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Numerical modeling of secondary flow behavior in a meandering channel with submerged vanes (잠긴수제가 설치된 만곡수로에서의 이차류 거동 수치모의)

  • Lee, Jung Seop;Park, Sang Deog;Choi, Cheol Hee;Paik, Joongcheol
    • Journal of Korea Water Resources Association
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    • v.52 no.10
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    • pp.743-752
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    • 2019
  • The flow in the meandering channel is characterized by the spiral motion of secondary currents that typically cause the erosion along the outer bank. Hydraulic structures, such as spur dike and groyne, are commonly installed on the channel bottom near the outer bank to mitigate the strength of secondary currents. This study is to investigate the effects of submerged vanes installed in a $90^{\circ}$ meandering channel on the development of secondary currents through three-dimensional numerical modeling using the hybrid RANS/LES method for turbulence and the volume of fluid method, based on OpenFOAM open source toolbox, for capturing the free surface at the Froude number of 0.43. We employ the second-order-accurate finite volume methods in the space and time for the numerical modeling and compare numerical results with experimental measurements for evaluating the numerical predictions. Numerical results show that the present simulations well reproduce the experimental measurements, in terms of the time-averaged streamwise velocity and secondary velocity vector fields in the bend with submerged vanes. The computed flow fields reveal that the streamwise velocity near the bed along the outer bank at the end section of bend dramatically decrease by one third of mean velocity after the installation of vanes, which support that submerged vanes mitigate the strength of primary secondary flow and are helpful for the channel stability along the outer bank. The flow between the top of vanes and the free surface accelerates and the maximum velocity of free surface flow near the flow impingement along the outer bank increases about 20% due to the installation of submerged vanes. Numerical solutions show the formations of the horseshoe vortices at the front of vanes and the lee wakes behind the vanes, which are responsible for strong local scour around vanes. Additional study on the shapes and arrangement of vanes is required for mitigate the local scour.

Effect of Ta/Cu Film Stack Structures on the Interfacial Adhesion Energy for Advanced Interconnects (미세 배선 적용을 위한 Ta/Cu 적층 구조에 따른 계면접착에너지 평가 및 분석)

  • Son, Kirak;Kim, Sungtae;Kim, Cheol;Kim, Gahui;Joo, Young-Chang;Park, Young-Bae
    • Journal of the Microelectronics and Packaging Society
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    • v.28 no.1
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    • pp.39-46
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    • 2021
  • The quantitative measurement of interfacial adhesion energy (Gc) of multilayer thin films for Cu interconnects was investigated using a double cantilever beam (DCB) and 4-point bending (4-PB) test. In the case of a sample with Ta diffusion barrier applied, all Gc values measured by the DCB and 4-PB tests were higher than 5 J/㎡, which is the minimum criterion for Cu/low-k integration without delamination. However, in the case of the Ta/Cu sample, measured Gc value of the DCB test was lower than 5 J/㎡. All Gc values measured by the 4-PB test were higher than those of the DCB test. Measured Gc values increase with increasing phase angle, that is, 4-PB test higher than DCB test due to increasing plastic energy dissipation and roughness-related shielding effects, which matches well interfacial fracture mechanics theory. As a result of the 4-PB test, Ta/Cu and Cu/Ta interfaces measured Gc values were higher than 5 J/㎡, suggesting that Ta is considered to be applicable as a diffusion barrier and a capping layer for Cu interconnects. The 4-PB test method is recommended for quantitative adhesion energy measurement of the Cu interconnect interface because the thermal stress due to the difference in coefficient of thermal expansion and the delamination due to chemical mechanical polishing have a large effect of the mixing mode including shear stress.