• Korean Journal of Microbiology
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• v.30 no.5
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• pp.333-338
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• 1992

Saccharomyces cerevisiae contains 10-nm tilament ring which lies just under the inner surface of the plasma membrane within the mother-bud neck. Although H)-nm filaments may he involved in cellular morphogenesis. their role and organization are not clear. Here we report the production of antihodies specific for the CDel2 protein hy use of gene fusion techniques. and studies on the organization and function of IO-nm filaments using these antibodies. The CDCl2 protein arc translated through the whtlle cell cycle and present in the cytosol. 'They are polymerized just before bud emergence and unpolymerized alier cytokinesis. and do not have organizational relationship with actin. Thc possible role of 10-nm filaments is the determination of bud emergence site and completion of cytokinesis.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.05a
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• pp.119-122
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• 2004

This paper discovers that we form holographic grating in AsGeSeS thin film. Holographic grating is not developed in the length of 10,20,40nm, while it is formed in the thin film of 80nm though it shows very low diffraction efficiency. On the contrary, holographic grating is established in every thin film of Ag(10nm)/AsGeSeS(10,20,40,80nm). Lattice in 10,20 nm thin film builds up, and immediately disappears. In the case of 40nm thin film, even if holographic grating is made up, it seems to have a low diffraction efficiency. Apart from 10,20,40nm, it shows the highest diffraction efficiency in the thin film of 80nm.

• Korean Journal of Optics and Photonics
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• v.8 no.6
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• pp.450-455
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• 1997

A pulsed Ti:sapphire laser with a Z-folded cavity, which was pumped by a freqeuncy-doubled Nd:YAG laser, was developed. It shows 120 nm wavelength tuning range from 740 nm to 860 nm with 90 nm FWHM under a pumping energy of 3 mJ with 18% output coupler. Using a birefringent filter, the effective efficiency was improved about 10 times compare to without a birefringent filter. The output energy obtained was $\365mu$Jwith 4 nm FWHM. And the wavelength tuning range was broadened to about 160 nm within an output energy fluctuation of $\pm$10%.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.9
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• pp.873-877
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• 2006

We have fabricated top omission organic light emitting diodes with transparent Ba/Ag double layer cathodes deposited by using thermal evaporation method. The device structure was $glass/Ni(200nm)/2-TNATA(15 nm)/{\alpha}-NPD(15nm)Al_{q3}:C545T\;(1%,\;35nm)/BCP(5nm)/Ba(10nm)/Ag(8nm)$. The optical transmittance of the Ba(10 nm)/Ag(8 nm) layer was over 60 % in the visible wavelength region. The maximum efficiency of the device was $13.7\;cd/A\;at\;0.69\;mA/cm^{2}$ and the efficiency of over 10 cd/A was achieved at wide range of current densities and luminances.

• ETRI Journal
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• v.23 no.1
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• pp.1-8
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• 2001

The performance of a long wavelength-band erbium-doped fiber amplifier (L-band EDFA) using 1530nm-band pumping has been studied. A 1530nm-band pump source is built using a tunable light source and two C-band EDFAs in cascaded configuration, which is able to deliver a maximum output power of 23dBm. Gain coefficient and noise figure (NF) of the L-band EDFA are measured for pump wavelengths between 1530nm and 1560nm. The gain coefficient with a 1545nm pump is more than twice as large as with a 1480nm pump. It indicates that the L-band EDFA consumes low power. The noise figure of 1530nm pump is 6.36dB at worst, which is 0.75dB higher than that of 1480nm pumped EDFA. The optimum pump wavelength range to obtain high gain and low NF in the 1530nm band appears to be between 1530nm and 1540nm. Gain spectra as a function of a pump wavelength have bandwidth of more than 10nm so that a broadband pump source can be used as 1530nm-band pump. The L-band EDFA is also tested for WDM signals. Flat Gain bandwidth is 32nm from 1571.5 to 1603.5nm within 1dB excursion at input signal of -10dBm/ch. These results demonstrate that 1530nm-band pump can be used as a new efficient pump source for L-band EDFAs.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.253-253
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• 2010

유리 기판 상에 시스템 온 패널과 같은 차세대 디스플레이 구현과 평판형 디스플레이의 문제점 해결을 위하여 비휘발성 메모리 소자 등의 전자 소자 집적화와 빠른 구동 속도를 가진 박막트랜지스터가 요구된다. 본 논문에서는 비휘발성 메모리 소자에서 MONOnS 각 layer층의 두께 따른 특성에 대한 연구를 진행하였다. 실험은 ONO 구조를 12.5nm/35nm/2.7nm, 12.5nm/20nm/2.3nm, 8.5nm/10nm/2.3nm, 6.5nm/10nm/1.9nm 의 두께로 증착하였다. ${\Delta}VFB$, Retention time, capacitance을 측정하여 oxide/Nitride/Oxynitride 층의 두께 변화를 통해 최적화된 tunneling layer와 charge storage layer, 그리고 blocking layer의 두께를 알 수 있다.

• Bulletin of the Korean Chemical Society
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• v.30 no.10
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• pp.2299-2302
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• 2009

By controlling the number of electrons transferred to the emitting layer, highly efficient three-wavelength WOLEDs were fabricated. Such WOLEDs are different from those made using simple stacking of RGB emitting layers in that the movement distribution of electrons transferred to emitting layer could be adjusted using the difference in LUMO energy level and that lights of all 3 wavelengths could be emitted through appropriate arrangement of RGB emitting layers. WOLED device with the structure of m-MTDTA (40 nm)/NPB (10 nm)/ Coumarin6 doped $Alq_3$ (3%) (8 nm)/ Rubrene doped NPB (5%) (15 nm)/NPB (2 nm)/ DPVBi (20 nm)/$Alq_3$ (20 nm)/LiF (1 nm)/Al (200 nm) showed high luminance efficiency of 8.9 cd/A and color purity of (0.31, 0.40). In addition, WOLED device with the thickness of non-doped NPB layer increased from 2 nm to 3 nm to increase blue light emission showed a luminance efficiency of 7.6 cd/A and color purity of (0.28, 0.36).

• Korean Journal of Metals and Materials
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• v.47 no.5
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• pp.322-329
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• 2009

60 nm- and 20 nm-thick hydrogenated amorphous silicon (a-Si:H) layers were deposited on 200 nm $SiO_2/Si$ substrates using ICP-CVD (inductively coupled plasma chemical vapor deposition). A 10 nm-Ni layer was then deposited by e-beam evaporation. Finally, 10 nm-Ni/60 nm a-Si:H/200 nm-$SiO_2/Si$ and 10 nm-Ni/20 nm a-Si:H/200 nm-$SiO_2/Si$ structures were prepared. The samples were annealed by rapid thermal annealing for 40 seconds at $200{\sim}500^{\circ}C$ to produce $NiSi_x$. The resulting changes in sheet resistance, microstructure, phase, chemical composition and surface roughness were examined. The nickel silicide on a 60 nm a-Si:H substrate showed a low sheet resistance at T (temperatures) >$450^{\circ}C$. The nickel silicide on the 20 nm a-Si:H substrate showed a low sheet resistance at T > $300^{\circ}C$. HRXRD analysis revealed a phase transformation of the nickel silicide on a 60 nm a-Si:H substrate (${\delta}-Ni_2Si{\rightarrow}{\zeta}-Ni_2Si{\rightarrow}(NiSi+{\zeta}-Ni_2Si)$) at annealing temperatures of $300^{\circ}C{\rightarrow}400^{\circ}C{\rightarrow}500^{\circ}C$. The nickel silicide on the 20 nm a-Si:H substrate had a composition of ${\delta}-Ni_2Si$ with no secondary phases. Through FE-SEM and TEM analysis, the nickel silicide layer on the 60 nm a-Si:H substrate showed a 60 nm-thick silicide layer with a columnar shape, which contained both residual a-Si:H and $Ni_2Si$ layers, regardless of annealing temperatures. The nickel silicide on the 20 nm a-Si:H substrate had a uniform thickness of 40 nm with a columnar shape and no residual silicon. SPM analysis shows that the surface roughness was < 1.8 nm regardless of the a-Si:H-thickness. It was confirmed that the low temperature silicide process using a 20 nm a-Si:H substrate is more suitable for thin film transistor (TFT) active layer applications.

• Transactions on Electrical and Electronic Materials
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• v.10 no.1
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• pp.28-30
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• 2009

We have studied organic layer-thickness dependent electrical and optical properties of bottom- and top-emission devices. Bottom-emission device was made in a structure of ITO(170 nm)/TPD(x nm)/$Alq_3$(y nm)/LiF(0.5 nm)/Al(100 nm), and a top-emission device in a structure of glass/Al(100 nm)/TPD(x nm)/$Alq_3$(y nm)/LiF(0.5 nm)/Al(25 nm). A hole-transport layer of TPD (N,N'-diphenyl-N,N'-di(m-tolyl)-benzidine) was thermally deposited in a range of 35 nm and 65 nm, and an emissive layer of $Alq_3$ (tris-(8-hydroxyquinoline) aluminum) was successively deposited in a range of 50 nm and 100 nm. Thickness ratio between the hole-transport layer and the emissive layer was maintained to be 2:3, and a whole layer thickness was made to be in a range of 85 and 165 nm. From the current density-luminance-voltage characteristics of the bottom-emission devices, a proper thickness of the organic layer (55 nm thick TPD and 85 nm thick $Alq_3$ layer) was able to be determined. From the view-angle dependent emission spectrum of the bottom-emission device, the peak wavelength of the spectrum does not shift as the view angle increases. However, for the top-emission device, there is a blue shift in peak wavelength as the view angle increases when the total layer thickness is thicker than 140 nm. This blue shift is thought to be due to a microcavity effect in organic light-emitting diodes.

• Journal of the Korean institute of surface engineering
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• v.48 no.3
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• pp.121-125
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• 2015

We studied the blue fluorescent OLED with Mg:Ag, Al, Ni as anode materials. Blue fluorescent OLEDs were fabricated using Anode / $MoO_3$ (3 nm) / 2-TNATA (60 nm) / NPB (30 nm) / SH-1 : BD-2 (5 vol.%, 30 nm) / Bphen (40 nm) / Liq (1 nm) / Al (150 nm). Current density of OLED with Mg:Ag was not measured due to too low work function, and that of OLED with Al showed $45.2mA/cm^2$ at 12 V. Luminance and Current efficiency of OLED with Al showed $385.1cd/m^2$ and 0.9 cd/A. Current density of OLED with Ni of 8, 10, 12 nm thickness showed 10, 12.9, $37.2mA/cm^2$, respectively. Luminance and Current efficiency of OLED with Ni of 8, 10, 12 nm thickness showed 670.9, 991.2, $1,320cd/m^2$ and 6.7, 7.7, 3.6 cd/A, respectively. Transmittance of Al was 52.2% at 476 nm wavelength and that of Ni of 8, 10, 12 nm thickness was 79, 77, 74 %, respectively. In spite of best current density, OLED with Al showed the lowest luminance and current efficiency because of low work function and poor transmittance. When thickness of Ni was increased to 12nm, current efficiency was sharply lower owing to bad transmittance and unbalance of holes and electrons. Finally, OLED with Ni of 10 nm thicknes showed the highest current efficiency.