• Title/Summary/Keyword: 유전체 박막

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Study on the Variation of Dielectronic Constant for an Organic Insulator Film (유기물 절연 박막에 대한 유전상수의 변화에 대한 연구)

  • Oh, Teresa
    • Journal of the Korean Vacuum Society
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    • v.17 no.4
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    • pp.341-345
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    • 2008
  • The SiOC film of carbon centered system was prepared using bistrimethylsilylmethane and oxygen mixed precursor by the chemical vapor deposition. The chemical properties of the SiOC film were analyzed by the contact anlge and FTIR spectra. The dielectric constant of the deposited films decreased after annealing process, and the correlation between the increasing the BTMSM/$O_2$ flow rate ratio and the dielectric constant did not exist. However, the trend of increasing or decreasing of the dielectric constant repeated and there is the correlation ship between the dielectric constant and the Si-O-C bond in the range of $950{\sim}1200\;cm^{-1}$. The dielectric constant decreased between samples with the chemical shift. The lowest dielectric constant was 1.65 at the sample, which was observed the chemical shift.

A Study on the Preparation and Characterization of $Zn_xSr_{1-x}S$ Thin Films ($Zn_xSr_{1-x}S$ 박막의 제작과 특성에 관한 연구)

  • 이상태
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.5 no.6
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    • pp.1136-1142
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    • 2001
  • $Zn_xSr_{1-x}S$ thin films were prepared in the whole composition range by rf sputtering, using powder targets of a mixture of ZnS and SrS with the required mole fraction. The possibility of existence of $Zn_xSr_{1-x}S$ solid solutions was systematically investigated from the results of thin film growth, in terms of structural, optical characteristics and the chemical bonding of the constituent atoms. The XRD, XPS and optical results made it clear that the solid solutions with a single-phased zincblende structure and a single-phased rocksalt structure were formed at $0.86~0.93{\leq}x{\leq}1\;and\;0{\leq}x{\leq}0.29$, respectively. The miscibility gap, including phase separation regions was found to exist in $0.3{\leq}x{\leq}0.86~0.91$, in which lattice constants, binding energy and absorption edges kept almost constant by the same values as those at border compositions. The experimental results on phase transition agreed well with the fraction of ionic character fi based on the Phillips' dielectric theory.

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A study on the preparation and characterization of $Zn_xSr_{1-x}S$ thin films ($Zn_xSr_{1-x}S$ 박막의 제작과 특성에 관한 연구)

  • 이상태
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2001.10a
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    • pp.660-664
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    • 2001
  • $Zn_xSr_{1-x}S$ thin films were prepared in the whole composition range by rf sputtering, using powder targets of a mixture of ZnS and SrS with the required mole fraction. The possibility of existence of $Zn_xSr_{1-x}S$ solid solutions was systematically investigated from the results of thin film growth, in terns of structural, optical characteristics and the chemical bonding of the constituent atoms. The XRD, XPS and optical results made it clear that the solid solutions with a single-phased zincblende structure and a single-phased rocksalt structure were formed at $0.86~0.93{\leq}x{\leq}1$ and $0{\leq}x{\leq}0.29$, respectively. The miscibility gap, including phase separation regions was found to exist in $0.3{\leq}x{\leq}0.86~0.91$, in which lattice constants, binding energy and absorption edges kept almost constant by the same values as those at border compositions. The experimental results on phase transition agreed well with the fraction of ionic character $f_{i}$ based on the Phillips'dielectric theory.

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A Study on SAW Properties of Bilayer Thin Film Structure Composed of ZnO and Dielectric Thin Films (ZnO 박막과 유전체 박막으로 구성된 이중구조의 물성 및 표면 탄성파 특성)

  • 이용의;김형준
    • Korean Journal of Crystallography
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    • v.6 no.2
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    • pp.134-140
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    • 1995
  • SAW properties of SiNx/ZnO bilayer thin film structure were analyzed. ZnO thin films were deposited by rf magnetron sputter using O2 gas as an oxidizer. Structure of ZnO thin films was affected by Ar/O2 ratio. At the gas ratio of Ar/O2=67/33, the standard deviation of X-ray rocking curve of (002) preferred ZnO thin film was 2.17 degree. This value is sufficient to use ZnO thin films as an acoustic element. SAW velocity of glass/SiNx(7000Å)/Al/ZnO(5μm) structure was max. 2.2% faster than that of ZnO/glass.

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MgO pellet 크기에 따른 AC-PDP의 방전특성 연구

  • Wi, Seong-Seok;Kim, Dong-Hyeon;Lee, Hae-Jun;Park, Jeong-Hu;Lee, Ho-Jun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.408-408
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    • 2010
  • 현재 AC-PDP에서는 이온 sputtering 으로부터 유전층을 보호하기 위하여 유전체 위에 MgO 박막을 증착하여 사용하고 있으며 MgO 박막은 높은 2차 전자 방출 계수와 내 sputtering 특성을 가지고 있다. MgO 박막은 증착 조건에 따라 각각 다른 방전특성을 가지는 것으로 널리 알려져 있어 본 실험에서는 MgO 박막을 증착하는데 사용하는 pellet의 크기를 변화시켜가면서 MgO박막을 증착하여 그에 따른 방전특성을 고찰해 보았다. 각각의 MgO pellet의 크기는 1.5, 0.5 mm 와 60 um이며, 기존의 MgO pellet의 크기는 6 mm 이다. MgO pellet 을 E-beam evaporation 방법으로 증착하여 최적화된 test panel을 제작하였다. 제작된 test panel의 방전 전압 특성을 측정하였으며, 실험 결과 AC-PDP의 면방전 구동 시 MgO pellet의 크기가 작아짐에 따라 방전 개시 전압과 방전 유지 전압이 약 11 %, 16 % 감소하였다. 그러나 MgO pellet의 크기가 60 um 경우의 방전 개시 전압은 MgO pellet의 크기가 0.5 경우의 방전 개시 전압과 차이가 없었다. 이는 MgO 증착시에 사용되는 pellet은 적정의 크기가 있는 것으로 보인다.

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BTMSM 프리커서를 사용한 절연 박막과 유전상수에 대한 연구

  • 오데레사
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2008.05a
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    • pp.738-739
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    • 2008
  • The SiOC film of carbon centered system was prepared using bistrimethylsilymethane and oxygen mixed precursor by the chemical vapor deposition. The chemical properties of he SiOC film were analyzed by the contact angle and FTIR spectra. The dielectric constant of the deposited films decreased after annealing process, and the correlation between the increasing the BTMSM/O2 flow rate ratio and he dielectric constant did not exist. However, the trend of increasing or decreasing of the dielectric constant repeated and here is the correlation ship between the dielectric constant and the Si-O-C bond in the range of $950{\sim}1200\;cm^{-1}$. The dielectric constant decreased between samples with the chemical shift. The lowest dielectric constant was 1.65 at the sample, which was observed he chemical shift.

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