• Title/Summary/Keyword: 후면재결합

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Evaluation of mechanical backside damage by minority carrier recombination lifetime and photo-acoustic displacement method in silicon wafer (실리콘 웨이퍼에서 광열 변위법과 소수 반송자 재결합 수명 측정에 의한 기계적 후면 손상 평가)

  • 최치영;조상희
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.8 no.1
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    • pp.117-123
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    • 1998
  • We investigated the effect of mechanical backside damage in Czochralski grown silicon wafer. The intensity of mechanical damage was evaluated by minority carrier recombination lifetime by laser excitation/microwave reflection photoconductivity decay method, photo-acoustic displacement method, X-ray section topography, and wet oxidation/preferential etching methods. The data indicate that the higher the mechanical damage intensity, the lower the minority carrier lifetime, and the photo-acoustic displacement values increased proportionally, and it was at Grade 1: Grade 2:Grade 3 = 1:19.6:41 that the normalized relative quantization ratio of excess photo-acoustic displacement in damaged wafer was calculated, which are normalized to the excess PAD from sample Grade 1.

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An optimal design for the local back contact pattern of crystalline silicon solar cells by using PC1D simulation (PC1D Simulation을 통한 결정질 실리콘 태양전지의 국부적 후면 전극 최적화 설계)

  • Oh, Sungkeun;Lim, Chung-Hyun;Cho, Younghyun
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.11a
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    • pp.43.1-43.1
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    • 2010
  • In the crystalline silicon solar cells, the full area aluminum_back surface field(BSF) is routinely achieved through the screen-printing of aluminum paste and rapid firing. It is widely used in the industrial solar cell because of the simple and cost-effective process to suppress the overall recombination at the back surface. However, it still has limitations such as the relatively higher recombination rate and the low-to-moderate reflectance. In addition, it is difficult to apply it to thinner substrate due to wafer bowing. In the recent years, the dielectric back-passivated cell with local back contacts has been developed and implemented to overcome its disadvantages. Although it is successful to gain a lower value of surface recombination velocity(SRV), the series resistance($R_{series}$) becomes even more important than the conventional solar cell. That is, it is a trade off relationship between the SRV and the $R_{series}$ as a function of the contact size, the contact spacing and the geometry of the opening. Therefore it is essential to find the best compromise between them for the high efficiency solar cell. We have investigated the optimal design for the local back contact by using PC1D simulation.

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Fabrication of high-quality silicon wafers by gettering process (Gettering을 이용한 태양전지용 고품위 실리콘 기판 제작)

  • Park, Hyo-Min;Tark, Sung-Ju;Kang, Min-Gu;Park, Sung-Eun;Lee, Seung-Hun;Kim, Dong-Whan
    • 한국신재생에너지학회:학술대회논문집
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    • 2009.11a
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    • pp.366-366
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    • 2009
  • 후면접합 태양전지는 상용 태양전지의 수평전류 손실(lateral current loss) 이 없으며, 전면전극에 의해 발생하는 그림자 손실(shading loss) 줄인 고효율 태양전지의 하나이다. 생성된 반송자가 후면에 위치한 전극에서 수집되기 때문에 효율향상을 위해서는 불순물에 의한 재결합을 줄이는 것이 중요하다. 따라서 Gettering 은 높은 소수반송자 수명(life-time)을 가지는 고품위 실리콘 기판은 고효율 실리콘태양전지 제작을 위한 중요 요소 기술이다. 본 연구에서는 n-type c-Si 기판을 이용한 고효율 실리콘 이종접합 태양전지제작을 위해 external gettering 공정을 이용하여 고품위 실리콘 기판을 제작하였다. POC13 doping process 의 온도, 시간을 변화시킴으로써 이에 따른 변화를 관찰하였다. 주사전자현미경(SEM)를 통해 etch pit 을 확인 했으며,Four point probe 를 통해 면저항을 측정, 인(P)의 농도를 계산 하였다. 계산된 면저항을 통해 인(P)의 확산 깊이를 계산하였다. Iodine passivation 된 시편을 Qusi-steady state photoconductance (QSSPC)를 이용하여 소수반송자 수명을 측정함으로써 gettering 에 의한 bulk lifetime 향상 효과를 관찰하였다.

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An Analysis on rear contact for crystalline silicon solar cell (결정질 실리콘 태양전지에 적용하기 위한 후면전극 형성에 관한 연구)

  • Kwon, Hyukyong;Lee, Jaedoo;Kim, Minjung;Lee, Soohong
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.91.1-91.1
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    • 2010
  • There are some methods for increasing efficiency of crystalline silicon solar cells. Among them, It is important to reduce the recombination loss of surface for high efficiency. In order to reduce recombination loss is a way to use the BSF(Back Surface Field). The BSF on the back of the p-type wafer forms a p+layer. so, it is prevented to act electrons of the p-area for the rear recombination. As a result, the leakage current is reduced and the rear-contact has a good Ohmic contact. therefore, open-circuit-voltage and Fill factor(FF) of solar cells are increased. This paper investigates the formation of rear contact process comparing Aluminum-paste(Al-paste) with Aluminum-Metal(99.9%). It is shown that the Aluminum-Metal provides high conductivity and low contact resistance of $21.35m{\Omega}cm$ using the Vacuum evaporation process but, it is difficult to apply the standard industrial process because high Vacuum is needed and it costs a tremendous amount more than Al-paste. On the other hand, using the Al-paste process by screen printing is simple for formation of metal contact and it is possible to produce the standard industrial process. however, it is lower than Aluminum-Metal(99.9) of conductivity because of including mass glass frit. In this study, contact resistances were measured by 4-point prove. each of contact resistances is $21.35m{\Omega}cm$ of Aluminum-Metal and $0.69m{\Omega}cm$ of Al-paste. and then rear contact have been analyzed by Scanning Electron Microscopy(SEM).

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PECVD를 이용한 SiNx 증착 조건에 따른 수소 패시베이션 개선 효과

  • Jo, Guk-Hyeon;Jang, Hyo-Sik
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.200.1-200.1
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    • 2013
  • 실리콘 태양전지 표면에는 구조적인 결함에 의해 소수 캐리어의 재결합이 일어난다. 재결합에 의해 캐리어의 반송자 수명은 줄어들게 되고, 태양전지의 효율은 감소하게 된다. 이를 줄이기 위해 태양전지 전 후면에 패시베이션을 하게 되는데, 이번 연구는 단결정 실리콘 태양전지 전면에 SiNx막을 증착함으로 수소 패시베이션이 반송자 수명에 미치는 영향에 대하여 연구하였다. 공정을 위해 $156{\times}156mm^2$, 200 ${\mu}m$, 0.5-3.0 ${\Omega}{\cdot}cm$ and p-type 단결정 실리콘 웨이퍼를 사용하였고, SiNx막을 올리기 전에 KOH 8.5% 용액으로 SDR을 실행하였다. RF-PECVD 장비로 SiNx 막을 증착하였고 증착 온도는 $200{\sim}400^{\circ}C$, 반응기 내부의 압력을 200~1,000 mtorr, SiH4/NH3/N2 각각의 가스 비율 조절, 그리고 플라즈마 RF power 변화시킴에 따라 증착된 SiNx막의 균일도 및 특성을 분석하였다. 반사광 측정 장비인 Reflectometer장비로 막의 두께와 굴절률, 반사율을 측정하였고, 반송자 수명을 측정하여 태양전지의 표면결함을 최대한 패시베이션 시켜주는 조건에 대한 연구를 수행하였다.

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The Fabrication of Poly-Si Solar Cells for Low Cost Power Utillity (저가 지상전력을 위한 다결정 실리콘 태양전지 제작)

  • Kim, S.S.;Lim, D.G.;Shim, K.S.;Lee, J.H.;Kim, H.W.;Yi, J.
    • Solar Energy
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    • v.17 no.4
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    • pp.3-11
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    • 1997
  • Because grain boundaries in polycrystalline silicon act as potential barriers and recombination centers for the photo-generated charge carriers, these defects degrade conversion effiency of solar cell. To reduce these effects of grain boundaries, we investigated various influencing factors such as thermal treatment, various grid pattern, selective wet etching for grain boundaries, buried contact metallization along grain boundaries, grid on metallic thin film. Pretreatment above $900^{\circ}C$ in $N_2$ atmosphere, gettering by $POCl_3$ and Al treatment for back surface field contributed to obtain a high quality poly-Si. To prevent carrier losses at the grain boundaries, we carried out surface treatment using Schimmel etchant. This etchant delineated grain boundaries of $10{\mu}m$ depth as well as surface texturing effect. A metal AI diffusion into grain boundaries on rear side reduced back surface recombination effects at grain boundaries. A combination of fine grid with finger spacing of 0.4mm and buried electrode along grain boundaries improved short circuit current density of solar cell. A ultra-thin Chromium layer of 20nm with transmittance of 80% reduced series resistance. This paper focused on the grain boundary effect for terrestrial applications of solar cells with low cost, large area, and high efficiency.

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Study on the influence of i/p interfacial properties on the cell performance of flexible nip microcrystalline silicon thin film solar cells (i/p 계면 특성에 따른 nip 플렉서블 미세결정질 실리콘 박막 태양전지의 특성 연구)

  • Jang, Eunseok;Baek, Sanghun;Jang, Byung Yeol;Lee, Jeong Chul;Park, Sang Hyun;Rhee, Young Woo;Cho, Jun-Sik
    • 한국신재생에너지학회:학술대회논문집
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    • 2011.05a
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    • pp.128.2-128.2
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    • 2011
  • 스테인레스 스틸 유연기판 위에 플라즈마 화학기상 증착법 (plasma enhanced chemical vapor deposition)을 이용하여 nip 구조의 미세결정질 실리콘 박막 태양전지 (microcrystalline silicon thin film solar cell)를 제조하고 i ${\mu}c$-Si:H광 흡수층과 p ${\mu}c$-Si:H 사이에 i a-Si:H 버퍼 층을 삽입하여 i/p 계면특성을 개선하고 이에 따른 태양전지 성능특성 변화를 조사하였다. ${\mu}c$-Si:H 박막으로 이루어진 i/p 계면에서의 구조적, 전기적 결함은 태양전지 내에서 생성된 캐리어의 재결합과 shunt resistance 감소를 초래하여 개방전압 (open circuit voltage) 및 곡선 인자 (fill factor)를 감소시키는 것으로 알려졌다. 제조된 미세결정질 실리콘 박막 태양전지는 SUS/Ag/ZnO:Al/n ${\mu}c$-Si:H/i ${\mu}c$-Si:H/p ${\mu}c$-Si:H 구조로 제작되었으며 i/p 계면 사이의 i a-Si;H 버퍼층 두께를 변화시키고 이에 따른 태양전지의 특성을 조사하였다. 태양전지의 구조적, 전기적 특성 변화는 Scanning Electron Microscope (SEM), UV-visible-nIR spectrometry, Photo IV와 Dark IV를 통하여 조사하였다.

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