• Title/Summary/Keyword: 육방정계구조

Search Result 53, Processing Time 0.026 seconds

Characteristics of Se/CdS Heterojunction Fabricated by EBE Method (EBE법으로 제작한 Se/CdS 이종접합의 특성)

  • Park, Gye-Choon;Cho, Jae-Cheol;Yoo, Yong-Tek
    • Journal of Sensor Science and Technology
    • /
    • v.2 no.1
    • /
    • pp.87-94
    • /
    • 1993
  • CdS and Se thin films were deposited on slide glass by EBE method respectively and surface morphology, crystal structure, electrical and optical properties were investigated by substrate temperature and annealing. The deposited CdS film was well fabricated with cubic structure at substrate temperature of $150^{\circ}C$. Se film was deposited with noncrystal structure until substrate temperature of $100^{\circ}C$, but Se film was grown with monoclinic structure at substrate temperature of $150^{\circ}C$. And so, after annealing at $150^{\circ}C$ for 15min, noncrystalline Se was proved to be hexagonal structure. Finally, the maximum output of Se/CdS heterojunction at 5000 lux was 4 $mW/cm^{2}$ and maximum spectral sensitivity was represented at 585nm.

  • PDF

Structural and Optical Characteristics of ZnS:Mn Thin Film Prepared by EBE Method (전자빔 증착법으로 제작된 ZnS:Mn 박막의 구조 및 광학적 특성)

  • 정해덕;박계춘;이기식
    • Electrical & Electronic Materials
    • /
    • v.10 no.10
    • /
    • pp.1005-1010
    • /
    • 1997
  • ZnS:Mn thin film was made by coevaporation with Electron Beam Evaparation(EBE) method. And structural and optical characteristics of ZnS:Mn thin films were investigated by substrate temperature annealing temperature and dopant Mn. When ZnS:Mn thin film was well deposited with cubic crystalline at substrate temperature of 30$0^{\circ}C$ its surface index was [111] and its lattice constant of a was 5.41$\AA$. Also When ZnA:Mn thin film was well made with hexagonal crystalline at substrate temperature of 30$0^{\circ}C$annealing temperature of 50$0^{\circ}C$and annealing time of 60min its miller indices were (0002) (1011), (1012) and (1120). And its lattice constant of a and c was 3.88$\AA$and 12.41$\AA$ respectively. Finally hexagonal ZnS:Mn thin film with dopant Mn of 0.5wt% had fundamental absorption wavelength of 342nm. And so its energy bandgap was about 3.62eV.

  • PDF

Berthierine and Nontronite from Sangdong Tungsten Deposits (상동중석광산에서 산출되는 Berthierine과 Nontronite)

  • Kim, Soo Jin;Kim, Won-Sa;Chang, Se-Won
    • Journal of the Mineralogical Society of Korea
    • /
    • v.1 no.2
    • /
    • pp.104-116
    • /
    • 1988
  • Berthierine and Nontronite are firstly identified in the Sangdong tungsten ore deposits. Quantitative and qualitative analyses by EPMA and the studies using X-ray diffraction, transmission electron microscopy, and infrared absorption spectroscopy were done to characterize berthierine and nontronite. The data from berthierine are in good agreement with those from other localities. The structural data of the Sangdong berthierine are consistent with the orthorhombic, pseudo-hexagonal form which is more common in samples with high $SiO_2$ and low $Al_2O_3$ content. Geologic features suggest that the Sangdong berthierine is diagenetic in origin. However, nontronite might be a product of hydrothermal alteration after the tungsten mineralization.

  • PDF

Electrical Properties of YMnO3 Thin Film by Sol-gel Process (졸-겔 공정에 의한 YMnO3 박막의 전기적 특성)

  • Kim, Eung-Soo;Kim, Beng-Gu;Kim, Yoo-Taek
    • Journal of the Korean Ceramic Society
    • /
    • v.39 no.5
    • /
    • pp.511-516
    • /
    • 2002
  • Hexagonal $YMnO_3$ thin films were prepared from $Y(NO_3)_3{\cdot}5H_2O$ and $Mn(CH_3CO_2)_2{\cdot}4H_2O$ as starting materials on the Si(100) substrates by the sol-gel method. The crystal structure and the electrical properties of the $YMnO_3$ thin films were investigated as a function of heat treatment temperature, the amount of water(Rw) of hydrolysis and the addition of catalysis. The crystallization of the $YMnO_3$ thin film began at 700${\circ}C$ and completed at 800${\circ}C$ for 1 h. The c-axis (0001) preferred orientation of hexagonal $YMnO_3$ was detected for the $YMnO_3$ thin films with Rw=6 and that was decreased for the $YMnO_3$ thin films with Rw=1 and Rw=12. The crystallinity and preferred orientation of the $YMnO_3$ thin films were depended on the addition of acid and/or alkali catalysis, which, in turn, the preferred orientation of c-axis was decreased and the orthorhombic phase of $YMnO_3$ was detected to the specimens with the addition of catalysis. The $YMnO_3$ thin film with Rw=6 showed good leakage current density of $1.2{\times}10-8 A/cm^2$ at the applied voltage of 0.2V and the leakage current density was not changed drastically with applied voltage.

Fabrication and characteristics of ZnO nanorods grown on Zn substrates by the hydrothermal method (수열합성법에 의해 Zn 기판 위에 제조된 ZnO 나노로드의 특성)

  • Sung, Ji-Hye;Kim, Jin-Ho;Hwang, Jong-Hee;Lim, Tae-Young;Yeon, Deuk-Ho;Cho, Yong-Soo
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.21 no.4
    • /
    • pp.147-152
    • /
    • 2011
  • ZnO nanorods fabricated on a Zn substrate pre-coated with ZnO as a seed layer by the hydrothermal method were studied mainly as a function of ZnO precursor concentration. Characteristic features by using field-emission scanning electron microscopy (FE-SEM) and X-ray diffraction (XRD) were investigated to define the changed micro-structure and crystalline phase of the ZnO nanorods according to the experimental conditions. The nanorod morphology strongly depended on the precursor concentration. For example, ZnO nanorods vertically aligned with a hexagonal (002) oriented structure with a diameter of 600~700 nm and length of $6.75{\mu}m$ were clearly observed at the highest concentration of 0.015 M. The strong hexagonal structure was believed to be associated with the highest photoluminescene (PL) intensity and a promising voltage value of ca. 6.069 V at $1000{\mu}A$.

Electrical Properties of ReMnO3(Re:Y, Ho, Er) Thin Film Prepared by MOCVD Method (화학 기상 증착법으로 제조한 ReMnO3(Re:Y, Ho, Er) 박막의 전기적 특성)

  • Kim, Eung-Soo;Chae, Jung-Hoon;Kang, Seung-Gu
    • Journal of the Korean Ceramic Society
    • /
    • v.39 no.12
    • /
    • pp.1128-1132
    • /
    • 2002
  • $ReMnO_3$(Re:Y, Ho, Er) thin films were prepared by MOCVD method available to non-volatile memory device with MFS-FET structure. $ReMnO_3$ thin films were deposited on the Si(100) substrate at 700${\circ}C$ for 2h. When the films were post-annealed at 900${\circ}C$ for 1h in air, the single phase of hexagonal $ReMnO_3$ thin films were detected. Ferroelectric properties of $ReMnO_3$ thin films were dependent on the degree of c-axis orientation in the single phase of hexagonal structure and remnant polarization (Pr) of $YMnO_3$ thin films with high degree of c-axis orientation was 105 nC/$cm^2$. Leakage current density was dependent on the grain size of microstructure and that of $YMnO_3$ thin films with grain size of 100∼150 nm was $10^{-8}$ A/$cm^2$ at applied voltage of 0.5 V.

EF-TEM을 이용한 직접가열 실험을 통한 Titanium의 고온에서의 상변화 연구

  • 김진규;이영부;김윤중
    • Proceedings of the Korea Crystallographic Association Conference
    • /
    • 2002.11a
    • /
    • pp.22-23
    • /
    • 2002
  • Titanium은 높은 강도, 낮은 밀도, 부식에 대한 저항 등, 타 금속에 비해 월등히 뛰어난 성질을 가지고 있기 때문에 산업 전반에 거쳐 그 응용이 크게 증가하고 있으며, 특히 고온에서의 응용이 중요성을 띠게 됨에 따라 고온으로의 상전이 관계에 따른 구조적 규명이 필요하다. 순수한 titanium은 상온에서 조밀충진 육방정계의 α-상구조(a=2.953Å, c=4.683 Å, P6₃/mmc)를 이루고 있으나, 대략 880℃ 이상에서는 β-상의 체심입방정계 (a=3.320Å, Im3m)로 상전이가 되는 것으로 알려져 있다. 이에 대한 대부분의 연구가 kinetics와 thermodynamics에 관련되어 있으며, TEM을 이용한 직접가열실험은 거의 전무한 상태이다. 본 실험에서는 TEM 직접가열을 통하여 titanium의 고온에서의 상전이와 가열시 발생할 수 있는 산화층 형성을 연구하였다. TEM 시편은 순도 99.94%의 titanium foil(Alfa Aesar, #00360, 0.025mm thick)를 이용하였고, 분석 장비로는 에너지여과 기능이 있는 TEM(EM912 Omega, Carl Zeiss)과 Gatan사의 double-tilt heating holder를 사용하였다. Titanium의 상전이를 관찰하기 위해 900℃ 까지 분당 10℃ 의 속도로 가열을 하였다. 통계적 분석 오차를 줄이기 위해 서로 다른 4군데의 관찰영역을 선택하여, 상온 - 600℃ - 900℃ - 상온의 단계별로 회절패턴을 관찰 및 기록하였고, 발생 가능한 산화에 대해서는 동일한 장비를 사용하여 EDS 분석을 하였다. 상온에서의 서로 다른 영역의 회절패턴들은 결함의 존재에 상관없이, 온도가 증가함에 따라 그 결함수가 증가하게 된다. 특히 600℃ 에서는 쌍정과 관련된 회절점들이 본래의 회절점 주위에 형성되어있지만, 각 면들의 격자상수의 변화는 나타나지 않았다. 그러나 900℃ 에서는 쌍정에 의한 회절점의 수가 증가하며, 회절점 사이에 발달한 뚜렷한 막대모양의 강도분포와 격자상수의 변화를 관찰할 수 있었다. 다시 상온으로 냉각시킨 후 관찰한 각각의 회절패턴에서는 격자 상수의 감소와 함께 900℃에 보여진 막대 모양의 강도분포와 쌍정에 의한 회절점들이 여전히 남아있었다. EDS분석 결과 가열 실험을 통해 시편이 열적 산화가 되어 있음을 확인 할 수 있었다. 순수한 titanium의 α-상에서 β-상으로의 상전이를 파악할 수 있는 격자상수의 변화자체는 매우 작은 값이기 때문에 상온과 900℃ 에서 기록된 전자회절패턴 상에서의 면간거리와 면간각도의 측정만으로는 상전이 여부를 명확히 구별할 수 없었다. 그러나, 결함에 의한 상변화가 900℃ 에서 심하게 관찰되어지는 것은 상전이와 관계가 있는 것으로 볼 수 있다. 고온에서 상온으로의 가역적 반응을 관찰할 수 없었던 이유는 열적산화로 생긴 산화층의 산소원자들이 고온의 상전이 과정 중에 Ti 원자와 반응이 일어나 TiO/sub X/ 구조로 전이되었기 때문으로 추정하고 있다.

  • PDF

Esthetic anterior restoration using 3M LavaTM Esthetic monolithic zirconia (3M LavaTM Esthetic monolithic zirconia를 이용한 전치부 심미 수복 증례)

  • Kim, Hyung Joon;Shin, Soo-Yeon
    • Journal of Dental Rehabilitation and Applied Science
    • /
    • v.34 no.4
    • /
    • pp.306-316
    • /
    • 2018
  • Monolithic zirconia has been widely used in fixed partial dentures due to high strength and fracture toughness. Nevertheless, the usage of monolithic zirconia in anterior restoration was limited because of opacity. Recently, esthetic monolithic zirconia blocks are developed by improving translucency and using various shading systems. Manufacturer introduces 3M $Lava^{TM}$ Esthetic with increased cubic phase and fluorescent ingredients is more esthetic than previous monolithic zirconia. This case report describes favorable anterior restorations using translucent monolithic zirconia.

Dependence of the Electrical and Optical Properties of CdS Thin Films on Substrate and Annealing Temperatures (기판온도 및 열처리온도에 대한 CdS 박막의 전기적 및 광학적 특성)

  • Park, Ki-Cheol;Shim, Ho-Seob;Kim, Jeong-Gyoo
    • Journal of Sensor Science and Technology
    • /
    • v.6 no.2
    • /
    • pp.163-171
    • /
    • 1997
  • CdS thin films for window material of solar cell were prepared by close spaced vapor transport deposition system and annealed at different temperatures. The structural, electrical, and optical properties of as-deposited and annealed CdS films were investigated as functions of substrate and annealing temperatures. The CdS thin films were grown perpendicularly to the substrate along the (002)plane with hexagonal structure regardless of the preparation conditions The resistivity of the CdS film deposited was increased gradually from $60{\Omega}cm$ for $25^{\circ}C$ to $2{\times}10^{4}{\Omega}cm$ for $300^{\circ}C$. The optical transmittance at the substrate temperature of $25^{\circ}C$ was about 80% in the the visible spectrum. The resistivity increased monotonically, and the optical transmittance was decreased substantially with annealing temperature due to the increased defect density in the CdS film.

  • PDF

A study on the growth morphology of AlN crystals grown by a sublimation process (승화법으로 성장된 AlN 결정의 성장 양상에 관한 연구)

  • Kang, Seung-Min
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.19 no.5
    • /
    • pp.242-245
    • /
    • 2009
  • AlN crystals were grown by a sublimation process without seed crystals and the growth morphology of them was characterized. The grown AlN crystals were a polycrystalline phase, which had a diameter of $60\sim200\;{\mu}m$ and were grown with a growth rate of $0.2\sim0.5\;{\mu}n/hr$. It was observed that the as-grown crystals had a hexagonal crystal structure and revealed that these crystals were grown with a morphology of columnar morphology in the initial stage of the growth before they were enlarged in a way of a lateral growth behavior in the final stage. On the surface, a lot of pinholes were observed on the surface of crystals grown. The evolution of a growth morphology was characterized by optical and scanning electron microscopic observation.