• Title/Summary/Keyword: 전자 탐침 미소 분석법

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THE EFFECT OF GLASS IONOMER ON THE REMINERALIZATION OF ADJACENT INITIAL ENAMEL CARIES LESION BY RELEASING FLUORIDE (Glass Ionomer 수복재의 초기 법랑질 우식증에 대한 효과)

  • Park, Young-Soo;Kim, Jong-Soo;Kwon, Soon-Won
    • Journal of the korean academy of Pediatric Dentistry
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    • v.29 no.4
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    • pp.529-538
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    • 2002
  • There is no adverse opinion on the anticariogenic effect of fluoride, so glass ionomer restoration which release the fluoride is recommended fer child patient. To study the anticariogenic effect of initial carious lesion of fluoride released from adjacent glass ionomer restoration, the in situ model was constructed. A microhardness test, polarized scope investigation and electron probe microanalysis was done for analyzing the distribution of fluoride which was precipitated from glass ionomer restoration to the enamel caries lesion. Fuji IX, the conventional glass ionomer, was used for experimental group and Z-100, composite resin that fluoride was not contained, was used for control group. On the microhardness test, the remineralization was accelerated by fluoride. And on the polarized investigation, the size of caries lesion was reduced in the oral cavity and that phenomenon was accelerated by fluoride, too. Electron probe microanalysis shows that the remineralization was accelerated by fluoride and the fluoride concentration on subsurface area was increased. It maybe that the subsurface area was critical to anticariogenic effect. In summary of these result, initial caries lesion can be remineralized in the oral cavity and that phenomenon can be accelerated by fluoride. The subsurface area of caries lesion was a major part of defense to cariogenic invasion and to conserve the subsurface area, the surface of lesion body have to conserved.

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Growth of $Al_xTa_{1-x}$ Alloy Thin Films by RE-Magnetron Sputter and Evaluation of Structural and Electrical Properties (E-Magnetron 스퍼터링에 의한 $Al_xTa_{1-x}$ 합금박막의 성장 및 구조적, 전기적 특성 분석)

  • 송대권;이종원;전종한
    • Journal of the Microelectronics and Packaging Society
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    • v.10 no.2
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    • pp.55-59
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    • 2003
  • In this study, $Al_xTa_{1-x}$(x=0.0∼1.0) alloy thin films were grown by RF-Magnetron sputtering system, and the structural, mechanical and electrical properties of samples were examined by 4-point probe, XRD, AFM and micro-Vickers hardness profiler. The electrical resistivity was maximum and the crystal quality was optimum for the samples with Al content x=0.245 (Al 24.5 at.%). Regarding the surface hillock formation, the hillock density decreased with an increase of Al content for the low Al content range, and the hillock was eliminated for the sample with Al=24.5 at.%. The hillock density increased with the further increase of Al content. The high values of micro-Vickers hardness were obtained for the samples with x=0.2∼0.45. The results obtained demonstrate that the crystal quality, electrical resistivity, surface morphology and micro-hardness are closely inter-related, and that the optimum physical properties are obtained for the sample with x=0.245.

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