "W" shaped anti-reflection was obtained successfully with a reflection of 1.7 [%] at 550 [nm] region and a reflection of 1 [%] at 400~650 [nm] range.

Thermal Stability Enhancement of Nickel Monosilicides by Addition of Pt and Ir (Pt와 Ir 첨가에 의한 니켈모노실리사이드의 고온 안정화)

  • Yoon, Ki-Jeong;Song, Oh-Sung
    • Journal of the Microelectronics and Packaging Society
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    • v.13 no.4
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    • pp.27-36
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    • 2006
  • We fabricated thermally evaporated 10 nm-Ni/(poly)Si, 10 nm-Ni/l nm-Ir/(poly)Si and 10 nm-Ni/l nm-Pt/(poly)Si films to investigate the thermal stability of nickel monosilicides at the elevated temperatures by rapid annealing them at the temperatures of $300{\sim}1200^{\circ}C$ for 40 seconds. Silicides of 50 nm-thick were formed on top of both the single crystal silicon actives and the polycrystalline silicon gates. A four-point tester was used to examine sheet resistance. A scanning electron microscope and field ion beam were employed for thickness and microstructure evolution characterization. An X-ray diffractometer and an Auger depth profiler were used for phase and composition analysis, respectively. Nickel silicides with platinum have no effect on widening the NiSi stabilization temperature region. Nickel silicides with iridium farmed on single crystal silicon showed a low resistance up to $1200^{\circ}C$ while the ones formed on polycrystalline silicon substrate showed low resistance up to $850^{\circ}C$. The grain boundary diffusion and agglomeration of silicides lowered the NiSi stable temperature with polycrystalline silicon substrates. Our result implies that our newly proposed Ir added NiSi process may widen the thermal process window for nano CMOS process.

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