The Effect of the Processing Conditions on the Electrical Resistivity of Tantalum Nitride Thin Film Coated by the Reactive Sputtering (Sputtering법으로 제조된 TaNx 박막의 제조조건에 따른 전기저항 변화)
-
- Korean Journal of Materials Research
- /
- v.7 no.12
- /
- pp.1052-1057
- /
- 1997