• Journal of the Korea Academia-Industrial cooperation Society
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• v.20 no.4
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• pp.497-502
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• 2019

Metal oxide nanostructures are promising materials for advanced applications, such as high sensitive gas sensors, and high capacitance lithium-ion batteries. In this study, tin oxide (SnO) nanostructures were grown on a Si wafer substrate using a two-zone horizontal furnace system for a various substrate temperatures. The raw material of tin dioxide ($SnO_2$) powder was vaporized at $1070^{\circ}C$ in an alumina crucible. High purity Ar gas, as a carrier gas, was flown with a flow rate of 1000 standard cubic centimeters per minute. The SnO nanostructures were grown on a Si substrate at $350{\sim}450^{\circ}C$ under 545 Pa for 30 minutes. The surface morphology of the as-grown SnO nanostructures on Si substrate was characterized by field-emission scanning electron microscopy (FE-SEM) and atomic force microscopy (AFM). Raman spectroscopy was used to confirm the phase of the as-grown SnO nanostructures. As the results, the as-grown tin oxide nanostructures exhibited a pure tin monoxide phase. As the substrate temperature was increased from $350^{\circ}C$ to $424^{\circ}C$, the thickness and grain size of the SnO nanostructures were increased. The SnO nanostructures grown at $450^{\circ}C$ exhibited complex polycrystalline structures, whereas the SnO nanostructures grown at $350^{\circ}C$ to $424^{\circ}C$ exhibited simple grain structures parallel to the substrate.

• Applied Chemistry for Engineering
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• v.32 no.4
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• pp.478-482
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• 2021

The catalytic yields of partial oxidation of methane (POM) to hydrogen over Ln(1)-Ni(5)/SBA-15 (Ln = Dy, Eu, Pr, and Tb) were investigated in a fixed bed flow reactor under atmosphere. As 1 wt% of Eu was added to Ni(5)/SBA-15 catalyst, the O1s and Si2p core electron levels of Eu(1)-Ni(5)/SBA-15 showed the chemical shift by XPS. XPS analysis also demonstrated that the atomic ratio of O1s, Ni2p_3/2, and Si2p increased to 1.284, 1.298, and 1.058, respectively, and exhibited O^-, and O^2- oxygen and metal ions such as Eu³⁺, Ni⁰, Ni²⁺, and Si⁴⁺ on the catalyst surface. The yield of hydrogen on the Eu(1)-Ni(5)/SBA-15 was 57.2%, which was better than that of Ln(1)-Ni(5)/SBA-15 (Ln = Dy, Pr, and Tb), the catalytic activity was kept steady even 25 h. As 1 wt% of Eu was added to Ni(5)/SBA-15, the oxygen vacancies caused by strong metal-support interaction (SMSI) effect due to the strong interaction between metals and carrier are made. They are resulted in increasing the dispersion of Ni⁰, and Ni²⁺ nano particles on the surface of catalyst, and are kept catalytic activity.

• Journal of the Korean Vacuum Society
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• v.22 no.6
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• pp.313-320
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• 2013

The $AlAs_xSb_{1-x}$ step-graded buffer (SGB) layer was grown on the Silicon (Si) substrate to overcome lattice mismatch between Si substrate and $Al_{0.3}Ga_{0.7}As$/GaAs multiple quantum wells (MQWs). The value of root-mean-square (RMS) surface roughness for 5 nm-thick GaAs grown on $AlAs_xSb_{1-x}$ step-graded buffer layer was ~1.7 nm. $Al_{0.3}Ga_{0.7}As$/GaAs MQWs with AlAs/GaAs short period superlattice (SPS) were formed on the $AlAs_xSb_{1-x}$/Si substrate. Photoluminescence (PL) peak at 10 K for the $Al_{0.3}Ga_{0.7}As$/GaAs MQW structure showed relatively low intensity at ~813 nm. The RMS surface roughness of the $Al_{0.3}Ga_{0.7}As$/GaAs MQW structure was ~42.9 nm. The crystal defects were observed on the cross-sectional transmission electron microscope (TEM) images of the $Al_{0.3}Ga_{0.7}As$/GaAs MQW structure. The decrease of PL intensity and increase of RMS surface roughness would be due to the formation of the crystal defects.

• Journal of the Korean Society for Nondestructive Testing
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• v.34 no.3
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• pp.254-259
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• 2014

A pressurized heavy water reactor (PHWR) core has 380 fuel channels contained and supported by a horizontal cylindrical vessel known as the calandria, whereas a pressurized water reactor (PWR) has only a single reactor vessel. The pressure tube, which is a pressure-retaining component, has a 103.4 mm inside diameter ${\times}$ 4.19 mm wall thickness, and is 6.36 m long, made of a zirconium alloy (Zr-2.5 wt% Nb). This provides support for the fuel while transporting the $D_2O$ heat-transfer fluid. The simple tubular geometry invites highly automated inspection, and good approach for all inspection. Similar to all nuclear heat-transfer pressure boundaries, the PHWR pressure tube requires a rigorous, periodic inspection to assess the reactor integrity in accordance with the Korea Nuclear Safety Committee law. Volumetric-based nondestructive evaluation (NDE) techniques utilizing ultrasonic and eddy current testing have been adopted for use in the periodic inspection of the fuel channel. The eddy current testing, as a supplemental NDE method to ultrasonic testing, is used to confirm the flaws primarily detected through ultrasonic testing, however, eddy current testing offers a significant advantage in that its ability to detect surface flaws is superior to that of ultrasonic testing. In this paper, effectiveness of flaw detection and the depth sizing capability by eddy current testing for the inside surface of a pressure tube, will be introduced. As a result of this examination, the ET technique is found to be useful only as a detection technique for defects because it can detect fine defects on the surface with high resolution. However, the ET technique is not recommended for use as a depth sizing method because it has a large degree of error for depth sizing.

• Journal of the Korean Vacuum Society
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• v.17 no.6
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• pp.538-543
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• 2008

Recently a nano-scale diamond is possible to manufacture forms of powder(below 100 nm) by new processing of explosion or deposition method. Using a sintering of nano-scale diamond is possible to manufacture of grinding tools. We have need of a processing development of coated uniformly inorganic to prevent an abnormal grain growth of nano-crystal and bonding obstacle caused by sintering process. This paper, in order to improve the sintering property of nano-scale diamond, we coated ZnO thin films(thickness: $20{\sim}30\;nm$) in a vacuum by ALD(atomic layer deposition) Economically, in order to deposit ZnO all over the surface of nano-scale diamond powder, we used a new modified fluidized bed processing replaced mechanical vibration effect or fluidized bed reactor which utilized diamond floating owing to pressure of pulse(or purge) processing after inserted diamond powders in quartz tube(L: 20 mm) then closed quartz tube by porosity glass filter. We deposited ZnO thin films by ALD in closed both sides of quartz tube by porosity glass filter by ALD(precursor: DEZn($C_4H_{10}Zn$), reaction gas: $H_2O$) at $10^{\circ}C$(in canister). Processing procedure and injection time of reaction materials set up DEZn pulse-0.1 sec, DEZn purge-20 sec, $H_2O$ pulse-0.1 sec, $H_2O$ purge-40 sec and we put in operation repetitive 100 cycles(1 cycle is 4 steps) We confirmed microstructure of diamond powder and diamond powder doped ZnO thin film by TEM(transmission electron microscope) Through TEM analysis, we confirmed that diamond powder diameter was some $70{\sim}120\;nm$ and shape was tetragonal, hexagonal, etc before ALD. We confirmed that diameter of diamond powders doped ZnO thin film was some $70{\sim}120\;nm$ and uniform ZnO(thickness: $20{\sim}30\;nm$) thin film was successfully deposited on diamond powder surface according to brightness difference between diamond powder and ZnO.

• New Physics: Sae Mulli
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• v.68 no.12
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• pp.1281-1287
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• 2018

In this study, $Al_xGa_{1-x}N$ films were grown on (0001) sapphire substrates by using metal-organic chemical vapor deposition (MOCVD). The crystallinity of the grown films was examined with X-ray diffraction (XRD) patterns. The surfaces and the chemical properties of the $Al_xGa_{1-x}N$ films were investigated using atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS), respectively. The optical properties of the $Al_xGa_{1-x}N$ film were studied in a wide photon energy range between 2.0 ~ 8.7 eV by using spectroscopic ellipsometry (SE) at room temperature. The data obtained by using SE were analyzed to find the critical points of the pseudodielectric function spectra, $<{\varepsilon}(E)>=<{\varepsilon}_1(E)>+i<{\varepsilon}_2(E)>$. In addition, the second derivative spectra, $d^2<{\varepsilon}(E)>/dE^2$, of the pseudodielectric function for the $Al_xGa_{1-x}N$ films were numerically calculated to determine the critical points (CPs), such as the $E_0$, $E_1$, and $E_2$ structure. For the four samples (x = 0.18, 0.21, 0.25, 0.29) between a composition of x = 0.18 and x = 0.29, changes in the critical points (blue-shifts) with increasing Al composition at 300 K for the $Al_xGa_{1-x}N$ film were observed via ellipsometric measurements for the first time.

• Journal of the Microelectronics and Packaging Society
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• v.23 no.2
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• pp.43-47
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• 2016

This paper covers the study on the properties of $TiO_2$ film deposited by atomic layer deposition (ALD) using TTIP and water at various temperatures including the low temperature range of <$150^{\circ}C$. At low deposition temperature, ALD $TiO_2$ films showed uniform growth rate per cycle ($0.3{\AA}/cycle$), good uniformity, smooth surface, and homogenous amorphicity. They also showed good conformality of >80% on the trench structure with the high aspect ratio of up to 75. However, relatively high concentration of impurities (C~4-7 at%) in the film was observed due to low deposition temperature.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.400-401
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• 2012

그래핀(Graphene)은 열 전도도가 높고 전자 이동도(200 000 cm2V-1s-1)가 우수한 전기적 특성을 가지고 있어 전계 효과 트랜지스터(Field effect transistor; FET), 유기 전자 소자(Organic electronic device)와 광전자 소자(Optoelectronic device) 같은 반도체 소자에 응용 가능하다. 그러나 에너지 밴드 갭이 없기 때문에 소자의 전기적 특성이 제한되는 단점이 있다. 최근에는 아크 방출(Arc discharge method), 화학적 기상 증착법(Chemical vapor deposition; CVD), 이온-조사법(Ion-irradiation) 등을 이용한 이종원자(Hetero atom)도핑과 화학적 처리를 이용한 기능화(Functionalization) 등의 방법으로 그래핀을 도핑 후 에너지 밴드 갭을 형성시키는 연구 결과들이 보고된 바 있다. 그러나 이러한 방법들은 표면이 균일하지 않고, 그래핀에 많은 결함들이 발생한다는 단점이 있다. 이러한 단점을 극복하기 위해 자가조립 단층막(Self-assembled monolayers; SAMs)을 이용하여 이산화규소(Silicon oxide; SiO2) 기판을 기능화한 후 그 위에 그래핀을 전사하면 그래핀의 일함수를 쉽게 조절하여 소자의 전기적 특성을 최적화할 수 있다. SAMs는 그래핀과 SiO2 사이에 부착된 매우 얇고 안정적인 층으로 사용된 물질의 특성에 따라 운반자 농도나 도핑 유형, 디락 점(Dirac point)으로부터의 페르미 에너지 준위(Fermi energy level)를 조절할 수 있다[1-3]. 본 연구에서는 SAMs한 기판을 이용하여 그래핀의 도핑 효과를 확인하였다. CVD를 이용하여 균일한 그래핀을 합성하였고, 기판을 3-Aminopropyltriethoxysilane (APTES)와 Borane-Ammonia(Borazane)을 이용하여 각각 아민 기(Amine group; -NH2)와 보론 나이트라이드(Boron Nitride; BN)로 기능화한 후, 그 위에 합성한 그래핀을 전사하였다. 기판 위에 NH2와 BN이 SAMs 형태로 존재하는 것을 접촉각 측정(Contact angle measurement)을 통해 확인하였고, 그 결과 NH2와 BN에 의해 그래핀에 도핑 효과가 나타난 것을 라만 분광법(Raman spectroscopy)과 X-선 광전자 분광법(X-ray photoelectron spectroscopy: XPS)을 이용하여 확인하였다. 본 연구 결과는 안정적이면서 패턴이 가능하기 때문에 그래핀을 기반으로 하는 반도체 소자에 적용 가능할 것이라 예상된다.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.13 no.11
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• pp.5350-5355
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• 2012

Human tyrosinase (hTyr) catalyzes the first and rate limiting step in the biosynthesis of a skin color determinant, melanin. Although a number of cosmetic companies have tried to develop hTyr inhibitors for several decades, absence of 3D structure of hTyr make it impossible to design or screen inhibitors by structure-based approach. Therefore, we built a 3D structure by comparative modeling technique based on the crystal structure of tyrosinase from Bacillus megaterium to provide structural information and to search new hit compounds from database. Our model revealed that two copper atoms of active site located deep inside and were coordinated with six strictly conserved histidine residues coming from four-helix-bundle. Substrate binding site had narrow funnel like shape and its entrance was wide and exposed to solvent. In addition, hTyr-tyrosine and hTyr-kojic acid, a well-known inhibitor, complexes were modeled with the guide of solvent accessible surface generated by in-house software. Our model demonstrated that only phenol group or its analogs could fill the binding site near the nuclear copper center, because inside of binding site had narrow shape relatively. In conclusion, the results of this study may provide helpful information for designing and screening new anti-melanogenic agents.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.265-266
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• 2012

의료용 X-ray의 발전에 따라, 영상의 Digital화가 필요하게 되었다. Digital 영상 구현을 위해 다양한 형태의 영상 검출기가 개발되었다. 진단 영상의 조건으로는 구현 시간이 빠르고 해상도가 높아야 한다. 조건에 부합하는 Flat panel 형태의 직접방식과 간접방식 검출기의 개발이 주로 이루어졌으며, X-ray 검출 효율이 높고 공간 분해능이 높은 직접 방식의 검출기에 대한 연구가 활발히 진행되고 있다. 기존 직접방식의 X-ray 검출물질로는 A-Se이 이용되었다. 하지만 A-Se의 경우 낮은 원자번호로 인해 X-ray에 대한효율이 낮으며, 제조 공정과 수율의 문제로 인해 대체 물질의 개발과 공정의 개선이 필요하다. 선행 연구를 통해 X-ray 검출물질의 전기적 특성을 파악을 통해 대체 물질로서 가능성을 알아보았다. 본 연구에서는 기존에 제작된 X-ray 검출물질의 상부전극 증착 물질과 증착법 선정에 대한 연구이다. 선행 연구를 통해 선정된 X-ray 검출물질은 HgI2이다. 상, 하부 전극 선택에 있어 HgI2의 일함수 값(4.15eV)을 고려하여 그와 비슷한 일함수 값을 가진 물질로 전기적 장벽을 제거하여야 한다. 따라서, ITO (일함수 4.45eV)와 Au (일함수 5.1eV)을 선택하였다. ITO의 증착으로 이용된 방법으로는 on-axis 형태의 magnetron plasma sputtering을 이용하였으며, Au의 증착으로 이용된 방법은 Thermal evaporation deposition을 이용하였다. plasma sputtering에 이용된 타겟은 In2O3;SnO2 (조성비:90:10wt%)를 사용하였으며, Chamber의 크기는 넓이 456 ${\phi}cm^2$ 높이 25 cm이며, 로 target과 기판과의 거리는 15cm이다. plasma발생에 필요한 가스로는 Ar과 O2를 이용하였다. 고 진공 환경 조성에 이용된 장비로는 Rotary pump와 Turbo molecular pump이다. plasma 발생 전 진공도는 $3.2{\times}10^{-5}$ Torr, 발생 후 진공도는 $5.1{\times}10^{-5}$ Torr이다. plasma 환경이 조성된 후 증착 시간은 1분 30초이다. Au는 순도 99.999%를 이용하였으며, 이용된 금은 1회 증착에 0.3 g을 이용하였다. Chamber의 넓이 1,444 ${\phi}cm^2$이며, 높이 40 cm, boat와 기판과의 거리는 25 cm이다. 고 진공 환경 조성에 이용된 장비로는 Rotary pump와 diffusion pump를 이용하였다. Au의 승화 전 진공도는 $2.4{\times}10^{-5}$ Torr 증착 시 진공도는 $4.2{\times}10^{-5}$ Torr이며, Boat에 가해준 전압, 전류는 0.97 V, 47 A이며, 증착 시간은 1분 30초이다. 광도전체 층에 각각 증착된 전극의 저항을 통해 증착상태를 판단하였다. DMM (Digital Multimeter)로 1 cm 간격으로 측정된 표면의 저항은 ITO 약 $8{\Omega}$, Au 약 $3{\Omega}$으로 전극으로서 이용이 가능한 상태이다. Au와 ITO가 증착된 HgI2 시편의 전기적 특성은 기존에 이용된 X-ray 변환물질의 성능보다 우수하였다. 하지만 Au와 ITO가 각각 증착된 시편의 전기적 특성은 큰 차이를 보이지 않았다. ITO의 경우 진공 상태에서 이용되는 Gas가 이용되며, Plasma 환경 조성 유지가 어려운 점이 있다. Au전극은 증착 환경 조성이 쉽지만, 전극 물질 이용효율이 떨어지는 단점이 있다. 본 연구를 통해 X-ray 변환물질인 HgI2의 전극물질로 Au와 ITO의 이용가능성을 알아보았다. 두 전극으로 제작된 검출기의 성능은 큰 차이 없이 우수하였고, 전기적 장벽 상태가 낮아 높은 검출 효율을 보였다. 상대적으로 Au 전극의 공정이 간단하고 수율이 높다. 하지만 Au Source의 이용 효율이 떨어지는 단점이 있다. 본 연구의 결과를 통해 공정상의 유리함과 Source의 이용효율을 고려한 분석에 대한 연구가 필요할 것으로 사료된다.