• Korean Journal of Optics and Photonics
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• v.23 no.4
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• pp.135-142
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• 2012

We have developed a measurement method of the refractive index profile of an optical fiber by using diffraction phase microscopy. In the microscope system, the reference light was extracted directly from the probe light that passed through the sample by means of pinhole filtering with a diffraction grating. The spatial interference pattern produced by the probe light and the reference light was processed to generate the phase image of the sample fiber. The index profile was obtained by the inverse Abel transform of the phase profile. In order to remove the background phase that originated from the index difference between the cladding and the surrounding medium, the background phase was calculated from the phase data of the cladding to make a core phase profile that can be directly transformed to the index profile of the core without the full phase image that includes the entire cladding part.

• Korean Journal of Optics and Photonics
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• v.10 no.5
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• pp.386-390
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• 1999

Erasable polarization holographic grating was recorded with two-wave mixing in PCN which was side-chain liquid crystalline polymalonic esters containing two symmetrical 4-cyanoazobenzene as photoresponsive groups. The diffraction efficiency of recorded grating was measured and the characteristics of recording, decay in a dark room and erasing by circularly polarized light were investigated. As the results, birefringence, $\Delta$n of PCN was measured $6.5{\times}10^{-2}$, which was 0~100 times higher than those of crystals such as Fe:$LiNbO_3$, Ce:$BaTiO_3$ crystals. Dark decay rates was $4.3{\times}10^{-5}$ %/hour, which showed the possibility of application as data storage media.

• Journal of the Semiconductor & Display Technology
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• v.18 no.2
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• pp.58-62
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• 2019

Diffractive Optical Elements(DOEs) diffracts incident light using the diffraction phenomenon of light to generate a desired diffraction image. In recent years, the use of diffraction optics, which can replace existing refractive optical elements with flat plates, has been increased by implementing various optical functions that could not be implemented in refractive optical devices and by becoming miniaturized and compacted optical elements. Direct laser lithography is typically used to effectively fabrication such a diffractive optical element in a large area with a low process cost. In this study, the process conditions for fabricating patterns of diffractive optical elements in various shapes were found using direct laser lithographic system, and optical performance evaluation was performed through fabrication.

• Transactions of the Korean Society of Machine Tool Engineers
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• v.16 no.3
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• pp.117-124
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• 2007

In order to operate CD and DVD compatibly in a pickup system, the objective lens comprise diffractive optical element(DOE) zone and aspheric curvature on its lens surface. The DOE objective lens is effective to simplify this dual-purpose pickup system of the 655nm and 785nm wavelength by using only one lens, but requires more precision manufacturing process and system due to the complicated shape. This paper presents the overall manufacturing process of this objective lens and describes main parameters in each process, for the correction of the aspheric surface in its core, the shrinkage compensation after injection molding, and the uniformity compensation by adjusting molding conditions.

• Korean Journal of Optics and Photonics
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• v.28 no.4
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• pp.146-152
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• 2017

Alignment of the mirrors composing a space telescope is an important process for obtaining high optical resolution and performance of the camera system. The alignment of mirrors using cube mirrors requires a relative coordinate mapping between the mirror and the cube mirror before optical-system integration. Therefore, to align the spacecraft camera mirrors, the relative coordinates of the vertex of each mirror and the corresponding cube mirror must be accurately measured. This paper proposes a new method for finding the vertex position of a primary mirror, by using an optical fiber and alignment segments of a computer-generated hologram (CGH). The measurement system is composed of an optical testing interferometer and a multimode optical fiber. We used two theodolites to measure the relative coordinates of the optical fiber located at the mirror vertex with respect to the cube mirror, and achieved a measurement precision of better than $25{\mu}m$.

• Korean Journal of Optics and Photonics
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• v.9 no.5
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• pp.307-314
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• 1998

We have studied the effects of interface on polarization dependence of waveguide and designed the polarization independent 2-dimensional waveguides on InP for arrayed waveguide grating. To figure out the effects of interface on polarization dependence, we have solved the 1-dimensional wave equation using a transfer matrix method. It is shown that the birefringence becomes stronger as the number of interfaces increases. In order to design polarization independent 2-dimensional waveguides, we have used effective index method. The structures considered are ridge type, raised strip type, and buried type waveguide. In the cases of ridge and raised strip type, conventional effective index method was used. In the case of buried type corrected effective index method was used. We have determined the height and width of waveguides such that the waveguides become polarization independent.

• Proceedings of the Materials Research Society of Korea Conference
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• 1994.11a
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• pp.86-86
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• 1994

박막 EL소자의 투명전극으로 제작된 ITO막의 전기적, 광학적 특성을 조사하였다. Plama CVD방법으로 제작된 ITO막은 증착시 산소결핍으로 인한 비 다량결합(non-stochiometry) 에 의해 In이 석출되어 흑화현상이 일어나 전기전도도와 광투과율을 향상을 위해 산소분위기에서 30$0^{\circ}C$로 4분간 열처리를 행하였다. 한편 ITO막의 비저항 $\rho$와 광투과율 T를 Van der pauw법과 단색 분광계로 각각 측정하였다. 그 결과 상온에서 10-15$\Omega$/$\square$의 면저항과 400-1000nm의 파장영역에서 85-95%의 광투과율을 가져 박막 EL소자의 투명전극 조건을 만족하였다. 열처리에 대학 ITO막의 구조적 특성을 알아보기 위해 X-선회절장치(JEOL.JDX-8030)로 조사하였다. Fig.1은 X-선 회절 패턴을 나타낸다. 열처리후 ITO막은 상대적으로 최대 강도(peak intensity) 가 증가함으로써 열처리에 의해 결정성 향상이되었음을 알수 있다. Fig.2는 파장에 따른 ITO막의 광투과도를 나타낸다.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.120-120
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• 2010

최근 투명전도성 산화물(Transparent Conductive Oxide, TCO) 박막은 액정 표시소자(LCD), 플라즈마 디스플레이 패널(PDP), 압전소자 및 태양전지의 투명소자로 사용되어지고 있다. 현재 가장 널리 사용되어지고 있는 투명전극물질인 인듐주석산화물(indium tin oxide, ITO)은 낮은 비저항과 높은 투과율을 가지고 있지만, 높은 원자재의 가격 및 수소플라즈마 처리시 In과 Sn이 환원되어 전기적, 광학적으로 불안정한 문제점들이 지적되고 있다. 이러한 문제점들을 해결하기 위해 최근 적외선 및 가시광선 영역에서 높은 투과도 및 전기 전도성과 수소플라즈마에 대한 화학적 안정성을 갖는 ZnO를 기반으로 3족 원소를 첨가한 새로운 투명 전도막에 대한 연구가 활발하다. 본 연구에서는 RF-Magnetron Sputtering법을 이용하여 $Ga_2O_3$ 혼합비에 따라 제작된 ZnO(GZO) 박막들의 전기적, 광학적, 구조적인 특성들을 분석하였다. 측정결과, $Ga_2O_3$의 첨가량이 7 wt.%인 GZO 박막이 가시광선영역에서 80%이상의 높은 투과율과 $50.5\;\Omega/\Box$의 가장 낮은 면저항을 나타내었다. 이는 Ga원소가 다른 3족 원소와 격자결합을 비교할 때, 이온의 크기가 Zn원소와 비슷하여 최적화된 혼합율을 가지는 경우 격자결합을 최소화시켜 캐리어 밀도의 증가로 인해 높은 전도성을 가지며, 고온에서도 전기적 특성 및 내구성이 향상되기 때문이다. 또한 기판온도에 따른 열처리 특성으로서 기판의 온도를 $100^{\circ}{\sim}400^{\circ}C$까지 변화를 주어 실험하였다. X-선 회절패턴 분석결과 기판온도가 증가함에 따라 ZnO (002) 방향이 감소하는 반면 ZnO(103) 방향이 증가하였으며, 기판온도가 $300^{\circ}C$ 일 때 $17.1\;\Omega/\Box$의로 가장 낮은 면저항이 나타났다. 이는 SEM 이미지를 분석한 결과, 실온에서 제작된 박막과 비교해 300 에서 증착된 GZO 박막이 결정립의 크기가 크고 밀도도 조밀해져 전하의 이동도가 향상되었기 때문이다.

• Korean Journal of Optics and Photonics
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• v.14 no.3
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• pp.321-326
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• 2003

We constructed grating- tuned external cavity semiconductor lasers using Littman and Littrow configuration, for which the wavelengths are tuned by rotation of the grating. This wavelength tunable semiconductor laser is one of the main devices of WDM optical communication. In Littman configuration, the wavelength range of about 60 nm (The C- and L-band range of 1,530~1,590 nm) was obtained by changing the incidence angle of the grating about $\pm$1$^{\circ}$ from the incidence angle of 70$^{\circ}$. In the 40 nm tuning range, the output power variation was less than 1.25 ㏈ and the side mode suppression ratio(SMSR) was 32 ㏈. In Littrow configuration (The incidence angle and the first order diffraction angle is the same, i.e. $\alpha$=$\delta$), the wavelength tuning range was about 80 nm for the same conditions used in Littman configuration except the incidence angle ($\alpha$=49$^{\circ}$). In 60 nm tuning range, the output power variation was less than 1.5 ㏈ and SMSR was 35 ㏈.

• Journal of the Korean Society of Radiology
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• v.12 no.1
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• pp.17-22
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• 2018

Multilayer mirrors are optical elements that can replace single crystal optical elements such as silicon or germanium, and they have artificial diffraction plane of a thickness of several nanometers. We examined the first Bragg angle and the reduction of reflectivity by variation of layer thickness in a W/Si multilayer mirror of small d-spacing. A W/Si multilayer mirror for an incidence angle of $0.55^{\circ}$ and an energy of 17.5 keV was designed and showed a maximum reflectivity of 72.67%. When the thickness of tungsten or silicon layer was simultaneously changed, the first Bragg angle was shifted and the reflectivity was reduced. When there was a change in thickness for one layer of W/Si multilayer, no change in the reflectivity was showed but the unevenness of the envelope was observed. Reduction of reflectivity was also observed at random Gaussian thickness variations. It is possible to predict the tolerance of multilayer mirror by examining the reflectivity degradation according to the thickness change in the W/Si multilayer mirror of small d-spacing.