• Title/Summary/Keyword: 스트리퍼폐액

Search Result 3, Processing Time 0.015 seconds

Design of Waste Solvent Treatment Process from LCD Manufacturing Process (LCD 제조공정에서의 폐용매 분리처리를 위한 공정 설계)

  • Yoon, Mun-Kyu;Lee, Moon-Yong
    • Clean Technology
    • /
    • v.14 no.4
    • /
    • pp.275-280
    • /
    • 2008
  • In this study, we carry out economic and technical feasibility study for treatment process of waste solvent such as SD waste solution and stripper solution from LCD manufacturing process. Extensive screening work has been done for selecting the best extraction solvent. As a result, it is shown that $CHCl_3$ is the most adequate extraction solvent for separation and recovery of both SD waste solvent and stripper waste. Rigorous simulation study has been carried out for extraction process and distillation process as a candidate of waste solvent treatment. The result shows that the solvent extraction process is more beneficial than the simple distillation process.

  • PDF

Trend on the Recycling Technologies for the waste stripper solution by the Patent Analysis (특허(特許)로 본 스트리핑 공정(工程) 재활용(再活用) 기술(技術) 동향(動向))

  • Park, Myung-Jun;Lee, Ho-Kyung;Koo, Kee-Kahb;Kang, Kyung-Seok;Han, Hye-Jung
    • Resources Recycling
    • /
    • v.18 no.1
    • /
    • pp.58-67
    • /
    • 2009
  • The annual requirement of domestic waste photoresist stripper solution is about 1 trillion won level (50,000 tons) depends entirely on imports for its supplies. Nevertheless, there waste strippers which contain the impurities have been recycled or incinerated to a low level of recycle. These days the recycling technologies of the waste stripper solution has been widely studied from the view points of economy and efficiency. In this paper, the recycling technologies on patent of the waste stripper solution were analyzed. The range of search was limited within the open patents of USA (US), European Union (EP), Japan (JP), and Korea (KR) up to september, 2007. Patents have been collected using key-words searching and filtered by filtering criteria. The trends of the patents was analyzed by the years, countries, companies, and technologies.

Reclamation of High Purity Organic Solvents from Waste Photoresist Stripper (포토레지스트 스트리퍼 폐액으로부터 고순도 유기용제 회수)

  • Kim, Dae-Jin;Oh, Han-Sang;Kim, Jae-Kyeong;Park, Myeong-Jun;Lee, Moon-Yong;Koo, Kee-Kahb
    • Clean Technology
    • /
    • v.13 no.4
    • /
    • pp.257-265
    • /
    • 2007
  • As a basic study for the development of pilot-scale distillation process of waste photoresist strippers from semiconductor industry, lab-scale experiments for the recovery of NMP (N-methy1-pyrrolidione) and BDG (Butyldiglycol) from waste photoresist strippers have been made using a spinning band vacuum distillation column. Purities of NMP and BDG obtained from the present experiments were higher than 99.5%. Furthermore, water content was less than 1000 ppm, color grade(APHA) less than 50, most metal contents except sodium less than 1 ppb. Those results indicate that NMP and BDG reclamed by distillation satisfy the their specifications required for the formulation of new photoresist strippers. Recovery rate of NMP and BDG was 96 and 53%, respectively, for type A, and 93 and 57%, respectively, for type B waste PR stripper solution.

  • PDF