• Journal of the Korean Crystal Growth and Crystal Technology
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• v.19 no.6
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• pp.288-292
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• 2009

Hydrophobic/hydrophilic patterned substrates were fabricated on a glass substrate by a liquid phase deposition (LPD) method. Hydrophobic surface was obtained by modifying ZnO thin films with a rough surface using a fluoroalkyltrimethoxysilane (FAS) and hydrophilic surface was prepared by decomposing FAS on an exposed to UV light. The hexagonal ZnO rods were perpendicularly grown by LPD method on glass substrates with a ZnO seed layer. The diameter and thickness of hexagonal ZnO rods were increased as a function of increases of immersion time. The surface morphology, thickness, crystal structure, transmittance and contact angle of prepared ZnO thin films were measured by field emission scanning electron microscopy (FE-SEM), X-ray diffraction (XRD), UV-visible spectrophotometer (UV-vis) and contact angle measurement. Hydrophilic ZnO thin films with a contact angle of $20^{\circ}{\sim}30^{\circ}$ were changed to a hydrophobic surface with a contact angle of $145^{\circ}{\sim}161^{\circ}$ by a FAS surface treatment. Prepared hydrophobic surface was pattered by an irradiation of UV light using shadow mask with $300\;{\mu}m$ or 3 mm dot size. Finally, the hydrophobic surface exposed to UV light was changed to a hydrophilic surface.

• Korean Journal of Food Science and Technology
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• v.52 no.2
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• pp.177-182
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• 2020

This study evaluated the effect of steam heating, gamma irradiation, and ultraviolet (UV) irradiation on microorganism reduction in order to determine an effective sterilization method for red pepper powder. The effect of each treatment on the reduction of thermoduric bacteria and total aerobic bacteria in red pepper powder were as follows: 10 kGy gamma irradiation, reduction of 4 log and 6 log CFU/g, respectively; 12 mW/㎠ UV irradiation (264 nm UV-C), reduction of less than 1 log CFU/g; steam heating at 120℃ for 40 s, reduction of approximately 2 log CFU/g. High-temperature short-time processing at 110℃ for 30 s reduced the total bacterial count in Gochujang solution from 5.70 log CFU/g to 2.26 log CFU/g; at 121℃, the solution was commercially sterile. Steam heating resulted in 1, 2, and 4 log microbial inactivation in garlic, onion, and pepper powder, respectively. Steam sterilization, which consumers prefer over other methods, may be an effective method for reducing microorganisms in spice powders, including those in red pepper powder.

• Analytical Science and Technology
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• v.20 no.1
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• pp.25-32
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• 2007

The measurement methods for total nitrogen in wastewater containing a high concentration of nitrogen were evaluated. (1) The UV spectrophotometry, (2) reduction-distillation Kjeldahl, (3) total Kjeldahl nitrogen, and (4) ion chromatography methods were applied. The experimental procedure of the UV spectrophotometric method was simple, but it produced large errors deriving from the dilution of samples and calibration standards. While, the reduction-distillation Kjeldahl method didn't need dilution, but the amount of Devarda's alloy and NaOH lead to large errors up to 50 mg/L. The levels of total nitrogen measured by each method were as follows: reduction-distillation Kjeldahl ($568.6{\pm}38.7mg/L$) > UV spectrophotometry ($527.3{\pm}9.6mg/L$) > total Kjeldahl nitrogen method ($494.7{\pm}21.4mg/L$) > ion chromatography method ($417.9{\pm}7.3mg/L$). Therefore, the reduction-distillation Kjeldahl method is preferred for wastewater with the high concentration of nitrogen. Optimal conditions for each experimental procedure, however, are needed to be confirmed, and the Standard Operation Procedure (SOP) for total nitrogen is required for reliable measurements.

• Journal of Nutrition and Health
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• v.52 no.5
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• pp.413-421
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• 2019

Purpose: Astragalus membranaceus (AM) is an important traditional medicinal herb. Pharmacological research has indicated that AM has various physiological activities such as antioxidant, anti-inflammatory, immunoregulatory, anticancer, hypolipidemic, antihyperglycemic, and hepatoprotective activities. The bioactive substances responsible for the physiological activities in AM, including many antioxidant substances, change during the roasting process. This study investigated and compared the changes in the antioxidant constituents of AM caused by roasting. Methods: DPPH (1,1-diphenyl-2-picryl hydrazyl) and $ABTS^+$ (2,2'-azino-bis (3-ethylbenzothiazoline-6-sulfonic acid) diammonium salt) radical scavenging activities and their total phenolic content (TPC) were measured. High-performance liquid chromatography (HPLC) analysis was performed to confirm any changes in the isoflavonoids of roasted AM (R-AM),. The cell viability of UVB-induced HDF (Human dermal fibroblast) cells treated with AM and R-AM extracts was investigated. The comet assay was used to examine the inhibitory effects of R-AM extracts on DNA damage caused by oxidative stress. Results: The DPPH and $ABTS^+$ radical scavenging activities were $564.6{\pm}20.9$ and $108.2{\pm}3.1$ ($IC_{50}$ value) respectively, from the 2R-AM. The total phenol content was $47.80{\pm}1.40mg$ GAE/g from the 1R-AM. The values of calycosin and formononetin, which are the known isoflavonoid constituents of AM, were $778.58{\pm}2.72$ and $726.80{\pm}3.45{\mu}g/g$ respectively, from the 2R-AM. Treatment of the HDF cells with R-AM ($50{\sim}200{\mu}g/mL$) did not affect the cell viability. Furthermore, the R-AM extracts effectively protected against UVB-induced DNA damage. Conclusion: The findings of this study indicate that R-AM increases its isoflavonoid constituents and protects against UVB-induced DNA damage in HDF cells.

• Korean Journal of Optics and Photonics
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• v.24 no.4
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• pp.184-188
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• 2013

Two types of polymer-based optical splitters with $200{\mu}m$ large core are presented for optical multimode networks, such as smart home networks, intelligent automotive networks, etc. Optical splitters that have 1:1 symmetric and 9:1 asymmetric structure were fabricated by a ultra violet(UV)-imprint technology using a deep etched Si(silicon) master by the Bosch process. In this paper, we successfully fabricated the symmetric and asymmetric optical splitters with suitable optical network applications.

• KSBB Journal
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• v.23 no.1
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• pp.83-89
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• 2008

Food wastewater derived from the three-stage methane fermentation system developed in this lab contained high concentration organic substances. The organic wastewater should be treated through advanced wastewater treatment system to satisfy the "Permissible Pollutant Discharge Standard of Korea". In order to treat the organic wastewater efficiently, several optimum operation conditions of a modified $UV/TiO_{2}$ photocatalytic system have been investigated. In the first process, wastewater was pre-treated with $FeCl_{3}$. The optimum pH and coagulant concentration were 4.0 and 2000mg/L, respectively. Through this process, 52.6% of CODcr was removed. The second process was $UV-TiO_{2}$ photocatalytic reaction. The optimum operation conditions for the system were as follows: UV lamp wavelength, 254 nm; wastewater temperature, $40^{\circ}C$; pH 8.0; and air flow rate, 40L/min, respectively. Through the above two combined processes, 69.7% of T-N and 70.9% of CODcr contained in the wastewater were removed.

• Korean Chemical Engineering Research
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• v.43 no.1
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• pp.80-84
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• 2005

Nano-sized $Y_2O_3:Eu$ phosphor particles were prepared by ultrasonic spray pyrolysis. The effect of polymeric precursor and lithium carbonate flux on the morphology and luminescence characteristics of nano-sized $Y_2O_3:Eu$ phosphor particles was investigated. When using the spray solution containing both the polymeric precursor and the flux, the $Y_2O_3:Eu$ particles with spherical shape and micron size were turned into nano-sized $Y_2O_3:Eu$ phosphor particles during the post-treatment at high temperature. The mean size of $Y_2O_3:Eu$ phosphor particles was affected by the contents of polymeric precursors and lithium carbonate flux, and preparation temperature. The as-prepared particles by spray pyrolysis at high temperature from solution containing high contents of polymeric precursors had good photoluminescence intensity under vacuum ultraviolet after post-treatment above $1,000^{\circ}C$. The prepared nano-sized $Y_2O_3:Eu$ phosphor particles had comparable photoluminescence intensity under vacuum ultraviolet light with that of the commercial $Y_2O_3:Eu$ phosphor particles prepared by solid state reaction method.

• Journal of the Korean GEO-environmental Society
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• v.23 no.10
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• pp.5-12
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• 2022

In this study, we investigated the UV/H₂O₂ process to treat organic compound-spilled water. In consideration of usage and properties, benzene, toluene, phenol, and methyl ethyl ketone were selected as representative organic compounds. The selected material was first removed by natural volatilization and aeration that simulated the pretreatment of the prcoess. After that, UV/H₂O₂ oxidation experiments were conducted under various H₂O₂ concentration conditions. Benzene and toluene were mostly volatilized before reaching the oxidation process due to high volatility. Considering the volatility, oxidation experiments were performed at an initial concentration of 5 mg/L for benzene and toluene. The UV/H₂O₂ oxidation process achieved 100% of benzene and toluene removal after 20 minutes under all hydrogen peroxide concentration conditions. The phenol was rarely removed from the volatile experiments and oxidation tests were performed at an initial concentration of 50 mg/L. The process showed 100 % phenol removal after 30 minutes under 0.12 v/v% of hydrogen peroxide concentration condition. Methyl ethyl ketone was removed 58 % after 2 hours of volatile experiments. The process showed 99.7% Methyl ethyl ketone removal after 40 minutes under 0.08 v/v% of hydrogen peroxide concentration condition. It was confirmed that the UV/H₂O₂ process showed high decomposition efficiency for the four selected organic compounds, and identified the amount of hydrogen peroxide in classified organic contaminants.

• Journal of the Microelectronics and Packaging Society
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• v.30 no.2
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• pp.65-70
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• 2023

Nanoimprint lithography (NIL) has attracted much attention due to its process simplicity, excellent patternability, process scalability, high productivity, and low processing cost for pattern formation. However, the pattern size that can be implemented on metal materials through conventional NIL technologies is generally limited to the micro level. Here, we introduce a novel hard imprint lithography method, extreme-pressure imprint lithography (EPIL), for the direct nano-to-microscale pattern formation on the surfaces of metal substrates with various thicknesses. The EPIL process allows reliable nanoscopic patterning on diverse surfaces, such as polymers, metals, and ceramics, without the use of ultraviolet (UV) light, laser, imprint resist, or electrical pulse. Micro/nano molds fabricated by laser micromachining and conventional photolithography are utilized for the nanopatterning of Al substrates through precise plastic deformation by applying high load or pressure at room temperature. We demonstrate micro/nanoscale pattern formation on the Al substrates with various thicknesses from 20 ㎛ to 100 mm. Moreover, we also show how to obtain controllable pattern structures on the surface of metallic materials via the versatile EPIL technique. We expect that this imprint lithography-based new approach will be applied to other emerging nanofabrication methods for various device applications with complex geometries on the surface of metallic materials.

• Applied Chemistry for Engineering
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• v.21 no.6
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• pp.694-696
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• 2010

We have synthesized boron (or phosphorous) doped silicon nanoparticles (Si-NPs) by a solution process. The surfaces of the Si-NPs were terminated with various alkyl groups to form a protecting layer. The Si-NPs were characterized by UV-Vis, PL, FTIR, and NMR. Through a microwave sintering process, the crystalline thin films of the Si-NPs were prepared by removing the surface alkyl groups. The TEM and SEM images reveal that contiguous films as large as $200{\mu}m$ in diameter were formed with a cubic structure. The electrical conductivity of the Si film was controlled by a doping type.