• Journal of the Korean Chemical Society
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• v.33 no.5
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• pp.538-544
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• 1989

The increase of B-type hydrogen bonding character between the hydrogen atom($H{\gamma}$) of methylene group in 1-(phenoxymethyl)benzotriazole (1) and 1-(thiophenoxymetyl)benzotriazole (2) derivatives, and solvents was caused by some factors such as;electron withdrawing strength (${\rho} > 0$) of X-substituent; local diamagnetic effect by Y atom (Y = O(1) > S(2)) with adjacent methylene group; and solvent polarity parameter ($E_T$ = Kcal/mol; acetone; 42.2 > chloroform; 39.0). From the basis on the findings, linear free energy relationship (LFER) components on the substituent chemical shift of methylene group ($CH_2-SCS$) in (1) exhibited a tendency that resonance(R)-effect was much larger than field(F) (or inductive(I))-effect in acetone and that the electrical effects were depend upon the solvent.

• Applied Biological Chemistry
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• v.33 no.3
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• pp.231-238
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• 1990

The structure-antifungal activity correlations between the structure of fourteen new 1-(phenoxymethyl)benzotriazoles (I) (Y=0), 1-(thiophenoxymethyl)benzotriazoles (ll) (Y=S) and 1-(azidomethyl)benzotriazole (III) derivatives were synthesized, and their activity, fifty percent inhibition of mycelial growth($pI_{50}$), in vitro against Pyricularia oryzae, Fusarium axysporum f.sp sesami, Valsa ceratosperma and Botrytis cinerea were investigated using a generalized QSAR method. The activity of (I) was superior In those of (II) and (III). The effect of the substituents (X) on the phenoxy group (I) was rationalized by a parabolic function of electronic (${\sigma}$), steric ($B_1$) and hydrophobic parameter(${\pi}$), and hydrogen bonding (HB). Where the optimal values of substituent on the fungicidal activity againt P. oryzae and F. axysporum f.sp.sesami are $B_1=1.40A;(H)$ and ${\pi}=0.07{\sim}0.15;(H)$, and those of substituent on the fungicidal activity against V. ceratosperma and B. cinerea are ${\sigma}=0.23{\sim}0.28;\;(C1),\;{\pi}=0.70;$ (C1), respectively. The most effective compound ( I a) and ( I d) were examined in this study.

• Archives of Pharmacal Research
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• v.17 no.3
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• pp.161-165
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• 1994

New hypolipaemic agents, in which benzotriazole moiety is connected to tetrahydro-4-hydroxy-2H-pyran-2-one by a two-carbon bridge, were designed and synthesized to show sinificant cholesterol-lowering effect comparable to mevinolin.

• Transactions on Electrical and Electronic Materials
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• v.11 no.6
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• pp.288-291
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• 2010

Accidents can occur as a result of streaming electrification when transformer oil is used as an insulating oil in large ultra-high voltage transformers. Methods for adding a streaming electrification inhibitor to reduce the streaming electrification has been studied extensively. In this paper, in order to develop a method for reducing streaming electrification effectively, 4 different specimens were prepared by the addition of benzotriazole (BTA) to a virgin specimen with constant stirring. The specimens were examined to determine the appropriate amount of BTA addition that would suppress the streaming electrification most effectively. The results showed that the streaming electrification characteristics of the specimen in the streaming transformer oil were best when the amount of BTA addition was about 10 ppm. The streaming electrification current was reduced by adding 30 ppm BTA until the temperature reached $65^{\circ}C$. The polarity of the streaming electrification current was negative when the temperature exceeded $65^{\circ}C$. Therefore, the streaming electrification current, which can be a cause of transformer accidents, can be suppressed in large ultra high voltage transformer oil. This paper reports on the optimal amount of BTA addition and the best conditions for controlling the streaming velocity of transformer oil.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.366-367
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• 2005

The effect of benzotriazole (BTA) on the adhesion force of silica and pad particle on Cu/TEOS wafer surfaces was investigated with and without the addition of BTA. Cu-BTA had the isoelectric point (IEP) at around pH 4$\sim$8. Pad particles were more positive zeta potentials than silica. The adhesion force initially decreased of silica and pad particle on Cu surfaces when BTA was added. However, the more BTA was added, the more adhesion force gradually increased with the increase of BTA concentrations. Then the adhesion force of pad particle was higher than silica. And TEOS didn't resulted increasing adhesion force like Cu when BTA was added in DI water.

• Applied Chemistry for Engineering
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• v.16 no.2
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• pp.212-216
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• 2005

Benzotriazole which is used as a corrosion inhibitor for the zinc coated steel was intercalated into Na-MMT. X-ray diffraction experiments on intercalant/silicate composite samples demonstrated that the intercalation of intercalant leads to an increase in the spacing between silicate layers. Water soluble poly(ethylene-co-acrylic acid) (PEA) nanocomposites, to use as a coating agent, were prepared with these modified MMT. We found that mono-layered silicates were dispersed in PEA matrix and those resultants were exfoliated nanocomposites. From the result of salt spray test, we found that this coating agent prepared with water soluble poly(ethylene-co-acrylic acid) (PEA) nanocomposite provided good corrosion protection. These results were caused by decreasing the rate of oxygen permeation from silicate layers dispersed homogeneously in PEA matrix and the effect of corrosion inhibitor from benzotriazole.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.113-113
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• 2008

Cu CMP (Chemical Mechanical Planarization) has been used to remove copper film and obtain a planar surface which is essential for the semiconductor devices. Generally, it is known that chemical reaction is a dominant factor in Cu CMP comparing to Silicon dioxide CMP. Therefore, Cu CMP slurry has been regarded as an important factor in the entire process. This investigation focused on understanding the effect of corrosion inhibitor on copper surface and CMP results. Benzotriazole (BTA) was used as a corrosion inhibitor in this experiment. For the surface analysis, electrochemical characteristics of Cu was measured by a potentiostat and surface modification was investigated by X-ray photoelectron spectroscopy (XPS). As a result, corrosion potential (Ecorr) increased and nitrogen concentration ratio on the copper surface also increased with BTA concentration. These results indicate that BTA prevents Cu surface from corrosion and forms Cu-BTA layer on Cu surface. CMP results are also well matched with these results. Material removal rate (MRR) decreased with BTA concentration and static etch rate also showed same trend. Consequently, adjustment of BTA concentration can give us control of step height variation and furthermore, this can be applicable for Cu pattern CMP.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1996.05a
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• pp.158-161
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• 1996

The static charges are generated by streaming electrification phenomena in insulating oil flowing by force for the purpose of cooling at the internal of Ultra-high power transformer. In this thesis, their elimination method was studied. In this paper the effect of Additive on the electric conductivity of Insulating oil is studied. The variation of electric conductivity disappear when Additive is molten in insulating oil BTA(Benzotriazole) appear more variation of electric conductivity than that of SP-S10(Sorbitan mono-stearate). But the variation is not enough to decrease streaming electrification of insulating oil($\sigma$>10$\^$-12/[S/cm]).

• Proceedings of the KIEE Conference
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• 1997.07d
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• pp.1414-1416
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• 1997

The electrical breakdown characteristics of the synthetic fluids No.2 of KS class VII used for insulating and cooling the materials for the ignition coil are studied. Also, Benzotriazole(BTA) as the streaming electrification suppressant additive is added to the oil, and the change of electrical properties due to different BTA concentration is investigated. To investigate the electrical characteristics, the breakdown strength of each specimen by an experiment for AC breakdown are analyzed. The breakdown strength of specimen by adding BTA is higher than virgin specimen in low e region, but lower than that in high region because of melting BTA. It is considered that the effective content of BTA as charge suppressant additive is about 10[ppm] from the results of AC breakdown.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.33 no.10
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• pp.1023-1028
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• 2009

Cleaning is required following CMP (chemical mechanical planarization) to remove particles. The minimization of particle residue is required with each successive technology generation, and the cleaning of wafers becomes more complicated. In copper damascene process for interconnection structure, it utilizes 2-step CMP consists of Cu and barrier CMP. Such a 2-steps CMP process leaves a lot of abrasive particles on the wafer surface, cleaning is required to remove abrasive particles. In this study, the chemical mechanical cleaning(CMC) is performed various conditions as a cleaning process. The CMC process combined mechanical cleaning by friction between a wafer and a pad and chemical cleaning by CMC solution consists of tetramethyl ammonium hydroxide (TMAH) / benzotriazole (BTA). This paper studies the removal of abrasive on the Cu wafer and the cleaning efficiency of CMC process.