• 제목/요약/키워드: 연삭마모

검색결과 51건 처리시간 0.231초

CMP 컨디셔너의 다이아몬드 입자 모양이 연마 패드 표면 형상 제어에 미치는 영향 (Effect of Diamond Abrasive Shape of CMP Conditioner on Polishing Pad Surface Control)

  • 이동환;이기훈;정선호;김형재;조한철;정해도
    • Tribology and Lubricants
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    • 제35권6호
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    • pp.330-336
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    • 2019
  • Conditioning is a process involving pad surface scraping by a moving metallic disk that is electrodeposited with diamond abrasives. It is an indispensable process in chemical-mechanical planarization, which regulates the pad roughness by removing the surface residues. Additionally, conditioning maintains the material removal rates and increases the pad lifetime. As the conditioning continues, the pad profile becomes unevenly to be deformed, which causes poor polishing quality. Simulation calculates the density at which the diamond abrasives on the conditioner scratch the unit area on the pad. It can predict the profile deformation through the control of conditioner dwell time. Previously, this effect of the diamond shape on conditioning has been investigated with regard to microscopic areas, such as surface roughness, rather than global pad-profile deformation. In this study, the effect of diamond shape on the pad profile is evaluated by comparing the simulated and experimental conditioning using two conditioners: a) random-shaped abrasive conditioner (RSC) and b) uniform-shaped abrasive conditioner (USC). Consequently, it is confirmed that the USC is incapable of controlling the pad profile, which is consistent with the simulation results.