• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.159.2-159.2
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• 2014

간접띠간격(indirect bandgap)을 갖는 층상형 반도체 $MoS_2$는 두께가 줄어들어 단일층이 되면 층간 상호작용의 변화로 인해 ~1.8 eV의 직접띠간격(direct bandgap)을 갖게 된다. 이러한 초박형 $MoS_2$의 발광 특성을 활용하기 위해서는 원자 크기 수준에서 두께와 물성을 조절할 수 있는 화학적 표면개질법에 대한 이해가 필요하다. 최근 아르곤(Ar) 플라즈마를 이용한 $MoS_2$의 층상(layer-by-layer) 식각과 표면제어에 관한 연구결과가 보고되었으나 자세한 반응 메커니즘은 알려져 있지 않다. 본 연구에서는 산소 플라즈마에 의한 단일층 및 복층 $MoS_2$의 산화반응을 원자힘 현미경(AFM), 광전자 분광법(XPS), 라만 및 광발광 분광법을 통해 관찰하고 반응 메커니즘을 이해하고자 한다. 플라즈마로 생성된 산소라디칼과의 반응시간이 증가함에 따라 $E{^1}_{2g}$와 $A_{1g}$-진동모드에서 기인하는 라만 신호, 그리고 A와 B-엑시톤에서 유래하는 광발광의 세기가 감소함을 확인하였다. XPS와 AFM을 통해 반응이 진행됨에 따라 $MoS_2$의 상층이 $MoO_3$로 산화되면서 나노입자로 응집되어 표면형태가 변화하는 것을 확인하였다. 이 결과는 플라즈마 산화반응을 이용하여 $MoS_2$ 표면에 구조적 결함(defect)과 층상 식각을 유발하고 광발광 특성 제어를 위해 전자구조를 조절할 수 있다는 가능성을 보여준다.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.130-130
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• 2011

최근 반도체 메모리 산업의 발전과 동시에 발생되는 문제들을 극복하기 위한 새로운 기술들이 요구되고 있다. DRAM (dynamic random access memory) 의 경우, 소자의 크기가 수십 나노미터 영역으로 줄어들면서, 단채널 효과에 의한 누설전류와 소비전력의 증가 등이 문제가 되고 있다. 하나의 캐패시터와 하나의 트랜지스터로 구성된 기존의 DRAM은, 소자의 집적화가 진행 되어 가면서 정보저장 능력이 감소하는 것을 개선하기 위해, 복잡한 구조의 캐패시터 영역을 요구한다. 이에 반해 하나의 트랜지스터로 구성되어 있는 1T-DRAM의 경우, 캐패시터 영역이 없는 구조적인 이점과, SOI (silicon-on-insulator) 구조의 기판을 사용함으로써 뛰어난 전기적 절연 특성과 기생 정전용량의 감소, 그리고 기존 CMOS (complementary metal oxide semiconductor) 공정과의 호환성이 장점이다. 또한 새로운 물질 혹은 구조를 적용하여, 개선된 전기적 특성을 통해 1T-DRAM의 메모리 특성을 향상 시킬 수 있다. 본 연구에서는, SOI와 SGOI (silicon-germanium-on-insulator) 및 sSOI (strained-si-on-insulator) 기판을 사용한 MOSFET을 통해, strain 효과에 의한 전기적 특성 및 메모리 특성을 평가 하였다. 그 결과 strained-Si층과 relaxed-SiGe층간의 tensile strain에 의한 캐리어 이동도의 증가를 통해, 개선된 전기적 특성 및 메모리 특성을 확인하였다. 또한 채널층의 결함이 적은 sSOI 기판을 사용한 1T-DRAM에서 가장 뛰어난 특성을 보였다.

• Applied Chemistry for Engineering
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• v.19 no.4
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• pp.407-412
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• 2008

As an activation procedure, in this study, the oxidation treatment of needle cokes with a dilute nitric acid and sodium chlorate $(NaClO_3)$, combined with heat treatment, was attempted. The structures of acid-treated and pyrolyzed coke were examined with XRD, FESEM, elemental analyzer, BET, and Raman spectroscopy. The behavior of double layer capacitance was investigated with the analysis of charge and discharge. The structure of needle coke treated with acid was revealed to a single phase of (001) diffraction peak after 24 h. On the other hand, thecoke oxidized by heat treatment was reduced to a graphite structure of (002) at $300^{\circ}C$. The distorted graphene layer structure, derived from the process of oxidation and reduction of the inter-layer, makes the pores by the electric field activation at the first charge, and generates the double layer capacitance from the second charge. The cell using pyrolyzed coke with 24 h acid treatment and $300^{\circ}C$ heat treatment exhibited the maximum capacitance per weight and volume of 33 F/g and 30 F/mL at the two-electrode system in the potential range of 0~2.5 V.

• Journal of the Korean Electrochemical Society
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• v.2 no.4
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• pp.221-226
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• 1999

Two needle cokes (NC-A and NC-B) that differ in both the texture and impurity content to each other were graphitized at $2000-3000{\circ}C$, and the average particle size, size distribution and surface area were compared after milling. Their anodic properties in Li secondary batteries were also analyzed. Two materials showed a higher degree of graphitization with an increase in the preparation temperature, however, the NC-B series was less graphitized than NC-A due to the presence of impurities and less ordered mosaic texture. The mein particle size of the milled powder was proportional to the degree of graphitization, but the surface area showed the opposite trend. The highly graphitized materials yielded powders of lower uniformity in the size distribution. The discharge capacity of the resulting carbons steadily decreased in the temperature range of 1000 to $2000^{\circ}C$ due to the depletion of carbonaceous interlayers that contain crystal defects. A later increase in the discharge capacity was observed at $>2000^{\circ}C$, which arises from the formation of graphitic interlayers. The milling process gave rise to a sloping discharge curve at >1.0 V, but this was converted to a plateau at <0.25V after a repeated cycling or additional heat-treatment at $1000^{\circ}C$. The discharge at >1.0V likely comes from the disordered surface structure formed during the milling process. The evolution of a plateau at <0.25 V suggests that this disordered structure transforms to a more ordered graphitic one upon a cell cycling or heat-treatment.

• Composites Research
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• v.30 no.6
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• pp.356-364
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• 2017

Composite lattice structures are tried to be used in various fields because of its benefit in physical properties. With increase of demand of the composite lattice structure, nondestructive testing technology is also required to certificate the quality of the manufactured structures. Recently, research on the development of the composite lattice structure in Republic of Korea was started and accordingly, fast and accurate non-destructive evaluation technology was needed to finalize the manufacturing process. This paper studied non-destructive testing methods for composite lattice structure using laser ultrasonic propagation imaging systems. Pulse-echo ultrasonic propagation imaging system was able to inspect a rib structure wrapped with a skin structure. To reduce the time of inspection, a band divider, which can get signal in different frequency bands at once, was developed. Its performance was proved in an aluminum sandwich panel. In addition, to increase a quality of results, curvature compensating algorithm was developed. On the other hand, guided wave ultrasonic propagation imaging system was applied to inspect delamination in a rib structure. To increase an area of inspection, multi-source ultrasonic wave propagation image was applied, and defects were successfully highlighted with variable time window amplitude mapping algorithm. These imply that ultrasonic propagation imaging systems provides fast and accurate non-destructive testing results for composite lattice structure in a stage of the manufacturing process.

• Journal of the Korean Society for Nondestructive Testing
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• v.18 no.4
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• pp.278-291
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• 1998

Fracture process of continuous fiber reinforced composites is very complex because various fracture mechanisms such as matrix cracking, debonding, delamination and fiber breaking occur simultaneously during crack growth. If fibers cause crack bridging during crack growth, the stable crack growth and unstable crack growth appear repeatedly. Therefore, it is very difficult to exactly determine tile starting point of crack growth and the fracture toughness at the critical crack length in composites. In this research, fracture toughness test for CFRP was accomplished by using acoustic emission(AE) and recording of tile fracture process in real time by video-microscope. The starting point of crack growth, pop-in point and the point of unstable crack growth can be exactly determined. Each fracture mechanism can be classified by analyzing the fracture process through AE and video-microscope. The more reliable method ior the fracture toughness measurement of composite materials was proposed by using the combination of R-curve method, AE and video microscope.

• Journal of the Korean Vacuum Society
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• v.5 no.3
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• pp.258-262
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• 1996

We have investigated the changes in magnetoresistive characteristics, interfacial roughness, and preferred orientation with the Fe buffer layer thickness, annealing temperature, and the stacking number of layers variation in Fe/[NiFe/Cu] multilayers by using the 3-gun d.c. magnetron sputtering method. Intensity of the (200) orientation was increased with the increment of the Fe-buffer layer thickness. We found a maximum magnetoresistance ration of 4.7%, when the buffer layer thickness was 70$\AA$, and the field sensitivity also showed a maximum value at the same thickness. We varied the stacking number of multilayers with fixing the Fe buffer layer thickness of 70$\AA$. When the stacking number was 40 layers, maximum MR ratio(5.3%) was observed. With the variation of annealing temperature no change in the MR ratio was found beyond $300^{\circ}C$. But decrement of MR ratio was observed above $300^{\circ}C$. This decrement of the MR ratio was responsible for the increment of paramagnetic mixed layer caused by the diffusion of Cu layer and the change of antiferromagnetic coupling.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.47 no.4
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• pp.13-19
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• 2010

MOSFET with deuterium-incorporated gate oxide shows enhanced reliability compared to conventional MOSFET. We present an alternative process whereby deuterium is delivered to the location where the gate oxide reside by an implantation process. Deuterium ions were implanted using two different energies to account for the topography of the overlaying layers and placing the D peak at the top of gate oxide. A short anneal at forming gas was performed to remove the D-implantation damage. We have observed that deuterium ion implantation into the gate oxide region can successfully remove the interface states and the bulk defects. But the energy and the dose of the deuterium implant need to be optimized to maintain the Si substrates dopant activation, while generating deuterium bonds inside gate oxide. CV and IV characteristics studies also determined that the deuterium implant dose not degrade the transistor performance.

• Journal of the Korean Society for Nondestructive Testing
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• v.25 no.2
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• pp.103-109
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• 2005

Fiber reinforced plastic material should be inspected in fabrication process in order to enhance quality by prevent defects such as delamination and void. Generally, ultrasonic technique is widely used to evaluate FRP. In conventional ultrasonic techniques, transducer should be contacted on FRP. However, conventional contacting method could not be applied in fabrication process and novel non-contact evaluating technique was required. Laser-based ultrasonic technique was tried to evaluate CFRP plate. Laser-based ultrasonic waves propagated on CFRP were received with various transducers such as accelerometer and AE sensor in order to evaluate the properties of waves due to the variation of frequency. Velocities of laser-based ultrasonic waves were evaluated for various fiber orientation. In addition, laser interferometry was used to receive ultrasonic wave in CFRP and frequency was analysed.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.397.2-397.2
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• 2014

유기 발광 다이오드 (OLED)의 상용화를 위해 해결해야할 기술적 문제 중하나는 장수명이다. OLED에 적용된 유기물 층은 수분과 산소에 취약하여 소자 수명을 단축하는 요소로 작용하는데, 이를 해결하기 위해 유기물을 보호하며, 유기물 내로 침투되는 수분과 산소를 제어하기 위한 보호 층의 증착이 필수적이다. 필수적이다. 본 연구에서는, 사이클 화학 기상 증착법(C-CVD)을 이용하여 SiN/SiCN/SiN 구조의 무기 박막을 증착하여 유기물 보호층으로서의 적용 가능성을 제시하고자 한다. 이 때 각층의 두께는 각 각 10 nm이다. 증착된 다층 무기 박막은 비정질 상으로 수분 침투 보호막으로서 적당하다. 다층 무기 박막의 수분에 대한 저항성은 칼슘을 이용한 투과도 변화를 이용하여 측정하였다. 칼슘을 이용한 투과도 측정을 위해 고분자 PEN 필름위에 칼슘을 60nm 두께로 증착 시키고, 이어서 무기물인 SiN/SiCN/SiN의 다층 박막을 확산 방지층으로 증착 하였다. 제작된 소자는 온도 $85^{\circ}C$, 상대습도 85%의 가혹 조건에서 시간에 따른 표면 변화 및 투과도의 변화를 측정하였다. SiN/SiCN/SiN 구조를 갖는 무기 박막 층의 투습도는 3000시간까지는 $3.2{\times}10-5g/m/day$를 유지하였다. 이는 OLED 소자의 상용화를 위한 요구 조건에 근접한 값이다. 그러나 투습도는 측정 시간이 6000시간이 지난 후에 급격 증가하는데 이것은 30nm 두께의 SiN/SiCN/SiN의 확산 방지층에 임계 수명이 존재 한다는 것을 의미 한다고 할 수 있다. C-CVD 기술에 의해 제조된 다층 무기 박막 보호 층의 경계면에서 각 층간의 intermixing 현상이 관측되었으며, 이는 무기물 층의 결함과 핀 홀을 통해 내부로 확산 되는 수분의 침투 경로를 효과적으로 제어할 수 있는 방법이다. 본 연구 결과는 유연 기판 상에 제작된 OLED 소자에 적용 가능한 기술로서 소자 수명의 연장 뿐만 아니라 경량화에도 기여할 수 있는 기술이다.