• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.530-531
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• 2008

본 논문에서는 우수한 광학 특성으로 활발히 연구되고 있는 광자결정(PCs)과 이를 변형시킨 광자준결정(PQCs) 구조를 설계하고 특성을 평가, 비교하였다. 특성 평가는 cubic 및 hexagonal 기본격자의 PCs와 8-fold PQC 구조를 비교하였으며 각각 동일한 충진률 동일한 굴절률 차이의 조건을 갖도록 설계하여 구조에 따른 PBGs 변화를 살펴보았다. 계산 방법은 Maxwell 방정식을 이용한 finite difference time domain (FDTD) 전산모사법을 사용하였다. 본 연구의 결과로부터 잘 설계된 2차원 PQCs는 낮은 굴절률차이(${\Delta}n$)의 물질 구조에서도 완전한 광자밴드갭(photonic bandgaps: PBGs)를 가질 수 있다는 것을 확인하였다. 본 연구진은 다중회전 홀로그래피 방법 (multi-rotational holographic method)을 이용하여 설계된 PQCs를 완벽하게 재현하려는 공정을 진행 중에 있다.

• Proceedings of the Optical Society of Korea Conference
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• 2000.08a
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• pp.238-239
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• 2000

페이지 지향 데이터의 고밀도 홀로그래픽 데이터 저장 시스템이나 홀로그래피 현상에서 필름에 기록되는 스펙트럼을 평탄화하기 위해 확산 광원의 사용은 필수적이다. 또한, 출력 평면에서 균일한 분포를 갖는 회절 빔의 세기 분포와 회절 격자로서의 높은 회절 효율, 홀로그램 손상 시 재생 가능한 용장성 (redundancy)의 증가를 위해 간유리나 특정 패턴들로 인코딩된 유사 랜덤 디퓨저가 이용되고 있으나, 이들은 무한한 공간 대역폭을 갖기 때문에 공간적으로 유한한 데이터 마스크만이 이용되거나 기록 매질이 임의의 크기로 제한된다면, 입사 광원의 전력 낭비와 균일도 측면에서 비효율적이고, 여러 단계의 제작과정이 필요한 단점을 가지고 있다.$^{(1-3)}$ (중략)

• Korean Journal of Optics and Photonics
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• v.3 no.3
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• pp.148-154
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• 1992

With nonhardening fixer, dichromated bleacher and alcohol drying, the diffraction efficiency of over 71o/c has been achie'{ed for holographic phase gratings in silver halide emulsion. The swollen emulsion of Agfa 8E75 HD film is identified by scanning electron microscope (SEM) after chemical processing. Dichromated bleacher and rapid dehydration using alcohol drying make a strong modulation so that diffraction efficiency is. increased over 20%. The principal characteristic parameters in coupled wave theory are investigated and new modified parameter values are presented by computer simulation. Controlling the emulsion thickness has an important role as a potential source for high diffraction efficiency.ciency.

• Korean Journal of Optics and Photonics
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• v.12 no.1
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• pp.17-24
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• 2001

Two-dimensional binary-phase diffraction gratings which can be employed to fabricate two- and three-dimensional periodic structures are designed and analyzed using rigorous coupled-wave analysis. These gratings serve as phase-masks which generate several diffracted waves from a normally incident beam and thus can produce a periodic interference pattern in space via nearfield holography. The properties of the diffracted beams can be controlled by varying the polarization and wavelength of the incident beam, surface-profile, groove depth and duty cycle of the mask. For the two-dimensional structure, optimum results can be obtained when the diffraction efficiency of the zero-order beam is minimized while that of the first-order maximized. On the other hand, when the diffraction efficiency of the zero-order is appreciable or even greater than other orders, we can obtain a variety of three-dimensional interference patterns which may be used to fabricate photonic crystals of tetragonal-body-centered and hexagonal structures in a submicron scale. scale.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.9
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• pp.423-428
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• 2006

We have been carried out the two-beam interference method to form the diffraction grating on chalcogenide $AS_{40}Se_{15}S_{35}Ge_{10}$ thin films for Holography Data Storage (HDS). In the present work, we have been formed holographic diffraction gratings using He-Ne laser (632.8nm) under different Polarization state combinations (intensity polarization holography, phase polarization holography). It was obtained the diffraction grating efficiency by 11st order intensity and investigated the formed grating structure using Atomic Force Microscopy (AFM). As the results, it is shown that the diffraction efficiency of (P: P) polarized recording was maximum 2.4% and we found that its value was rather higher than that of other-polarized recordings. From the results, it is confirmed that the efficient holographic grating formation on amorphous chalcogenide $AS_{40}Se_{15}S_{35}Ge_{10}$ films depend on both the spatial variation of intensity and the polarization state of the incident field pattern.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.8
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• pp.387-391
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• 2006

The Ag photodoping effect in amorphous $As_{40}Ge_{10}Se_{15}S_{35}$ chalcogenide thin films for holographic recording has been investigated using a He-Ne laser (${\lambda}$=632.8 nm). The chalcogenide films thickness prepared in the present work were thinner in comparison with the penetration depth of recording light ($d_p=1.66{\mu}m$). It exhibits a tendency of the variation of the diffraction efficiency (${\eta}$) in amorphous chalcogende films, independently of the Ag photodoping. That is, ${\eta}$ increases rapidly at the beginning of the recording process and reaches the maximum (${\eta}_{max}$) and slowly decreases slowly with the exposed time. In addition, the value of ${\eta}_{max}$ depends strongly on chalcogenide film thickness(d) and its maximum peak among the films with d = 40, 80, 150, 300, and 633 nm is observed 0.083% at d = 150 nm (approximately 1/2 ${\Delta}n$), where ${\Delta}$n is the refractive index of chalcogenide thin film (${\Delta}n=2.0$). The ${\eta}$ is largely enhanced by Ag photodoping into the chakogenides. In particular, the value of ${\eta}_{max}$ in a bilayer of 10-nm-thick Ag/150-nm-thick $As_{40}Ge_{10}Se_{15}S_{35}$ film is about 1.6%, which corresponds to ${\sim}20$ times larger than that of the single-layer $As_{40}Ge_{10}Se_{15}S_{35}$ thin film (without Ag). And we obtained the diffraction pattern according to the formation of (P:P) polarization holographic grating using Mask pattern and SLM.