• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2004.05a
• /
• pp.136-136
• /
• 2004

허근 차세대 반도체, 정보통신, 및 디스플레이 산업 등에 응용하기 위하여 초정밀화와 저비용 대량생산을 하기 위해서 기존의 공정을 대체할 수 있는 새로운 나노 공정기술의 요구가 급증하고 있다. 최근 연구에서는 펨토초 레이저 (femto second laser)의 이광자흡수 고화현상을 이용한 나노공정 개발에 대하여 다양한 연구가 진행되고 있다. 특히, 기존의 패터닝과 에칭공정 중심의 소형화 기술(miniature technology)로 제작이 어려운 3차원 자유곡면을 가지는 구조물 제작에 관한 공정개발에 대하여 다양한 연구가 진행되고 있다.(중략)

• Polymer(Korea)
• /
• v.29 no.2
• /
• pp.146-150
• /
• 2005

A nano-stereolithouaphy (NSL) apparatus has been developed for fabrication of microstructures with the resolution of 150 nanometers. In the NSL process, a complicated 3D structure can be fabricated by building layer by layer, so it does not require any sacrificial layer or any supporting structure. A laminated layer was fabricated by means of solidifying liquid-state monomers using two-photon absorption (TPA) which was induced by a femtosecond laser. When the fabrication of a 3D laminated structure was finished, unsolidified liquid-stage resins were removed to develop the fabricated structure by dropping several droplets of solvent, then the polymerized structure was only left on the glass substrate. A microstructure is fabricated by vector scanning method to save the fabrication time. The shell thickness of a structure is very thin within 200 nm, when it is fabricated by a single contour scanning (SCS) path. So, a fabricated structure can be deformed easily in the developing process. In this work, a double contour scanning (DCS) method was proposed to reinforce the strength of a shell typed structure, and a microcup was fabricated to show the usefulness of the developed NSL system and the DCS method.

• Journal of the Korean Society for Precision Engineering
• /
• v.24 no.1 s.190
• /
• pp.64-70
• /
• 2007

A long-exposing technique (LET) has been conducted to create nanoscale patterns applicable to diverse micro-devices using two-photon polymerization (TPP). By the weakly-polymerized region via the LET, double-layered embossing patterns can be fabricated simply in a single step. The LET makes possible a voxel and its surrounding to be fully grown into more than 500 nm in lateral size and weakly-polymerized region (WPR), respectively. In the WPR. interconnecting ribs between voxels are generated, and they lead to the creation of double-layered dot patterns. Moreover, by controlling the distance between voxels, various shapes of interconnecting rib can be fabricated when the LET is applied. Various embossing patterns were fabricated to evaluate the usefulness of the proposed technique as a novel nanopatterning technique in TPP.

• Journal of the Korean Society for Precision Engineering
• /
• v.22 no.1
• /
• pp.175-182
• /
• 2005

A laser beam expanding technique is employed to fabricate precise nano-patterns in a nano-replication printing (nRP) process. In the nRP process, some patterns can be fabricated in the range of several microns inside on a polymerizable resin by using a volume-pixel (voxel) matrix that is transformed from a two-tone bitmap figure file. The liquid monomers are polymerized by means of a two-photon-absorption (TPA) phenomenon that is induced by a femtosecond (fs)-pulse laser. The yokels are generated consecutively to merge into adjoining yokels in the process of fabricating a pattern. The resolution of a fabricated pattern can be obtained under the diffraction limit of a laser beam by the two-photon absorbed polymerization (TPP). In this work, a beam-expanding technique has been applied to enlarge a working area and to fabricate precise patterns. Through this work, a working area is expanded by the technique as much as 2.5 times compared with a case of without a beam expanding technique, and precision of outside patterns is improved.