• Title/Summary/Keyword: 표면에칭

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Studies of the Membrane Formation Techniques and Its Correlation with Properties and Performance: A Review (막 형성 기술 및 특성과의 상관관계 연구 및 성능: 리뷰)

  • Kumari Nikita;Chivukula Narayana Murthy;Sang Yong Nam
    • Membrane Journal
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    • v.33 no.3
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    • pp.110-126
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    • 2023
  • In this review, the approaches, properties, and elements involved in the formation of polymeric membranes for various materials are discussed. The present research emphasizes the proficiency in several membrane formation processes such phase inversion, interfacial polymerization, stretching, track etching, and electrospinning. Additionally, the obstacles and applicability of various application manufacturing processes are addressed. Various polymeric membranes are reviewed with regard to significant surface properties such as surface roughness, surface tension, surface charge and surface functional group. Additional enhancements of popular membrane formation processes like phase inversion and interfacial polymerization are required to ensure advancements in membrane efficiency. Analysing the possibilities of modern manufacturing practices like track etching and electrospinning is also crucial.

Tungsten With Tip Sharpening by Electrochemical Etching (전기화학적 에칭법에 의한 텅스텐 와이어의 Sharp tip 제조에 관한 연구)

  • 우선기;이홍로
    • Journal of Surface Science and Engineering
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    • v.31 no.1
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    • pp.45-53
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    • 1998
  • Sharp tips are commonly used for applications in fields as diverse as nanolithography, lowvoltage field emitters, emitters, nanoelectroniecs, electrochemisty, cell biology, field-ion and electron microscopy. tungsten wire, mater만 used in this experiment, which test the chip of wafer has been used to the needle of probe card. Tungsten wire was sharpened by electrochemical etching methode to get a typical tip shape.

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Development of Optical Flexible Printed Circuit Board for Wireless-connection (광 플렉시블 인쇄회로기판 연결 장치개발)

  • Lee, Jong-Yun;O, Eun-Deok;Kim, Yu-Sang
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2011.05a
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    • pp.202-202
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    • 2011
  • 최근 대용량 고속송신을 위한 모바일 무선정보통신기기의 신뢰성향상 함께 광 인쇄회로기판(O-PCB)국산화개발이 진행되고 있다. 광 Rigid-MLB개발에 이어 개발추진중인 광 Flexlble PCB는 광 연결 장치는 대용량데이터를 고속 전송하는데 필수적이다. 전원접속코드를 사용하지 않는 광도파로 층으로 구성되며 전기신호를 광신호로 변환시켜 다층의 광도파로 층으로 전송시킨다. 신속한 전송을 위한 균일도금에칭기술이 요구되고 있다.

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Development of Nitric Acid Free Desmut Solution for the Aluminum Alloy in Alkaline Etching and Acid Desmut Processes (Aluminum 합금소재의 알칼리에칭 공정으로 발생한 Smut 제거를 위한 무질산 혼합산용액 개발)

  • Choo, Soo-Tae;Choi, Sang Kyo
    • Clean Technology
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    • v.9 no.2
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    • pp.57-61
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    • 2003
  • A novel nitric acid-free desmut solution has been developed to remove smut, which is produced from a NaOH etching, on the surface of aluminum alloy metal in metal surface treatment processes. Comparing with the performance of 5% $HNO_3$ desmut solution, the mixed acid solution containing 2% $H_2O_2$, 0.5% HF, and 10% $H_2SO_4$ shows the same effect of smut removal for aluminum alloy samples of A16061 and A15052. To examine the surface alterations of the aluminum samples, in addition, the surface analysis is carried out with scanning electron microscopy (SEM) and electron probe microanalysis (EPMA).

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Effects of various Pretreatments on the Nucleation of CVD Tungsten (전처리가 CVD 텅스텐의 핵 생성에 미치는 영향)

  • Kim, Eui-Song;Lee, Chong-Mu;Lee, Jong-Gil
    • Korean Journal of Materials Research
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    • v.2 no.6
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    • pp.443-451
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    • 1992
  • Effects of various pretreatments on the nucleation of CVD-W deposited on the reactively sputter-deposited TiN was investigated. Incubation period of nucleation and deposition rate decreased by the pretreatment of Ar rf-sputter etching for the depth below 300k, but they increased for the etchig depth over 200A. The preteatment of Ar ion implantation decreased the incubation period of nucleation, but increased deposition rate. Also Si$H_4$flushing pretreatment decreased the incubation period of nucleation slightly due to the absorption of Si by TiN surface.

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Oil Retention Experiments and Evaluations for Electrochemically Etched Porous Stainless Steel Surface (전기화학적으로 에칭된 다공성 스테인리스 스틸 표면의 오일 보존 실험 및 성능 평가)

  • Lee, Chan;Kim, Aeree;Kim, Joonwon
    • Journal of the Korean Society for Precision Engineering
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    • v.31 no.12
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    • pp.1171-1176
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    • 2014
  • Oil retention experiments were conducted and the performance was characterized for electrochemically etched stainless steels. The 304 stainless steels were electrochemically etched in dilute Aqua Regia to form porous structures. The structures were also hierarchical, which provides very large area for oils to adhere. Also the structures had deep valleys, which act as reservoir and are able to resist against oil-detaching forces. Several commercial oils were dispensed to characterize oil retention properties via rotating disk experiment method. The results showed that the etched surfaces have superior oil retention performance in every conditions. Also the retention enhancement ratio went particularly higher as the environments became more severe. This surface modification technique could be applied to other steel products for pretreatments of various kinds of coatings.

Study on Water Repellency of PTFE Surface Treated by Plasma Etching (플라즈마 에칭 처리된 PTFE 표면의 발수성 연구)

  • Kang, Hyo Min;Kim, Jaehyung;Lee, Sang Hyuk;Kim, Kiwoong
    • Journal of the Korean Society of Visualization
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    • v.19 no.3
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    • pp.123-129
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    • 2021
  • Many plants and animals in nature have superhydrophobic surfaces. This superhydrophobic surface has various properties such as self-cleaning, moisture collection, and anti-icing. In this study, the superhydrophobic properties of PTFE surface were treated by plasma etching. There were four important factors that changed the surface properties. Micro-sized protrusions were formed by plasma etching. The most influential parameter was RF Power. The contact angle of the pristine PTFE surface was about 113.8°. The maximum contact angle of the surface after plasma treatment with optimized parameters was about 168.1°. In this case, the sliding angle was quite small about 1°. These properties made it possible to remove droplets easily from the surface. To verify the self-cleaning effect of the surface, graphite was used to contaminate the surface and remove it with water droplets. Graphite particles were easily removed from the optimized surface compared to the pristine surface. As a result, a surface having water repellency and self-cleaning effects could be produced with optimized plasma etching parameters.

Recycling of Acidic Etching Waste Solution Containing Heavy Metals by Nanofiltration (II) : Dead-end Nanofiltration of PCB Etching Waste Solution Containing Copper Ion (나노여과에 의한 중금속 함유 산성 폐에칭액의 재생(II) : 구리이온을 함유한 PCB 폐에칭액의 Dead-end 나노여과)

  • Nam, Sang-Won;Jang, Kyung-Sun;Youm, Kyung-Ho
    • Membrane Journal
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    • v.23 no.1
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    • pp.92-99
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    • 2013
  • In this study the nanofiltration (NF) membrane treatment of a sulfuric acid waste solutions containing copper ion ($Cu^{+2}$) discharging from the etching processes of the printed circuit board (PCB) manufacturing industry has been studied for the recycling of acid etching solution. SelRO MPS-34 4040 NF membrane from Koch company was tested to obtain the basic NF data for recycling of etching solution and separation efficiency (total rejection) of copper ion. NF experiments were carried out with a dead-end membrane filtration laboratory system. The pure water flux was increased with the increasing storage time in sulfuric acid solution and lowering pH of acid solution because of the enhancement of NF membrane damage by sulfuric acid. The permeate flux of acid solution was decreased with the increasing copper ion concentration. Total rejection of copper ion was decreased with the increasing storage time in sulfuric acid solution and copper ion concentration, and lowering the pH of acid solution. The total rejection of copper ion was decreased from initial 37% to 15% minimum value.

Cu/Ni-Mo-Nb/Polyimide FCCL (Flexible Copper Clad Laminate)의 개발 및 플렉시블 전자기기 응용을 위한 접착 특성

  • Bang, Seong-Hwan;Kim, Gyeong-Gak;Jeong, Ho-Yeong;Seol, Jae-Bok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.171-171
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    • 2013
  • 2층 FCCL (연성회로기판, Flexible Copper Clad Laminate)에 있어서 폴리이미드 필름과 구리의 접착력을 향상 시키기 위해 기존에 사용되고 있는 Ni-Cr대신 박리강도가 높고 에칭성도 매우 뛰어난 Ni-Mo-Nb 박막을 Roll-to roll 스퍼터 장비를 이용하여 개발하였다. 새롭게 개발된 Ni-Mo-Nb 박막은 기존 연구되어진 Ni-Cr 물질 대비 고온 박리강도 약 1.5~2.0배, 에칭성 8배 이상의 매우 우수한 특성을 보였다. Ni-Mo-Nb 접착층의 두께가 7~40 nm로 증가함에 따라 상온 박리강도가 향상 되는 것을 확인하였다. Ni-Mo-Nb 박막을 증착 하기 전 폴리이미드 기판표면을 RF 플라즈마 전처리 하였을 때 0.67 kg f/cm의 우수한 상온 박리강도를 나타내었으며 FCCL 샘플을 $150^{\circ}C$에서 168시간동안 열처리 한 후 접착력을 측정하였을 때도 0.54 kg f/cm의 높은 고온 박리강도를 보였다. FCCL의 박리강도, 표면 거칠기, 원소들의 화학적 결합, 박막의 미세구조를 peel test, atomic force microscopy, X-ray photoelectron spectroscopy, transmission electron microscopy를 이용하여 폴리이미드 기판 플라즈마 전처리 효과를 확인하였다. 그 결과 플라즈마 전처리를 한 폴리이미드 기판의 경우 처리하지 않은 기판보다 상온과 고온에서 더 우수한 접착력을 가지는 것을 확인 할 수 있었는데 이것은 폴리이미드 기판의 표면 거칠기 증가에 의한 mechanical interlocking effect가 아닌 전처리를 통한 폴리이미드 표면 개질로 C-0, C-N와 같은 chemical functional group이 증가했기 때문인 것으로 확인되었다.

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