• Title/Summary/Keyword: 알루미늄 박막

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Structural characterization of aluminum oxide precipitation formed on the surface of nickel-carbon film (니켈/탄소 복합체 박막 표면에 형성된 알루미늄 산화물의 구조 분석)

  • Lee, Min-Hui;Na, Hyeon-Ung;Choe, Han-Sin;Kim, Gyu-Hyeon
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2014.11a
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    • pp.174-175
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    • 2014
  • We fabricated a Ni/C composite thick film on ${\alpha}-Al_2O_3$ substrate. A number of precipitations were observed on the film surface. Structural characterization was performed on the observed precipitations using transmission electron microscopy (TEM) with help of the elemental mapping, electron diffraction (ED) and ED simulation. The structural characterization revealed that the precipitation is ${\theta}-Al_2O_3$ having the space group of C2/m (Monoclinic).

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Sol-Gel법을 적용한 투명전도 산화막 제조 공정

  • Park, Yeong-Ung;Lee, In-Hak;Jeong, Seong-Hak;Im, Sil-Muk
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2012.05a
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    • pp.108.2-108.2
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    • 2012
  • 디스플레이는 유리 기판이나 폴리머 기판에 진공장비를 통한 투명전극(TCO)를 증착시키고, 그 위에 발광체와 유전체를 쌓는 방식으로 공정을 진행한다. 특히 투명전극(TCO)의 경우 진공장비를 이용하여 증착을 진행하는데, 이러한 생산 공정은 고가의 생산 장비 및 재료와 공정의 복잡화에 따른 생산단가 상승등으로 인한 경쟁력 저하 문제가 야기되고 있다. 본 연구에서는 투명전극(TCO)의 주재료인 인듐 주석 산화물(ITO)를 배제하고, 아연 산화물(ZnO)에 알루미늄을 도핑한 투명전극을 습식방식으로 형성하는 기술에 관한 것이다. Sol-gel법을 이용한 용액 제조와 ZnO에 Al을 도핑하여, 후 열처리하여 유리 기판에 $1{\mu}m$두께를 갖는 투명전극 기판을 제작하였다. 각 공정에 있어서 조성변화가 투명전극 층에 미치는 영향에 대해서 조사 하였다. 이와 같은 제조 공정에는 Sol-gel 용액 제조, 박막형성에 이은 후처리로 이루어지는 단순공정이 적용되어, 기존 투명전도 산화막 공정에 대비하여 단순 공정으로 이뤄지며, 진공 설비를 배제함으로써 기존공정 대비 경쟁력을 갖게 된다.

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A Study on the Thermal Stability in Multi-Aluminum Thin Films during Isothermal Annealing (등온 열처리시 알루미늄 다층 박막의 열적 안정성에 관한 연구)

  • 전진호;박정일;박광자;김홍대;김진영
    • Journal of the Korean institute of surface engineering
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    • v.24 no.4
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    • pp.196-205
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    • 1991
  • Multi-level thin films are very important in ULSI applications because of their high electromigration resistance. This study presents the effects of titanium, titanium nitride and titanium tungsten underlayers of the stability of multi-aluminum thin films during isothermal annealing. High purity Al(99.999%) films have been electron-beam evaporated on Ti, TiN, TiW films formed on SiO2/Si (P-type(100))-wafer substrates by RF-sputtering in Ar gas ambient. The hillock growth was increased with annealing temperatures. Growth of hillocks was observed during isothermal annealing of the thin films by scanning electron microscopy. The hillock growth was believed to appear due to the recrystallization process driven by stress relaxation during isothermal annealing. Thermomigration damage was also presented in thin films by grain boundary grooving processes. It is shown that underlayers of Al/TiN/SiO2, Al/TiW/SiO2 thin films are preferrable to Al/SiO2 thin film metallization.

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Real-time wafer thin-film thickness measurement system implementation with eddy current sensors. (와전류센서를 이용한 실시간 웨이퍼 박막두께측정 시스템 구현)

  • Kim, Nam-woo;Hur, Chang-Wu
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2013.10a
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    • pp.383-385
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    • 2013
  • 반도체소자의 고속실현을 위해서 알루미늄배선에서 40% 가량 성능을 높이는 반면 제조비용은 30%까지 낮출 수 있는 구리를 선호하고 있으나, 식각이 잘 되지 않아 원하는 패턴으로 만들어 내기가 곤란한 공정기술의 어려움과 구리물질이 지닌 유독성문제를 가지고 있다. 기존의 식각기술로는 구리패턴을 얻을 수 없는 기술적 한계 때문에 화학.기계적 연마(CMP)를 이용한 평탄화와 연마를 통해서 구리배선을 얻는 다마스커스(Damascene)기술이 개발됐고 이를 이용한 구리배선기술이 현실적으로 가능하게 됐다. CMP를 이용한 평탄화 및 연마 공정에서 Wafer에 도포된 구리의 두께를 실시간으로 측정하여 정밀하게 제어할필요가 있는데, 본 논문에서는 와전류를 이용하여 옹고스트롬 단위의 두께를 실시간으로 측정하여 제어 하는 시스템구현에 대해 기술한다.

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A study for the residual strain of aluminum thin film for MEMS structures (MEMS용 구조물을 위한 알루미늄 박막의 잔류응력에 대한 연구)

  • Kim, Youn-Jin;Shin, Jong-Woo;Kim, Yong-Kweon
    • Proceedings of the KIEE Conference
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    • 1998.07g
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    • pp.2521-2523
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    • 1998
  • Freestanding flexible microstructures fabricated from deposited thin films become mechanically unstable when internal stresses exceed critical values. The residual stress and stress gradient of aluminum thin film were examined to make sure of fabricating the reproduceable aluminium structure. For good shape of micro mirror array and microstructures, the experiment was done varying thickness and deposition rate. As the aluminium film thickness increased from 0.8${\mu}m$ to 1.6${\mu}m$, the stress gradient decreased from 11.62MPa/${\mu}m$ to 2.62MPa/${\mu}m$. The residual stress values are from 42.4MPa to 62.24MPa of tensile stresses.

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Thin film process of anodic aluminum oxidation for optoelectronic nano-devices (나노 광소자 응용을 위한 알루미늄 양극산화박막 공정)

  • Choi, Jae-Ho;Baek, Ha-Bong;Kim, Keun-Joo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.106-107
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    • 2007
  • We fabricated anodic aluminium oxides (AAO) on Si and sapphire substrates from the electrochemical reactions of thin AI films in an aqueous solution of oxalic acid. The thin AI films have deposited on Si and Sapphire substructure by using E-beam evaporation and thermal evaporation, respectively. The formation of AAO structures has investigated from FE-SEM measurement image and showed randomly distributed phase of nanoholes instead of the periodic lattice of photonic crystals. The AAO structure on sapphire shows the double layers of nanoholes.

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(Fabrication and Electrical Characterization of Pentacene - based Schottky diodes) (Pentanene을 이용한 Schottky diode의 제작 및 전기적 특성)

  • 김대식;이용수;박재훈;최종선;강도열
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.53-53
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    • 2000
  • 반도체 산업에서 유기물질의 응용에 많은 관심을 나타내고있으며, 그 응용의 예로는 발광 다이오드(light emitting diode)와 박막트랜지스터(thinfilm transistor)가 주를 이루고 있다. 이러한 유기 물질을 이용하면 소자의 제작 공정의 단순화와 제작 가격을 낮출 수 있는 이점을 기대할 수 있다. 본 연구에서는 유리 기판 위에 pentcence 다이오드를 제작하였다. 유리 기판 위에 silicon dioxide를 PECVD으로 성막하였다. 전극으로는 Ohmic contact를 이루기 위해 금(Au)을 사용하였으며 schottky contact을 이루기 위해서 알루미늄(Al), 인듐(In), 크롬(Cr), 은(Ag), 금(Au)을 각각 사용하였다. 소자의 활성 층으로는 pentcene을 가장 단순한 열 증착법으로 성막하였고, 진공도는 10-8Torr를 유지하였으며 성막 속도는 0.3 $\AA$/sec로 성막하였다. 제작된 소자들은 $\alpha$-step, I-V, C-V, AFM, IR등을 이용하여 측정, 분석하였다.

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Al2O3 Coating on Transparent Polycarbonate Substrates for the Hard-coating Application (투명 폴리카보네이트 보호코팅을 위한 산화알루미늄 박막)

  • Kim, Hun;Nam, Kyoung-Hee;Jang, Dong-Su;Lee, Jung-Joong
    • Journal of the Korean institute of surface engineering
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    • v.40 no.4
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    • pp.159-164
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    • 2007
  • Transparent aluminum oxide films were deposited on polycarbonate (PC) substrates by inductively coupled plasma (ICP) assisted reactive sputtering. the oxygen flow rate was regulated by controlling the target voltage with a proportional integrate derivative controller. The PC substrate was treated with plasma prior to the deposition in order to the enhance the adhesive strength of the $Al_2O_3$ film. The characteristics of hardness, structure, density, transmittance, deposition rate, surface roughness and residual stress were investigated to estimate the possibility for the hard coating.

Plasmonic gold nanodot array optimization on a-Si thin film solar cells using anodic aluminum oxide templates (비정질 실리콘 박막 태양전지 효율 향상을 위한 양극산화 알루미늄 템플레이트을 이용한 플라즈모닉 금 나노점 배열 최적화)

  • Bae, Kyuyoung;Kim, Kyoungsik
    • Transactions of the Society of Information Storage Systems
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    • v.9 no.2
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    • pp.67-71
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    • 2013
  • The fabrication method of plasmonic nanodots on silicon substrate has been developed to improve the efficiency of thin film solar cells. Nanoscale metallic nanodots arrays are fabricated by anodic aluminum oxide (AAO) template mask which can have different structural parameters by varying anodization conditions. In this paper, the structural parameters of gold nanodots, which can be controlled by the diverse structures of AAO template mask, are investigated to enhance the optical properties of a-Si thin film solar cells. It is found that optical properties of the thin film solar cells are improved by finding optimization values of the structural parameters of the gold nanodot array.

Friction Behavior of Oil-enriched Nanoporous Anodic Aluminum Oxide Film (오일 함침된 나노 기공 산화알루미늄 필름의 마찰 거동)

  • Kim, Hyo-Sang;Kim, Dae-Hyun;Hahn, Jun-Hee;Ahn, Hyo-Sok
    • Tribology and Lubricants
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    • v.27 no.4
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    • pp.193-197
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    • 2011
  • Friction behavior of nanoporous anodic aluminum oxide(AAO) film was investigated. A 60 ${\mu}m$ thick AAO film having nanopores of 45 nm diameter with 105 nm interpore-diatance was fabricated by mild anodization process. The AAO film was then saturated with paraffinic oil. Reciprocating ball-on-flat sliding friction tests using 1 mm diameter steel ball as the counterpart were carried out with normal load ranging from 0.1 N to 1 N in an ambient environment. The morphology of worn surfaces were analyzed using scanning electron microscopy. The friction coefficient significantly increased with the increase of load. The boundary lubrication layer of paraffinic oil contributed to the lower friction at relatively low load (0.1 N), but it is less effective at high load (1 N). Plastic deformed layer patches were formed on the worn surface of oil-enriched AAO at relatively low load (0.1 N) without evidence of tribochemical reaction. On the other hand, thick tribolayers were formed on the worn surface of both oil-enriched and as-prepared AAO at relatively high load (1 N) due to tribochemical reaction and material transfer.