• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.270-270
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• 2011

전이금속(transition metal) 질화물(nitride)은 높은 경도, 내마모성, 부식 저항성 그리고 내열성 등과 같은 우수한 기계적 물성 때문에 많은 연구가 되어 왔다. 이 중 질화 티타늄은 높은 경도, 내식 및 내마모의 우수한 기계적 특성으로 공구(tool)와 같은 제품의 수명 향상을 위한 표면 코팅소재로 사용되어 왔으며, 금(gold)색의 미려한 색상을 이용한 제품의 외관 표면처리와 인체에 무해한 특성을 활용한 정형외과 및 치과용 보형물의 수명 및 안정성 향상 등 다양한 분야에 응용 되고 있다. 본 연구에서는 아크방전을 이용한 경사 코팅법으로 질화 티타늄을 합성하였으며, 경사 코팅에 따른 단층 및 다층 박막(2~3 layer)의 미세조직 변화와 그 물성을 평가하였다. 아크 소스에 장착된 타겟은 120 $mm{\Phi}$, 99.5%의 Ti 타겟을 사용하였고, 시편과 타겟 간의 거리는 약 30 cm이며, 시편은 냉연강판과 SUS를 사용하였다. 시편을 진공용기에 장착하고 ~10-6 Torr까지 진공배기를 실시하고, Ar 가스를 진공용기 내로 공급하여 ~10-4 Torr에서 시편에 bias (Pulse : 400 V)를 인가한 후 아크를 발생시켜 약 5분간 청정을 실시하였다. 플라즈마 청정이 끝나면 시편에 인가된 bias를 차단하고 코팅하였다. 경사 코팅을 위한 시편의 회전각은 45$^{\circ}$, -45$^{\circ}$이며, 질화 티타늄의 두께는 약 3 ${\mu}m$로 동일하게 코팅 하였다. 45$^{\circ}$ 단일층의 경우 0$^{\circ}$ 단일층보다 경도가 감소하나 zigzag 구조의 다층으로 갈수록 45$^{\circ}$ 단일층과 비교하여 확연히 경도가 증가함을 볼 수 있었다. 다층 질화 티타늄의 경사 코팅을 통해 박막의 미세조직 변화를 SEM 이미지를 통해 확인하였으며 증착 방식에 따라 경도, 조도, 반사도 등의 물성 변화가 나타났다. 본 연구에서 얻어진 결과를 이용하여 다양한 형태의 박막구조 제어를 통한 물성변화가 가능할 것으로 예상된다.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.9 no.5
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• pp.516-520
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• 1999

Mechanical alloying (MA) by planetary type ball mill of pure iron powders was carried out under the ammonia gas atmosphere. The powders of metastable iron nitrides was synthesized up to the nitrogen content of 23 at% N. The observed phases are identified as the super-saturated bcc solid solution for the nitrogen concentration below 14.5 at% N and the non-equilibrium hcp phase stable at high temperature for 20.8 at.% N. Magnetization of Fe-N powders gradually decreases with increasing the N concentration on contrast to the enhancement reported for the bct iron nitrides. Neutron diffraction experiments also provide detailed information concerning the local atomic structure surrounding the nitrogen atoms. The coordination number of Fe atom around a nitrogen atom for the iron nitride containing 9.5 at% N turns out to be 3.9 atoms. This suggests that a nitrogen atom is situated at a center of the tetrahedron formed by iron atoms.

• Korean Journal of Metals and Materials
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• v.46 no.6
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• pp.357-362
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• 2008

The 2-step low temperature plasma processes (the combined carburizing and post-nitriding) were carried out for improving both the surface hardness and corrosion resistance of AISI 316L stainless steel. The effects of processing time and temperature on the surface properties during nitriding step were investigated. The expanded austenite (${\gamma}_N$) was formed on all of the treated surface. The thickness of ${\gamma}_N$ was increased up to about $20{\mu}m$ and the thickness of entire hardened layer was determined to be about $40{\mu}m$. The surface hardness reached up to $1,200HV_{0.1}$ which is about 5 times higher than that of untreated sample ($250HV_{0.1}$). The thickness of ${\gamma}_N$ and concentration of N on the surface were increased with increasing processing time and temperature. The corrosion resistance in 2-step low temperature plasma processed austenitic stainless steels was enhanced more than that in the untreated austenitic stainless steels due to a high concentration of N on the surface.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.10 no.4
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• pp.96-101
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• 2011

The thin films of TiN have been used extensively as wear-resistant materials, for instance, such as tools of high-speed cutting, metal mold forming etc. In these days, because the thin films capable of being used more severe conditions are needed, the technologies of arc ion plating are tried to improve its characteristics. The purpose of this study is to investigate the characteristics of thin films of (Ti,Cr)N compared with those of TiN. The method of arc ion plating, which is known as showing good tight-adherence and productivity, was used. After manufacturing thin films of ($Ti_{1-x}Cr_{x}$)N (x=0~1) with change of Cr in (Ti,Cr) target, atomic concentration, structure, size of crystallite, residual stress and surface roughness of thin films on substrate were investigated. As the results, it was confirmed that Cr atomic concentrations of thin films were proportionally changed with Cr atomic concentrations of target, and thin films of ($Ti_{1-x}Cr_{x}$)N (x=0~1) showed NaCl type and CrN existed as solid solution to TiN.

• Electrical & Electronic Materials
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• v.6 no.2
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• pp.175-183
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• 1993

Amorphous Semicondyctor로서 Chalcogenide계의 Ge-Se-Bi계 비정질화와 결정화 실험을 통하여 전기전도도를 평가코자 하였다. 시료의 조성범위는 G $e_{15-25}$S $e_{65-85}$B $i_{2.5-15B}$의 범위에서 5N의 Ge, Se, Bi metal분말을 사용하였다. 시료는 석영관에 진공 장입후 용융시켜 비정질화 하였다. 이때 열처리 조건은 1000.deg.C에서 10시간 동안 가열하였으며 급냉 조건은 3834.deg.C/sec로 처리하였다. 비정질 sample의 결정화는 결정핵을 형성 시킨 후 온도 변화 및 시간의 변화를 주면서 결정을 성장시켰으며 이때 B $i_{2}$S $e_{3}$와 GeS $e_{2}$ 결정상을 관찰 할 수 있었다. 박막화는 위의 실험에 사용된 Bulk sample을 사용하여 박막을 제작하였으며 유리화 영역은 Ge 15 at%, Se 70 at% 이상, Bi가 10 at% 이하일 때 비정질화가 용이하였다. Bulk의 경우 Ge를 20 at%로 고정시 Bi의 at% 함량이 증가함에 따라 전기전도도가 증가했으며 Bi가 7.5 at%이상일때 급격한 전도도의 증가를 가져왔다. 박막의 경우엔 Bulk sample보다 Bi의 함량이 증가시 더욱 큰 전도도의 증가를 가져왔다. G $e_{20}$S $e_{77.5}$B $i_{2.5}$ 저성의 결정화 경우 330.deg.C에서 4hr 유지시킨 경우가 가장 양호하였다.다.하였다.다.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.3 no.2
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• pp.115-119
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• 2002

This study was performed to improve mechanical properties of rotor and bushing materials. SACD and SKD11 steels as rotor and bushing materials were investigated. Gas nitriding and TiN coating were carried out on SACM and SKD11 steels. TiN coating was deposited on SKD11 steel by reactive sputtering process. This coated layer was picked off during the operation because of insufficient adhesion. Gas nitriding was carried out on SACM and SKD11 steels in an ammonia atmosphere at 51$0^{\circ}C$ for 72 hrs. These gas nitrided parts showed good mechanical properties. SKD11 steels were heat-treated to obtain optimum carbide size and distribution. As a results, the hardness increased.

• Journal of Power System Engineering
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• v.6 no.1
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• pp.74-81
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• 2002

The characteristics of corrosion resistance for the surface of ductile cast iron(GCD40) by plasma nitriding process have been studied in terms of electrochemical polarization behaviors including corrosion potential($E_{corr}$), anodic polarization trends, polarization resistance($R_p$), and also have been studied microstructures, hardness and specific wear of nitrided layer Nitrided layer showed an enhanced hardness values in all the plasma nitriding condition investigated. In the result of wear test, specific wear of nitrided specimens were much decreased than that of non-treated specimens. In the results of XRD, ${\gamma}'phase\;and\;{\varepsilon}$ phase were detected in nitrided surface. And it was found that ${\varepsilon}$ phase was decreased and ${\gamma}'phase$ was increased respectively, as the nitriding time became longer. In the test of corrosion resistance, natural potentials in all the nitrided specimens were towards noble directions than in the case of non-treated specimens. The measurement of electrode potentials revealed that corrosion resistivity of plasma nitrided specimens were higher than in the case of the non-treated specimens.

• The Journal of the Korea institute of electronic communication sciences
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• v.16 no.3
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• pp.451-456
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• 2021

In order to improve the cell capacitance and scale down in capacitors of semiconductor memory devices, a stacked ONO structure has been introduced as a dielectric layer and thinning of these layers has been attempted continuously. However, many problems have emerged in the manufacturing process. In this study, L/L LPCVD system was used to suppress the growth of natural oxide film of about 10 Å, which was able to secure the capacitance of 3fF / cell. In addition, we investigated the effect of thinning of the dielectric film on the abnormal oxidation of the nitride film, and proposed a stable process control method for forming the dielectric film to ensure oxidation resistance.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.10a
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• pp.589-590
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• 2012

• Proceedings of the Korean Ceranic Society Conference
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• 2000.04a
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• pp.99.2-99.2
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• 2000