• Title/Summary/Keyword: 에너지준위

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The Effects of high Energy(1.5MeV) B+ ion Implantation and Initial Oxygen Concentration Upon Deep Level in CZ Silicon Wafer (고 에너지 (1.5 MeV) Boron 이온 주입과 초기 산소농도 조건이 깊은 준위에 미치는 영향에 관한 연구)

  • Song, Yeong-Min;Mun, Yeong-Hui;Kim, Jong-O
    • Korean Journal of Materials Research
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    • v.11 no.1
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    • pp.55-60
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    • 2001
  • The effect of high energy B ion implantation and initial oxygen concentration upon defect formation and gettering of metallic impurities in Czochralski silicon wafer has been studied by applying DLTS( Deep Level Transient Spectroscopy), SIMS(Secondary ton Mass Spectroscopy), BMD (Bulk Micro-Defect) analysis and TEM(Transmission Electron Microscopy). DLTS results show the signal of the deep levels not only in as-implanted samples but also in low and high temperature annealed samples. Vacancy-related deep levels in as- implanted samples were changed to metallic impurities-related deep levels with increase of annealing temperature. In the case of high temperature anneal, by showing the lower deep level concentration with increase of initial oxygen concentration, high initial oxygen concentration seems to be more effective compared with the lower initial oxygen one.

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Growth and photoluminescence properties of Er : Mg : LiNbO$_3$single crystal fibers by $\mu$-PD method ($\mu$-PD법에 의한 Er : Mg : LiNbO$_3$fiber 결정 성장 및 형광특성)

  • 양우석;윤대호
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.10 no.6
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    • pp.389-393
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    • 2000
  • High-quality $Er^{3+}$ doped Mg : $LiNbO_3$single crystal fibers were grown by a micro-pulling down ($\mu$-PD) method. Single crystal fibers were pulled down through the nozzle, at a pulling down rate of 0.5 mm/min and using a Pt crucible with a nozzle 1 mm in diameter in air atmosphere. Defects such as bubbles, cracks and inclusions were not detected in any of the grown crystals. The optical transmission of Er : Mg : $LiNbO_3$crystal was measured and the energy levels of $Er_2O_3$ ion could be calculated. The photoluminescence spectrum of crystal fibers showed an energy band emission with the strongest line corresponding to the $^4I_{3/2}{\to}^4I_{15/2}$transition. The concentration dependence of the entire wavelength region emission intensity upon excitation intensity measured emission intensity for the 3 mol% MgO doped fibers was larger than that for the 1, 5 mol% MgO doped fibers.

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MBE로 성장한 CdTe 박막의 photoconductivity

  • 임재현;허유범;류영선;전희창;현재관;강철기;강태원
    • Proceedings of the Korean Vacuum Society Conference
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    • 1998.02a
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    • pp.113-113
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    • 1998
  • C CdTe와 HgCdTe는 광전소자나 태양전지,x 선 및 y 선 감지 소자 그리고 적외선 감지소 자로의 웅용둥으로 인하여 많은 연구가 진행되고 있다. 광전소자를 제작함에 있어서 깊은 준위나 얄은 준위에 있는 몇들은 운반자 수명에 매우 큰 영향을 미치고 있음에도 불구하고 광전도도 측정에 의한 운반자 수명 연구에 대하여는 보고된 것이 별로 없다. 이에 본 논문에서는 CdTe 시료의 광전도도를 측정하여 운반자 수명 및 깊은 준위의 위치를 알아보았다 M MBE방법을 이용하여 CdTe 기판위에 In을 도핑한 CdTe를 성장하였다. 광전도 붕괴(PCD) 측정은 300 K에서부터 400 K까지 온도를 변화시켜주면서 측정을 하였고 광원으로서 G GaP- LED를 사용하였으며 전압 신호를 읽기 위하여 Tektronix 2430A 오실로스코프를 이용하 였다 .. Fig. 1. 에서 보인바와 같이 광전도 붕괴곡선은 접선으로 나타낸 하나의 지수 함수적 붕 괴(a2exp( -t/ r 2))보다는 설선으로 나타낸 두 개의 지수함수적 붕괴(alexp( νr 1)+a2exp( -νr 2)) 가 더욱 잘 실험결과와 일치함을 알 수 있었다. 이러한 것은 과잉 전하에 대한 깊은준위를 가 지고 있는 반도체물질에서 일반적으로 관찰되는 것으로 시료가 n 형이기 때문에 소수 운반자 인 정공의 벚에 의한 것으로 생각된다 .. Fig. 2. 에서는 운반자 수명의 온도에 대한 변화를 나타 낸 것이다. 온도가 증가함에 따라 운반자 수명이 감소하는 경항올 보이고 있으며 이것올 이용 하여 딪익 활성화 에너지를 계산 하여 본 결과 0.35 eV 와 0.43 eV염을 알수 있었다.

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The Impact of N-Ion Implantation on Deep-Level Defects and Carrier Lifetime in 4H-SiC SBDs (N-이온주입이 4H-SiC SBDs의 깊은 준위 결함 및 소수 캐리어 수명에 미치는 영향)

  • Myeong-cheol Shin;Geon-Hee Lee;Ye-Hwan Kang;Jong-Min Oh;Weon Ho Shin;San-Mo Koo
    • Journal of IKEEE
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    • v.27 no.4
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    • pp.556-560
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    • 2023
  • In this study, the impact of Nitrogen implantation process on deep-level defects and lifetime in 4H-SiC Epi surfaces was comparatively analyzed. Deep Level Transient Spectroscopy (DLTS) and Time Resolved Photoluminescence (TR-PL) were employed to measure deep-level defects and carrier lifetime. As-grown Schottky Barrier Diodes (SBDs) exhibited energy levels at 0.16 eV, 0.67 eV, and 1.54 eV, while for implantation SBD, defects at 0.15 eV were observed. This indicates a reduction in defects associated with energy levels Z1/2 and EH6/7, known as lifetime killers, as impurities from nitrogen implantation replace titanium and carbon vacancies.

Energy Transfer and Cross-Relaxation in $Tb^{3+}$-doped Borosilicate Glasses ($Tb^{3+}$를 첨가한 Borosilicate 유리속에서 일어나는 에너지 전달과 Cross-Relaxation)

  • 김중환;문병기;오학태;김학수;윤수인;서효진;설정식
    • Korean Journal of Optics and Photonics
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    • v.1 no.2
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    • pp.149-154
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    • 1990
  • Energy transfer in $Tb^{3+}$-doped borosilicate glasses has been studied by the analysis of fluorescence intensities and lifetimes of $^5D_3$ and $^5D_4$ states as a function of Tb3+ concentration. It is shown that as the $Tb^{3+}$ concentration is increased the cross-relaxation produces high population of the $^5D_4$ state at the expense of $^5D_3$. It is also found that this interaction is predominantly dipole-dipole transition with critical distance of 13 A. The critical distance for energy transfer $^5D_4$$^5D_4$ which is responsible for the quenching of 5D4 emission at high concentratron of Tb3+ ions is 4.5 A.

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