• KEPCO Journal on Electric Power and Energy
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• v.5 no.4
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• pp.249-256
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• 2019

A full-scale test line was established to verify the electrical environmental interferences caused by the HVDC ±500 kV Double Bipole overhead transmission line with metallic return conductor, which is scheduled for construction in Korea and the fullscale test was conducted for one year. And through the human perception test of the DC electric-field under the HVDC Double Bipole line, the threshold value at which the human detects DC electric field was investigated to verify the validity of the design guide for the HVDC ±500 kV Double Bipole overhead transmission line. The polarity configuration of the HVDC ±500 kV Double Bipole test line was arranged diagonally with the same polarity in terms of the electrical environment disturbance and operation. The test line utilized the 6-bundle arrangement to prevent the corona discharge taking into account the domestic social acceptability. The test results show that the HVDC ±500 kV Double Bipole transmission line generated very little corona discharge from the conductors. Therefore, both DC electric field and ion current density met the domestic design guide for DC overhead transmission lines. Also, the human perception test of DC electric fields under the test line showed that 70% of participants did not recognize the DC electric field even when exposed to 23 kV/m.

• Journal of the Korean Vacuum Society
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• v.19 no.1
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• pp.45-51
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• 2010

We measured the temperature of target surface inducing by various physical phenomenon on magnetron sputtering target and confirmed the possibilities if the temperature distribution could affect plasma and deposited thin film. The target of magnetron sputtering has two types: round type and rectangular type. In a rectangular target, the concentrated discharge area by corner effect by magnetic field and non-uniform erosion of target are generated. And we found the generation of non-uniform temperature distribution on the target surface from this. This area was $10{\sim}20^{\circ}C$ higher than non-sputtering area. And if particles are generated during sputtering process, they were $20^{\circ}C$ higher than the area where is higher than non-sputtering area. These effects result in non-uniformity of thin films, crack of ceramic target, and shortening target life by non-uniform erosion.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.302.2-302.2
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• 2016

알루미늄 산화막 스퍼터링 공정 중 타겟이 반응성이 있는 산소와 결합하여 산화되는 타겟 오염은 증착 효율의 감소[1]와 방전기 내 아크 발생을 촉진[2]하여 이를 억제하는 방법이 연구되어 왔다. 본 연구에서는 알루미늄 산화막 증착 공정 중 타겟 오염 현상이 기판에 증착된 알루미늄 산화막 특성이 미치는 영향을 분석하였다. 실험에는 알루미늄 타겟이 설치된 6 인치 웨이퍼용 직류 마그네트론 스퍼터링 장치를 활용하였다. 위 장치에서 공정 변수 제어를 통해 타겟 오염 현상의 진행 속도를 제어하였다. 공정 중 타겟 오염 현상을 타겟 표면 알루미나 형성에 따른 전압 강하로 관찰하였고 타겟 오염에 의한 플라즈마 변화를 원자방출분광법을 통해 관찰하였다. 이 때 기판에 증착 된 알루미나 박막의 화학적 결합 특성을 XPS depth로 측정하였으며, 알루미나 박막의 두께를 TEM을 통해 측정하였다. 측정 결과 타겟 오염 발생에 의해 공정 중 인가 전압 감소와 타겟 오염에 소모된 산소 신호의 감소가 타겟 오염 정도에 따라 변동되었다. 또한 공정 중 타겟 오염 정도가 클수록 기판에 증착한 막과 실리콘 웨이퍼 사이에 산소와 실로콘 웨이퍼의 화합물인 산화규소 계면의 형성 증가됨을 확인했다. 위 현상은 타겟 오염 과정 중 발생하는 방전기 내 산소 분압 변화와 막 증착 속도 변화가 산소의 실리콘 웨이퍼로의 확산에 영향을 준 것으로 해석되었다. 위 결과를 통해 스퍼터링 공정 중 타겟 오염 현상이 기판에 증착 된 알루미나 막 및 계면에 미치는 영향을 확인하였다.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.22 no.1
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• pp.33-39
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• 2008

From a CCRF-excited zinc vapour laser with overlapped DC-discharge were emitted following 6 laser lines: two blue at 491.162[nm] and 492.403[nm], an orange at 589.433[nm] and three infrared lines at 747.879[nm], 758.848[nm] and 773.25[nm]. The discharge parameters were determined for an optimal laser operation. At a RF-power of 400[W] with the frequency 13.56[MHz] the optimal temperature of the oven lay between 780[K] and 800[K], the He-pressure between 3.5[kPa] and 5.5[kPa].

• The Transactions of the Korean Institute of Power Electronics
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• v.16 no.3
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• pp.227-233
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• 2011

This paper proposes a design and experiment of three phase interleaved dc-dc converter for 5kW battery charger. The charger consists of a three-phase interleaved dc-dc converter, which interfaces batteries and DC link, and a grid connected inverter. Lead-acid battery is modeled in a simple R-C model by matlab. Parameters of the battery are estimated based on step current discharging test. The battery is connected to three-phase interleaved DC-DC converter in order to reduce the ripple current to the battery and so, increase the lifetime of battery. Controller for charging and discharging mode is designed and tested in a 5kW charger prototype.

• Journal of the Institute of Electronics Engineers of Korea SC
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• v.45 no.5
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• pp.44-51
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• 2008

UV lamp systems have been used for cleaning of display panels of TFT LCD or Plasma Display Panel (PDP). However, the needs for high efficient cleaning and low cost made high voltage plasma cleaning techniques to be developed and to be improved. Dielectric-Barrier Discharges (DBDs), also referred to as barrier discharges or silent discharges have been exclusively related to ozone generation for a long time. In this paper, a 6kW high voltage plasma power supply system was developed for LCD cleaning. The 3-phase input voltage is rectified and then inverter system is used to make a high frequency pulse train, which is rectified after passing through a high-power transformer. Finally, hi-directional high voltage pulse switching circuits are used to generate the high voltage plasma. Some experimental results showed the usefulness of atmospheric plasma for LCD panel cleaning.

• Journal of the Korean Society of Safety
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• v.15 no.3
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• pp.66-70
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• 2000

In order to cope with environmental problems caused by harmful gases emitted from various industrial sources, a new technology which employs discharge plasma formed in ordinary atmospheric pressure has been intensively investigated in many industrialized nations. Although a plenty of useful outcomes and suggestions have been made public by scientists in this field, few commercial products which effectively decompose pollutant gases have appeared as yet. This is partly because that the energy efficiency of a most effective plasma reactor has not reached a satisfactory level in comparison with those of devices using conventional technologies. In an attempt to solve the problem mentioned above, we noticed to combine heterogeneous electrical discharges. This concepts is based on that each plasma reactor has its specific spatial region in which chemical reaction are active and by electrically affected with another reactor of different type, the activated region would increase - which may lead to cutting down the energy consumption. To prove this concept experimentally, two different discharge equipments, a plane ceramic-based surface discharge electrode and a corona electrode with tungsten needle may, are selected and combined to fabricate a hybrid plasma reactor. The results are summarized as follows; (1) Ozone concentration generated in the plasma region drastically increases when the positive corona discharge is added to the surface discharge. The rate of increase of ozone depends on the frequency of the surface discharge. The negative corona, however, does not contribute to the improvement of the ozone generation. (2) NO(nitrogen monoxide) decomposition rate also improves by simultaneously applying the surface and the positive corona discharges. The effect of the corona superposition is more evident when the level of the surface discharge is moderate. (3) By adjusting the corona level, the net energy efficiency during NO decomposition improves in comparison with the simple surface discharge reactor.

• Proceedings of the KIEE Conference
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• 1995.07c
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• pp.1413-1416
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• 1995

Plasma Display(PDP) was successfully demonstrated on 30-60inch display panel. Research for mass production is also been accelerating. The basic study of PDP are mainly focused on understanding of micro discharge in each cell In this paper, DC PDP with Ag electrode is made and the discharge charcateristics in micro gap is studied with the variation of the distance of electrode gap and the pressure in discharge cell.

• Journal of the Korean Institute of Telematics and Electronics T
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• v.36T no.1
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• pp.13-18
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• 1999

The trap density by the stress bias in silicon oxides with different thicknesses has been investigated. The trap density by stress bias was shown to be composed of on time current and off time current. The on time trap density was composed of dc current. The off time trap density was caused by the tunneling charging and discharging of the trap in the interfaces. The on time trap density was used to estimate to the limitations on oxide thicknesses. The off time trap density was used to estimate the data retention in nonvolatile memory devices.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.8 no.3
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• pp.411-418
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• 1998

The thickness dependence of stress electric filed oxide currents has been measured in oxides with thicknesses between 10 nm and 80 nm. The oxide currents were shown to be composed of stress current and transient current. The stress current was composed of stress induced leakage current and dc current. The stress current was caused by trap assisted tunneling through the oxide. The transient current was caused by the tunneling charging and discharging of the trap in the interfaces. The stress current was used to estimate to the limitations on oxide thicknesses. The transient current was used to the data retention in memory devices.