• 한국결정성장학회지
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• 제8권4호
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• pp.550-554
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• 1998

Bridgman-Stockbarger법에서 thermal screen의 역할을 하는 새로운 방법을 6inch 형석(CaF2) 단결정성장을 위하여 고안하였다. 본 방법으로 poly-grain으로의 성장과 내부 cavity, 그리고 solid-liquid(SL) interface를 제어할 수 있었다. Graphite pipe와 ceramic warmer를 사용하여 성장한 6inch의 CaF2 결정은 완전한 단결정으로 성장하였다. 이때의 조건은 2mm/hr의 성장속도, 성장구역에서의 $14^{\circ}C$/cm의 온도구배, 그리고 도가니의 conical tip에서 $1324^{\circ}C$의 온도를 나타내었다. 내부 cavity에 의해 발생되는 light scattering 현상은 성장속도를 감소시키거나 융액을 회전함으로써 제어할 수 있었다.

• 한국결정성장학회:학술대회논문집
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• 한국결정성장학회 1999년도 PROCEEDINGS OF 99 INTERNATIONAL CONFERENCE OF THE KACG AND 6TH KOREA·JAPAN EMG SYMPOSIUM (ELECTRONIC MATERIALS GROWTH SYMPOSIUM), HANYANG UNIVERSITY, SEOUL, 06월 09일 JUNE 1999
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• pp.129-157
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• 1999

Low-dislocation-density large-diameter GaAs single crystals with low-residual-strain have been strongly required. We have developed dislocation-free 3-inch Si-doped GaAs crystals for photonic devices [1], and low-dislocation-density low-residual-strain 4-inch to 6-inch [2, 3] semi-insulating GaAs crystals for electronic devices by Vertical Boat (VB) technique. We confirmed that VB substrates with low-residual-strain have higher resistance against slip-line generation during MBE process. VB-GaAs single crystals show uniform radial profile of resistivity reflecting to the flat solid-liquid interface during the crystal growth. Uniformity of micro-resistivity of VB-GaAs substrate is much better than that of the LEC-GaAs substrate, which is due to the low-dislocation-density of VB-GaAs single crystals.

• 한국결정성장학회지
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• 제28권4호
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• pp.170-174
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• 2018

AlN 결정은 직경 1인치 크기의 기판이 개발되었고 계속 품질의 향상을 위해 연구되고 있다. 한편 2인치급 기판은 UV LED 칩 제조와 원가 감소를 위해 개발이 필요한 실정이다. 본 연구에서는 PVT 법으로 2인치의 AlN 결정을 SiC 기판상에 성장된 AlN 박막을 종자로 사용하여 성장의 가능성을 보고자 하였다. $10{\mu}m$ 두께의 AlN 박막 결정을 종자결정으로 사용하여 두께 7 mm의 AlN 결정을 성장하였다. 성장된 결정은 금속현미경과 실체현미경, DCXRD를 사용하여 분석하였다.

• 한국결정성장학회:학술대회논문집
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• 한국결정성장학회 1998년도 PROCEEDINGS OF THE 15TH KACG TECHNICAL MEETING-PACIFIC RIM 3 SATELLITE SYMPOSIUM SESSION 4, HOTEL HYUNDAI, KYONGJU, SEPTEMBER 20-23, 1998
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• pp.9-13
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• 1998

Large vacuum Bridgman-Stockbarger (BS) equipments was composed for growing large diameter CaF2 crystals. The CaF2 crystal of 4.5-inch was grown under the conditions of freezing temperature gradient of 12$^{\circ}C$/cm and growing rate of 3mm/hr. Also the 6-inch crystal was grown by using thermal stabilization method under freezing temperature gradient of 14$^{\circ}C$/cm and growing rate of 2mm/hr. The dislocation density was characterized for evaluating the quality of crystals. And the optical properties such as transmittance, refractive index and fluorescence were analyzed in order to investigate on the applications of optical components.

• 한국결정성장학회지
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• 제25권6호
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• pp.231-238
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• 2015

사파이어 단결정은 GaN계 화합물 증착이 용이하여 고휘도 LED(Light Emitting Diode), 고출력 레이저 산업 등에서 크게 각광받고 있다. 다양한 사파이어 단결정 제조공법 중 vertical Bridgman 공법은 고품질의 사파이어를 c-축 방향으로 성장시킬 수 있는 공법이며 상업적으로 적용이 검토되고 있다. 본 연구에서는 2인치 사파이어 성장 vertical Bridgman 공정에서 성장시 온도구배에 의해 발생하는 열응력을 유한요소 모델을 통해 분석하였다. 이를 통해 성장시 수직, 수평방향으로의 온도구배가 사파이어 결정의 열응력과 결함발생에 미치는 영향을 검토하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.223.1-223.1
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• 2013

Since sapphire single crystal is one of the materials that have excellent mechanical and optical properties, the single crystal is widely used in various fields, and the demand for the use of substrate of LED devices is increasing rapidly. However, crystal defects such as dislocations and stacking faults worsen the properties of the single crystal intensely. When sapphire wafer of single crystal is used as LED substrate, especially, crystal defects have a strong influence on the characteristics of a film deposited on the wafer. In such a case quantitative assessment of the defects is essential, and the evaluation technique is now becoming one of the most important factors in commercialization of sapphire wafer. Wet etching is comparatively easy and accurate method to estimate dislocation density of single crystal because etching reaction primarily takes place where dislocations reached crystal surface which are chemically weak points, and produces etch pit. In the present study, the formation behavior of etch pits and etching time dependence were studied systematically. Etch pit density(EPD) analysis using optical microscope was also conducted and measurement uncertainty of EPD was studied to confirm the reliability of the results. EPDs and measurement uncertainties for 4 inch sapphire wafers were analyzed in terms of 5 and 21 points EPD readings. EPDs and measurement uncertainties in terms of 5 points readings for 4 inch wafers were compared by 2 organizations. We found that the average EPD value in terms of 5 points readings for a 4 inch sapphire wafer may represent the EPD value of the wafer.

• 한국결정성장학회:학술대회논문집
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• 한국결정성장학회 1996년도 The 9th KACG Technical Annual Meeting and the 3rd Korea-Japan EMGS (Electronic Materials Growth Symposium)
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• pp.526-526
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• 1996

The single crystal of LiTaO3 is well known eletro-optic material as well as the piezoelectric one applied to SAW filter. LiTaO3 has large electro-optic effects, so applied to optical switch, acosto-optic deflector, and optical memory device using photorefractive effects. The crystal growth of SAW-grade LiTaO3 has been studied many aspects, but there is no detail research about optic-grade crystal growth. The conditions of optic-grade LiTaO3 single crystal are as below. The optical transmittance must be over 75%, and axial and radial concentratiom uniformity below 1%. The variation of Curie temperature depending on Li/Ta ratio must be also below 2$^{\circ}C$ and no internal no internal cracks and defects. Because of the limitation of crystal quality, the growing of optic-grade LiTaO3 single crystal is very difficult compared with the growing of SAW-grade. In this research, upper conditions of optic-grade single crystal was investigated after growing of 1 inch diameter and 1.5 inch length LiTaO3 single crystal having no internal cracks and defects using Czochralski method. Curie temperature was determined with DSC and measuring capacitance and lattice parameter was calculated about the grown crystal and ceramic powder samples of various Li/Ta ratio. The result of Tc variation was below 1.2$^{\circ}C$ all over the grown crystal, so it is confirmed that LiTaO3 was grown under congruent melting composition having optical homogeniety. Also, the optical transmittance was about 78%, which was sufficient for optical device.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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• pp.452-455
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• 2002

Single crystal 3C-SiC(cubic silicon carbide) thin-films were deposited on Si(100) substrate up to a thickness of $4.3{\mu}m$ by APCVD method using HMDS(hexamethyildisilane) at $1350^{\circ}C$. The HMDS flow rate was 0.5 sccm and the carrier gas flow rate was 2.5 slm. The HMDS flow rate was important to get a mirror-like crystal surface. The growth rate of the 3C-SiC films was $4.3{\mu}m/hr$. The 3C-SiC epitaxical films grown on Si(100) were characterized by XRD, AFM, RHEED, XPS and raman scattering, respectively. The 3C-SiC distinct phonons of TO(transverse optical) near $796cm^{-1}$ and LO(longitudinal optical) near $974{\pm}1cm^{-1}$ were recorded by raman scattering measurement. The heteroepitaxially grown films were identified as the single crystal 3C-SiC phase by XRD spectra$(2{\theta}=41.5^{\circ})$.

• Journal of Information Display
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• 제7권3호
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• pp.1-4
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• 2006

2.22-inch qVGA $(240{\times}320)$ amorphous silicon thin film transistor liquid active matrix crystal display (a-Si TFT-AMLCD) panel has been successfully demonstrated employing a 2.5 um fine-patterning technology by a wet etch process. Higher resolution 2.22-inch qVGA LCD panel with an aperture ratio of 58% can be fabricated as the 2.5 um fine pattern formation technique is integrated with high thermal photo-resist (PR) development. In addition, a novel concept of unique a-Si TFT process architecture, which is advantageous in terms of reliability, was proposed in the fabrication of 2.22-inch qVGA LCD panel. Overall results show that the 2.5 um fine-patterning is a considerably significant technology to obtain higher aperture ratio for higher resolution a-Si TFT-LCD panel realization.

• 한국결정성장학회지
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• 제8권3호
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• pp.383-387
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• 1998

대구경(직경 4inch이상) $CaF_2$ 단결정성장을 위하여 vacuum-Bridgman 장치를 구성하였으며, 성장속도 2mm/hr, 성장온도구배 $12^{\circ}C$/cm의 조건하에서 성장한 $CaF_2$ 단결정은 우수한 물성을 갖는 것으로 분석되었다. 우산형(umbrella shape)의 Mo thermal reflector를 사용한 경우에 polycrystalline으로의 성장을 제거할 수 있었다. 성장우선방위는 (111)면이었으며, 분말 XRD법에 의한 peak로부터 $5.460\AA$의 격자상수를 구하였다. 또한 XRD분석에 의하면 제2상은 형성되지 않았으며, EPD값은 $1.4{\times}10^4 \textrm{cm}^{-2}$이었다. 성장된 결정은 UV영역의 광학부품용도로 사용하기에 적합한 투과율 91%이상의 특성을 나타내었다.