• Transactions of the Korean Society of Mechanical Engineers
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• v.14 no.3
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• pp.747-754
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• 1990

Since Ion sputter machining can perform removing processing in atom or molecule units in vacuum state, it has the merit that high precision processing is possible. In this study, therefore, the effect of incidence ion beam is certified to processing amount and surface roughness when longtimed processing is applied. As a result, processing amount is made almost constant with time and the best processing condition is achieved when the incidencial angle of ion is 55.deg.. In addition, processing time for the good surface roughness is different respectively to the quality of material and longtimed processing has some defect for achieving good surface roughness.

• Transactions of the Korean Society of Mechanical Engineers
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• v.14 no.6
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• pp.1495-1508
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• 1990

There are requirement of surface roughness in mechanical elements that has minute surface of several nm degree. When high precision surface roughness measurement is made with stylus type surface roughness measuring apparatus, measuring accuracy depend on the tip radius of diamond stylus. Therefore, ultra precision machining was accomplished using ion sputter machining in order to machining the stylus tip radius less than 0.5.mu.m, which is impossible through lapping machining. In this study, optimal machining condition for the ion sputter machining was obtained through the experiment under the various varing machinbing quantity and condition of diamond stylus. And as the result of applying this optimal condition, the good result was obtained that machining probability of stylus tip radius less than o.5.mu.m is 93%.

• Journal of the Korean Society for Precision Engineering
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• v.7 no.3
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• pp.37-47
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• 1990

In accordance with the high precision of mechanical elements, it has been required to high precision in surface roughness measurement and, therefore, stylus tip radius is manufa- ctured less than 2 .mu. m through ion sputter machining. In this experiment, by suing ion sputter machined stylus pf fine tip, radius and lapping machined stylus, surface roughness of standard specimens, silicon wafer were measured and then Rmax, Ra, RMS value were investi- gatedaccording to the variation of tip radius of stylus. As a result, measuring error due to the variation of stylus tip radius in surface roughness measurement was decreased by using ion sputter machined stylus and also the measuring accuracy was improved. And the measuring variation of Ra, RMS calculated from correlation coefficient lager than 0.9 on the wave of short period and amplitude using ion sputter machined stylus of fine tip radius.