• Transactions of the Korean Society of Mechanical Engineers A
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• v.27 no.7
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• pp.1071-1075
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• 2003

In this paper, we present a DNA manipulation device in the reaction chamber, which consists of a center electrode and circular outer electrodes of a reaction unit. The charged bio-molecules, DNA, are manipulated by the charge of the electrode in reaction unit. Controlling the induced dynamic electric field between the center electrode and the outer electrodes, concentration / repulsion / manipulation of bio-molecules are enabled at a periphery of electrode. Concentration of the fluorescent DNA at the center electrode is observed by applying ＋2V. Subsequently, applying －2V, the concentrated DNA is repelled rapidly from the center electrode, which makes dispersion completely in 0.5second. Furthermore, repeated applying ＋1V/－1V every 5 seconds at each outer electrode, we can circulate the DNA. We also investigate a micro-heater and sensor for DNA manipulation and reaction temperature. The coefficient of heat-resistance and heater temperature characteristic is 0.0043 and 100$^{\circ}C$/sec, respectively.

• Particle and aerosol research
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• v.13 no.3
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• pp.111-118
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• 2017

Electrohydrodynamic (EHD) printing with the aid of strong electric fields can generate and pattern droplets that are smaller than droplets by other printing technologies. Conventional EHD printing has created two-dimensional (2D) patterns by moving its nozzle or a substrate in X and Y directions. In this study, we aimed to develop an EHD system that can create 2D patterns using a multielectrode array (MEA) without moving a nozzle or substrate. In particular, printing ink mixtures of biodegradable polymers and model dyes was patterned on a thin film made of another biodegradable polymer. Without movement of a nozzle and substrate, stable 2D patterning of minimum $6{\mu}m$ size over a range of about 1 mm away from the nozzle position was achieved by MEA control only. We also demonstrated the possibility of denser 2D pattering of the ink mixtures by moving a target substrate relative to MEA position.