• The Journal of the Institute of Internet, Broadcasting and Communication
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• v.19 no.1
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• pp.203-209
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• 2019

In this work, a new land-specific resistance measuring device (GM) and a measuring probe (Grounding Rod) are connected to the WENNER quadrant as power-line communication (PLC). In groups of two (P1,P2) probes, five to ten probes are installed in series on the ground at intervals of 1m, 2m, 4m, 8m, and 16m, respectively. If the PLC signal from the GMD is detected by the receiver of the Probe 1 (P1) for measurement, the minute voltage and current for measurement flow from the PSD (power supply) attached to the probe to the ground, and then, through the soil between P1 and P2, enters the Probe 1 (P2). The resistance value is then measured by the principle of voltage drop due to ground resistance. Measure the earth resistance every T seconds up to 1 trillion and store the measured data on the Arduino Server mounted on the main equipment. Stored measurement data can be derived from formulas by Ohm's Law and from inherent resistance (here,). Data obtained in real time will be linked to CDGES programs installed on Main PC, enabling data analysis and real-time monitoring of the ground environment on land. In addition, a three-dimensional display is possible with 3D graph support by identifying seasonal characteristics such as temperature and humidity of land (soils). The limitations of the study will require specific application measures of Test Bed for commercial access to a model that has been developed and operated experimentally.

• Journal of the Korean Vacuum Society
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• v.19 no.5
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• pp.331-340
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• 2010

3D fluid based numerical modelling is done for a VHF multi hollow cathode array plasma enhanced chemical vapor deposition system. In order to understand the fundamental characteristics of it, Ar plasma is analyzed with a condition of 40 MHz, 100 Vrf and 1 Torr. For hole array of 6 mm diameter and 20 mm inter-hole distance, plasma is well confined within the hole at an electrode gap of 10 mm. The peak plasma density was $5{\times}10^{11}#/cm^3$ at the center of the hole. When the substrate was assumed at ground potential, electron temperature showed a peak at the vicinity of the grounded walls including the substrate and chamber walls. The reaction rate of metastable based two step ionization was 10 times higher than the direct electron impact ionization at this condition. For $H_2$, the spatial localization of discharge is harder to get than Ar due to various pathways of electron impact reactions other than ionization.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.211.2-211.2
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• 2016

그래핀은 본연의 우수한 물성으로 인하여 전자소자, 에너지 저장매체, 유연성 전도막 등 다양한 분야로의 응용가능성이 제기되었으나, 실제적인 응용을 위해서는 구조적인 결함을 최소화하며, 특성을 자유로이 제어하거나 향상시키는 공정의 개발이 요구된다. 특히 그래핀을 전자소자로 응용하기 위해서는 전기적 특성을 제어하는 것이 요구된다. 일반적으로 화학적 도핑은 그래핀의 전기적 특성을 제어하는 효율적인 방법으로 알려져 있다. 화학적 도핑은 그래핀을 구성하는 탄소원자를 이종원자로 치환하거나 표면에 흡착시켜 기능화 된 그래핀을 얻는 방법으로, 특정 가스 분위기에서 고온 열처리하거나 활성종들이 존재하는 플라즈마에 노출시키는 방법이 제시되었다. 특히 플라즈마를 이용한 도핑방법은 저온에서 단시간의 처리로 도핑이 가능하고, 플라즈마 변수를 변경하여 도핑정도를 수월하게 제어할 수 있다는 장점을 가지고 있다. 그러나 플라즈마내의 극성을 띄는 다양한 활성종들의 충돌효과로 인하여 구조적인 손상이 발생하여 오히려 특성이 저하될 수 있어 이를 고려한 플라즈마 공정조건의 설정이 필수적이다. 따라서 본 연구에서는 플라즈마에 노출된 그래핀의 Raman 특성을 고찰함으로써 화학적 도핑과 구조적인 결함의 경계를 확립하고 구조결함의 형성을 최소화한 효율적인 도핑조건을 도출하였다. 그래핀은 물리적 박리법을 이용하여 300 nm 두께의 실리콘 산화막이 존재하는 실리콘 웨이퍼 위에 제작하였으며, 평행 평판형 직류 플라즈마 장치를 이용하여 전극의 위치, 인가전력, 처리시간을 변수로 암모니아($NH_3$) 플라즈마를 방전하여 그래핀의 Raman 특성변화를 관찰하였다. 그래핀의 구조적 결함 및 도핑 효과는 라만 스펙트럼의 D, D', 2D밴드의 강도와 G밴드의 위치와 반치폭(Full width at half maximum; FWHM)의 변화를 통해 확인하였다. 그 결과, 인가전력과 처리시간에 따라 결함형성과 질소도핑 영역이 구분 가능함을 확인하였으며, 이를 바탕으로 결함형성을 최소화한 효율적인 도핑조건이 접지전위, 0.45 W의 인가전력, 처리시간 10초이며, 최적조건에서 계산된 도핑레벨은 $1.8{\times}10^{12}cm^{-2}$임을 확인하였다.

• Geophysics and Geophysical Exploration
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• v.5 no.4
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• pp.223-235
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• 2002

Since weak Bones or geological lineaments are likely to be eroded, there may develop weak Bones beneath rivers, and a careful evaluation of ground condition is important to construct structures passing through a river. DC resistivity method, however, has seldomly applied to the investigation of water-covered area, possibly because of difficulties in data aquisition and interpretation. The data aquisition having high quality may be the most important factor, and is more difficult than that in land survey, due to the water layer overlying the underground structure to be imaged. Through the numerical modeling and the analysis of a case history, we studied the method of resistivity survey at the water-covered area, starting from the characteristics of measured data, via data acquisition method, to the interpretation method. We unfolded our discussion according to the installed locations of electrodes, ie., floating them on the water surface, and installing them at the water bottom, because the methods of data acquisition and interpretation vary depending on the electrode location. Through this study, we could confirm that the DC resistivity method can provide fairly reasonable subsurface images. It was also shown that installing electrodes at the water bottom can give the subsurface image with much higher resolution than floating them on the water surface. Since the data acquired at the water-covered area have much lower sensitivity to the underground structure than those at the land, and can be contaminated by the higher noise, such as streaming potential, it would be very important to select the acquisition method and electrode array being able to provide the higher signal-to-noise ratio (S/N ratio) data as well as the high resolving power. Some of the modified electrode arrays can provide the data having reasonably high S/N ratio and need not to install remote electrode(s), and thus, they may be suitable to the resistivity survey at the water-covered area.