• Korean Journal of Optics and Photonics
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• v.16 no.3
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• pp.182-190
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• 2005

The fiber Raman amplifier(FRA) is a distinctly advantageous technology. Due to its wider, flexible gain bandwidth, and intrinsically lower noise characteristics, FRA has become an indispensable technology of today. Various FRA modeling methods, with different levels of convergence speed and accuracy, have been proposed in order to gain valuable insights for the FRA dynamics and optimum design before real implementation. Still, all these approaches share the common platform of coupled ordinary differential equations(ODE) for the Raman equation set that must be solved along the long length of fiber propagation axis. The ODE platform has classically set the bar for achievable convergence speed, resulting exhaustive calculation efforts. In this work, we propose an alternative, highly efficient framework for FRA analysis. In treating the Raman gain as the perturbation factor in an adiabatic process, we achieved implementation of the algorithm by deriving a recursive relation for the integrals of power inside fiber with the effective length and by constructing a matrix formalism for the solution of the given FRA problem. Finally, by adiabatically turning on the Raman process in the fiber as increasing the order of iterations, the FRA solution can be obtained along the iteration axis for the whole length of fiber rather than along the fiber propagation axis, enabling faster convergence speed, at the equivalent accuracy achievable with the methods based on coupled ODEs. Performance comparison in all co-, counter-, bi-directionally pumped multi-channel FRA shows more than 102 times faster with the convergence speed of the Average power method at the same level of accuracy(relative deviation < 0.03dB).

• Journal of Korean Society of Environmental Engineers
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• v.28 no.5
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• pp.549-557
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• 2006

The characteristics of supercritical water oxidation have been studied to decompose the waste anionic exchange resins which were produced from a power plant. The waste resins from a power plant were mixture of anionic and cationic exchange resins. The waste anionic exchange resins had been separated from the waste resins using a solid-liquid fluidized bed. It was confirmed that the cationic exchange resins were not included in the separated anionic exchange resins by the elemental and thermogravimetric analysis. A slurry of anionic exchange resins which could be fed continuously to a supercritical water oxidation apparatus by a high pressure pump was prepared using a wet ball mill. Although the COD of liquid effluent had been reduced more than 99.9% at 25.0 MPa and $500^{\circ}C$ within 2 min, the total nitrogen content was reduced only 41%. The addition of nitric acid to the slurry could reduce the total nitrogen content in treated water. The central composite design as a statistical desist of experiments had been applied to optimize the conditions of decomposing anionic resin slurry by means of the COD and total nitrogen contents in treated waters as the key process output variables. The COD values of treated waters had been reduced sufficiently to $99.9{\sim}100%$ af the reaction conditions of $500{\sim}540^{\circ}C$, 25.0 MPa within 2 min. The effects of temperature and nitric acid concentration on COD were not significant. However, the effect of nitric acid concentration on the total nitrogen was found to be significant. The regression equation for the total nitrogen had been obtained with nitric acid concentration and the coefficient of determination($r^2$) was 95.8%.

• FLOWER RESEARCH JOURNAL
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• v.19 no.2
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• pp.81-88
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• 2011

Effect of concentrations of different plant growth retardants (PGRs) supplied to a recirculated nutrient solution in an ebb and flow system on the growth and development of potted Spathiphyllum 'Top-Pin' and 'Mini' was examined. Plants were planted in 10 cm diameter plastic pots filled with a mixture of peat moss and perlite (1 : 1, v/v) on 30 June 2005 and grown until 23 Sep. 2005. In a closed ebb and flow system, 50, 200, 350, $500mg{\cdot}L^{-1}$ daminozide (B-9), 10, 40, 70, $100mg{\cdot}L^{-1}$ paclobutrazol (Boundy), 5, 15, 25, $35mg{\cdot}L^{-1}$ ethephon (Florel), and 1, 4, 7, $10mg{\cdot}L^{-1}$ uniconazole (Sumagic) were supplemented to a nutrient solution at the initiation of experiment. On every irrigation, the nutrient solution containing PGRs was supplied at a 2 cm depth and kept for 15-20 minutes. The surplus nutrient solution was drained back into the tank for next irrigations. Paclobutrazol gave the most pronounced effect in inhibition of stretchiness. The greatest reduction of leaf length, fresh and dry weights of shoot, and elevated chlorophyll content were recorded in Spathiphyllum, with increasing paclobutrazol concentration. Daminozide concentration greater than $200mg{\cdot}L^{-1}$ resulted in minor stunting. The lowest concentration ($1mg{\cdot}L^{-1}$) of uniconazole showed greater leaf length, leaf width, and leaf petiole length than the control ($0mg{\cdot}L^{-1}$). Uniconazole concentration greater than $1mg{\cdot}L^{-1}$ resulted in similar plant growth as the plant in the control ($0mg{\cdot}L^{-1}$). High concentration ($35mg{\cdot}L^{-1}$) of ethephon resulted in the shortest leaf length, and the greatest chlorophyll content. Inhibition of stretchiness was observed even in the lowest concentration treatments. Among the PGRs, paclobutrazol was most effective in suppressing plant stretchiness. In both cultivars, ethephon and paclobutrazol, but not daminozide and uniconazole, significantly inhibited stretchiness. The results suggested that plant growth retardants (ethephon or paclobutrazol) selected in this study may be used as the most effective agents for inhibition of stretchiness in Spathiphyllum.

• Journal of the Korean Vacuum Society
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• v.17 no.1
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• pp.16-22
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• 2008

We studied plasma etching of polycarbonate in $O_2/SF_6$, $O_2/N_2$ and $O_2/CH_4$. A capacitively coupled plasma system was employed for the research. For patterning, we used a photolithography method with UV exposure after coating a photoresist on the polycarbonate. Main variables in the experiment were the mixing ratio of $O_2$ and other gases, and RF chuck power. Especially, we used only a mechanical pump for in order to operate the system. The chamber pressure was fixed at 100 mTorr. All of surface profilometry, atomic force microscopy and scanning electron microscopy were used for characterization of the etched polycarbonate samples. According to the results, $O_2/SF_6$ plasmas gave the higher etch rate of the polycarbonate than pure $O_2$ and $SF_6$ plasmas. For example, with maintaining 100W RF chuck power and 100 mTorr chamber pressure, 20 sccm $O_2$ plasma provided about $0.4{\mu}m$/min of polycarbonate etch rate and 20 sccm $SF_6$ produced only $0.2{\mu}m$/min. However, the mixed plasma of 60 % $O_2$ and 40 % $SF_6$ gas flow rate generated about $0.56{\mu}m$ with even low -DC bias induced compared to that of $O_2$. More addition of $SF_6$ to the mixture reduced etch of polycarbonate. The surface roughness of etched polycarbonate was roughed about 3 times worse measured by atomic force microscopy. However examination with scanning electron microscopy indicated that the surface was comparable to that of photoresist. Increase of RF chuck power raised -DC bias on the chuck and etch rate of polycarbonate almost linearly. The etch selectivity of polycarbonate to photoresist was about 1:1. The meaning of these results was that the simple capacitively coupled plasma system can be used to make a microstructure on polymer with $O_2/SF_6$ plasmas. This result can be applied to plasma processing of other polymers.