• Title/Summary/Keyword: 코팅/층

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Surface Modification of Poly(tetrafluoroethylene) (PTFE) Membranes (PTFE 막의 표면 개질 방법)

  • Jun Kyu Jang;Chaewon Youn;Ho Bum Park
    • Membrane Journal
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    • v.33 no.1
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    • pp.1-12
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    • 2023
  • In this review, surface modification methods of hydrophobic poly(tetrafluoroethylene) (PTFE) membrane are introduced and their improved hydrophilicity results are discussed. Fluoropolymer based membranes, represented by PTFE membranes have been used in various membrane separation processes, including membrane distillation, oil separation and gas separation. However, despite excellent physical properties such as chemical resistance, heat resistance and high mechanical strength, the strong hydrophobicity of PTFE membrane surface has become a challenging factor in expanding its membrane separation application. To improve the separation performance of PTFE membranes, wet chemical, hydrophilic coating, plasma, irradiation and atomic layer deposition are applied, modifying the surface property of PTFE membranes while maintaining their inherent properties.

Effects of Thickness and Defects of DLC Coating Layer on Corrosion Resistance of Metallic Bipolar Plates of PEMFCs (PEMFC 금속분리판의 내식성에 미치는 DLC 코팅층의 두께 및 결함의 영향)

  • Dong-Ho Shin;Seong-Jong Kim
    • Corrosion Science and Technology
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    • v.23 no.3
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    • pp.235-245
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    • 2024
  • DLC coatings have been widely applied in industrial fields that require high corrosion resistance due to their excellent mechanical characteristics and chemical stability. In this research, effects of DLC coating thickness and defects on corrosion resistance were investigated for application of metallic bipolar plates in polymer membrane electrolyte fuel cells (PEMFCs). Results revealed that a DLC coating thickness of 0.7 ㎛ could lead to a defect size reduction of about 75.9% compared to that of 0.3 ㎛.As a result of potentiodynamic polarization experiments, the current density under a potential of 0.6 V was measured to be less than 1 ㎂/cm2,which was an excellent value. Inparticular, the delamination ratio and the decrease rate of maximum pitting depth were up to 84.8% and 63.3%, respectively, with an increase in the DLC coating thickness. These results demonstrate that DLC coating thickness and defects are factors that can affect corrosion resistance of DLC coating and its substrate.

Microstructure of ZnO Thin Film on Nano-Scale Diamond Powder Using ALD (나노급 다이아몬드 파우더에 ALD로 제조된 ZnO 박막 연구)

  • Park, S.J.;Song, S.O.
    • Journal of the Korean Vacuum Society
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    • v.17 no.6
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    • pp.538-543
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    • 2008
  • Recently a nano-scale diamond is possible to manufacture forms of powder(below 100 nm) by new processing of explosion or deposition method. Using a sintering of nano-scale diamond is possible to manufacture of grinding tools. We have need of a processing development of coated uniformly inorganic to prevent an abnormal grain growth of nano-crystal and bonding obstacle caused by sintering process. This paper, in order to improve the sintering property of nano-scale diamond, we coated ZnO thin films(thickness: $20{\sim}30\;nm$) in a vacuum by ALD(atomic layer deposition) Economically, in order to deposit ZnO all over the surface of nano-scale diamond powder, we used a new modified fluidized bed processing replaced mechanical vibration effect or fluidized bed reactor which utilized diamond floating owing to pressure of pulse(or purge) processing after inserted diamond powders in quartz tube(L: 20 mm) then closed quartz tube by porosity glass filter. We deposited ZnO thin films by ALD in closed both sides of quartz tube by porosity glass filter by ALD(precursor: DEZn($C_4H_{10}Zn$), reaction gas: $H_2O$) at $10^{\circ}C$(in canister). Processing procedure and injection time of reaction materials set up DEZn pulse-0.1 sec, DEZn purge-20 sec, $H_2O$ pulse-0.1 sec, $H_2O$ purge-40 sec and we put in operation repetitive 100 cycles(1 cycle is 4 steps) We confirmed microstructure of diamond powder and diamond powder doped ZnO thin film by TEM(transmission electron microscope) Through TEM analysis, we confirmed that diamond powder diameter was some $70{\sim}120\;nm$ and shape was tetragonal, hexagonal, etc before ALD. We confirmed that diameter of diamond powders doped ZnO thin film was some $70{\sim}120\;nm$ and uniform ZnO(thickness: $20{\sim}30\;nm$) thin film was successfully deposited on diamond powder surface according to brightness difference between diamond powder and ZnO.

Nanophase Catalyst Layer for Direct Methanol Fuel Cells

  • Chang Hyuk;Kim Jirae
    • Journal of the Korean Electrochemical Society
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    • v.4 no.4
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    • pp.172-175
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    • 2001
  • Nanophase catalyst layer for direct methanol fuel cell has been fabricated by magnetron sputtering method. Catalyst metal targets and carbon were sputtered simultaneously on the Nafion membrane surface at abnormally higher gas (Ar/He mixture) pressure than that of normal thin film processing. They could be coated as a novel structure of catalyst layer containing porous PtRu or Pt and carbon particles both in nanometer range. Membrane electrode assembly made with this layer led to a reduction of the catalyst loading. At the catalyst loading of 1.5mg $PtRu/cm^2$ for anode and 1mg $Pt/cm^2$ for cathode, it could provide $45 mW/cm^2$ in the operation at 2 M methanol, 1 Bar Air at 80"C. It is more than $30\%$ increase of the power density performance at the same level of catalyst loading by conventional method. This was realized due to the ultra fine particle sizes and a large fraction of the atoms lie on the grain boundaries of nanophase catalyst layer and they played an important role of fast catalyst reaction kinetics and more efficient fuel path. Commercialization of direct methanol fuel cell for portable electronic devices is anticipated by the further development of such design.

Characterization of transparent Sb-doped $SnO_2$ conducting films by XPS analysis (XPS를 이용한 Sb-doped $SnO_2$ 투명전도막의 특성 분석)

  • 임태영;김창열;심광보;오근호
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.13 no.5
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    • pp.254-259
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    • 2003
  • In the fabrication process of transparent conducting thin films of the ATO (antimony-doped tin oxide) on a soda lime glass substrate by a sol-gel dip coating method, the effects of the $SiO_2$ buffer layer formed on the substrate and $N_2$ annealing treatment were investigated by XPS (X-ray photoelectron spectroscopy) analysis. Optical transmittance and electrical resistivity of the 400 nm-thick ATO thin films which were deposited on $SiO_2$ buffer layer/soda lime glass and then annealed under nitrogen atmosphere were 84 % and $5.0\times 10^{-3}\Omega \textrm{cm}$ respectively. The XPS analysis confirmed that a $SiO_2$ buffer layer inhibited Na ion diffusion from the substrate, resulting in prohibiting the formation of a secondary phase such as $Na_2SnO_3$ and SnO and increasing Sb ion concentration and ratio of $Sb^{5+}/Sb^{3+}$ in the film. And it was also found that $N_2$ annealing treatment leads to the reduction of $Sn^{4+}$as well as $Sb^{5+}$ however the reduction of $Sn^{4+}$ is more effective and therefore consequently results in decrease in the electrical resistivity to produce an excellent electrical properties of the film.

Study on Design of ZnO-Based Thin-Film Transistors With Optimal Mechanical Stability (ZnO 기반 박막트랜지스터의 기계적 안정성 확보에 관한 연구)

  • Lee, Deok-Kyu;Park, Kyung-Yea;Ahn, Jong-Hyun;Lee, Nae-Eung;Kim, Youn-Jea
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.35 no.1
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    • pp.17-22
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    • 2011
  • ZnO-based thin-film transistors (TFTs) have been fabricated and the mechanical characteristics of electric circuits, such as stress, strain, and deformation are analyzed by the finite element method (FEM). In this study, a mechanical-stability design guide for such systems is proposed; this design takes into account the stress and deformation of the bridge to estimate the stress distribution in an $SiO_2$ film with 0 to 5% stretched on 0.5-${\mu}m$-thick. The predicted buckle amplitude of $SiO_2$ bridges agrees well with experimental results within 0.5% error. The stress and strain at the contact point between bridges and a pad were measured in a previous structural analysis. These structural analysis suggest that the numerical measurement of deformation, SU-8 coating thickness for Neutral Mechanical Plane (NMP) and ITO electrode size on a dielectric layer was useful in enhancing the structural and electrical stabilities.

Improvement of Conductive Micro-pattern Fabrication using a LIFT Process (레이저 직접묘화법을 이용한 미세패턴 전도성 향상에 관한 연구)

  • Lee, Bong-Gu
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.18 no.5
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    • pp.475-480
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    • 2017
  • In this paper, the conductivity of the fine pattern is improved in the insulating substrate by laser-induced forward transfer (LIFT) process. The high laser beam energy generated in conventional laser induced deposition processes induces problems such as low deposition density and oxidation of micro-patterns. These problems were improved by using a polymer coating layer for improved deposition accuracy and conductivity. Chromium and copper were used to deposit micro-patterns on silicon wafers. A multi-pulse laser beam was irradiated on a metal thin film to form a seed layer on an insulating substrate(SiO2) and electroless plating was applied on the seed layer to form a micro-pattern and structure. Irradiating the laser beam with multiple scanning method revealed that the energy of the laser beam improved the deposition density and the surface quality of the deposition layer and that the electric conductivity can be used as the microelectrode pattern. Measuring the resistivity after depositing the microelectrode by using the laser direct drawing method and electroless plating indicated that the resistivity of the microelectrode pattern was $6.4{\Omega}$, the resistance after plating was $2.6{\Omega}$, and the surface texture of the microelectrode pattern was uniformly deposited. Because the surface texture was uniform and densely deposited, the electrical conductivity was improved about three fold.

The Effect of Ag thickness on Optical and Electrical Properties of V2O5/Ag/ITO Multilayer (Ag의 두께에 따른 V2O5/Ag/ITO 구조의 다층 박막의 광학적, 전기적 특성)

  • Ko, Younghee;Park, Gwanghoon;Ko, Hang-Ju;Ha, Jun-Seok
    • Journal of the Microelectronics and Packaging Society
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    • v.21 no.1
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    • pp.7-11
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    • 2014
  • Recently, the buffer layers consisting of poly (3,4-ethylenedioxythiophene): poly (styrenesulfonate) (PEDOT-PSS) are extensively used to improve power conversion efficiency (PCE) of organic solar cells. However, PEDOT-PSS is not suitable for mass production of organic solar cells due to its intrinsic acid and hygroscopic properties. Moreover, because of chemical reactions between indium tin oxide (ITO) layer and PEDOT-PSS layer, the interface is not stable. For these reasons, alternative materials such as $V_2O_5$ have been developed to be an effective buffer layer. In this work, we used $V_2O_5$/Ag/ITO multilayer structure for the anode buffer layer. With variation of thickness of Ag layer, we investigated the optical and electrical properties of $V_2O_5$/Ag/ITO multi-layer films. As a result, we found that the electrical properties were improved with increasing Ag thickness while optical transmittance decreases in visible wavelength region. From the calculation of figure of merit (FOM) which is used to evaluate proper structure for transparent of optoelectronic, $V_2O_5$/Ag/ITO multilayer electrode was optimized with 4 nm thick Ag layer in optical (88% in transmittance) and electrical ($4{\times}10^{-4}{\Omega}cm$) properties. This indicates that $V_2O_5$/Ag/ITO multilayer electrode could be a candidate for the anode of optoelectronic devices.

UV-nanoimprint Patterning Without Residual Layers Using UV-blocking Metal Layer (UV 차단 금속막을 이용한 잔류층이 없는 UV 나노 임프린트 패턴 형성)

  • Moon Kanghun;Shin Subum;Park In-Sung;Lee Heon;Cha Han Sun;Ahn Jinho
    • Journal of the Microelectronics and Packaging Society
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    • v.12 no.4 s.37
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    • pp.275-280
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    • 2005
  • We propose a new approach to greatly simplify the fabrication of conventional nanoimprint lithography (NIL) by combined nanoimprint and photolithography (CNP). We introduce a hybrid mask mold (HMM) made from UV transparent material with a UV-blocking Cr metal layer placed on top of the mold protrusions. We used a negative tone photo resist (PR) with higher selectivity to substrate the CNP process instead of the UV curable monomer and thermal plastic polymer that has been commonly used in NIL. Self-assembled monolayer (SAM) on HMM plays a reliable role for pattern transfer when the HMM is separated from the transfer layer. Hydrophilic $SiO_2$ thin film was deposited on all parts of the HMM, which improved the formation of SAM. This $SiO_2$ film made a sub-10nm formation without any pattern damage. In the CNP technique with HMM, the 'residual layer' of the PR was chemically removed by the conventional developing process. Thus, it was possible to simplify the process by eliminating the dry etching process, which was essential in the conventional NIL method.

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Properties analysis of environment friendly calcareous deposit films electrodeposited at various temperature conditions in natural seawater (천연해수 중 온도 변화에 따라 전착한 환경친화적인 석회질 피막의 특성 분석)

  • Lee, Chan-Sik;Kang, Jun;Lee, Myeong-Hoon
    • Journal of Advanced Marine Engineering and Technology
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    • v.39 no.7
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    • pp.779-785
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    • 2015
  • Cathodic protection is recognized as the most cost-effective and technically appropriate corrosion prevention method for the submerged zone of offshore structures, ships, and deep-sea facilities. When cathodic protection is applied, the cathodic currents cause dissolved oxygen reduction, generating hydroxyl ions near the polarized surface that increase the interfacial pH and result in enhanced carbonate ion concentration and precipitation of an inorganic layer whose principal component is calcium carbonate. Depending on the potential, magnesium hydroxide can also precipitate. This mixed deposit is generally called "calcareous deposit." This layer functions as a barrier against the corrosive environment, leading to a decrease in current demand. Hence, the importance of calcareous deposits for the effective, efficient operation of marine cathodic protection systems is recognized by engineers and scientists concerned with cathodic protection in submerged marine environments. Calcareous deposit formation on a marine structure depends on the potential, current, pH, temperature, pressure, sea-water chemistry, flow, and time; deposit quality is significantly influenced by these factors. This study determines how calcareous deposits form in sea water, and assesses the interrelationship of formation conditions (such as the sea water temperature and surface condition of steel), deposited structure, and properties and the effectiveness of the cathodic protection.