• Proceedings of the Materials Research Society of Korea Conference
• /
• 1994.05a
• /
• pp.133-133
• /
• 1994

• Clean Technology
• /
• v.24 no.3
• /
• pp.157-165
• /
• 2018

In this study, the removal of $Si_3N_4$ particles from the surface of a silicon wafer was investigated by using supercritical carbon dioxide, the IPA co-solvent and cleaning additive chemicals. First, the solubility of several surfactants and binders in supercritical carbon dioxide solubility and particle dispersibility in the binders were evaluated in order to confirm their suitability for the supercritical cleaning process. Particle removal experiments were carried out with adjusting various process parameters and reaction conditions. The surfactants used in the experiment showed little particle removal effect, producing secondary contamination on the surface of wafers. On the other hand, 5 wt% (with respect to $scCO_2$) of the cleaning additive mixture of trimethyl phosphate, IPA, and trace HF resulted in 85% of particle removal efficiency after $scCO_2$ flowing for 4 minutes at $50^{\circ}C$, 2000 psi, and the flow rate of $15mL\;min^{-1}$.

• Journal of the Korean GEO-environmental Society
• /
• v.12 no.6
• /
• pp.17-23
• /
• 2011

In this study, a series of experiments were carried out to remove total petroleum hydrocarbon(TPH) and toluene by soil flushing. In batch experiments, Triton X-100 and SWA 1503 showed TPH removal efficiency of 79.0% and 69.0%, respectively. Although the TPH removal efficiency increased as the surfactant was increased in the concentration range 1-11mmol/L, the optimum concentration was 1mmol/L, considering the ratio of the removal efficiency to the amount of surfactant injected. In column experiment, the optimal velocity was 0.3mL/min. The physical aquifer model(PAM) result revealed that the soil flushing removed as much as 5.5% of the toluene under 3 pore volume(PV) conditions. To improve the soil flushing efficiency, it is necessary to find optimal condition through recirculation or reuse of surfactant.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2004.07a
• /
• pp.235-238
• /
• 2004

본 연구는 반도체소자 제조공정에 적용되는 CMP공정 중 LPP(Landing Plug Poly) Contact간의 소자 분리를 위해 진행되는 LPP CMP의 후 세정 과정에서 유발되는 방사형 Defect 제거에 관한 내용이다. 방사형 Defect은 LPP CMP 후에 노출되는 BPSG, Poly, Nitride Film과 연마재로 사용되는SiO2 입자, 후 세정과정에서 적용되는 SC-1, DHF, $NH_4OH$ Chemical과 Brush와의 상호작용에 의해 발생되며, Cleaning시의 산성 분위기 하에서 각 물질간의 pH와 Zeta Potential의 차이에서 기인한다. 이 Defect을 제거하기 위해 LPP CMP후에 Film 표면에 노출되는 각 물질의 표면 특성과 CMP 후 오염입자의 흡착과 재 흡착에 영향을 미치는 Electrostatic force와 Van der Waals force, PVA Brush에 의한 Mechanical force의 상호작용을 고려하여 최적 후 세정 조건을 제시 하였다.

• Resources Recycling
• /
• v.14 no.5 s.67
• /
• pp.40-44
• /
• 2005

The purified phosphoric acid was recovered from crude phosphoric acid with high contents of aluminium and molybdenum ions to reuse the acid as an etchant. In this work, solvent extraction was applied to recover the phosphoric acid from crude phosphoric acid. Phosphate was used as an extractant. Further cleaning and removing processes on the recovered phosphoric acid were conducted to eliminate the metallic ion impurities in the acid. The process parameters were successfully optimized, so that the finally purified acid contained less than 1 ppm of aluminium and molybdenum ion.

• Proceedings of the Membrane Society of Korea Conference
• /
• 1994.10a
• /
• pp.74-75
• /
• 1994

부유물질을 함유한 용수$\cdot$폐수의 정밀여과시 FOULING 때문에 세정약품이 많이 들고 MEMRANE 수명이 단축되는 문제점을 해결하기 위해 HOLLOW FIBER TYPE MEMBRANE을 이용한 역세형정밀 여과시스템을 개발하여 TEST를 실시하고 역세조건에 따른 FLUX, 제거율 및 역세효율을 조사하였다.

• Journal of the Korean Vacuum Society
• /
• v.10 no.2
• /
• pp.267-274
• /
• 2001

Removal of Cr, Ni and Cu impurities on Si surfaces using remote plasma-excited hydrogen was investigated. Si surfaces were contaminated intentionally by acetone with low purity. To determine the optimum process condition, remote plasma-excited hydrogen cleaning was conducted for various rf-powers and plasma exposure times. After remote plasma-excited hydrogen cleaning, Si surfaces were analyzed by Total X-ray Reflection Fluorescence(TXRF), Surface Photovoltage(SPV) and Atomic Forece Microscope(AFM). The concentrations of Cr, Ni and Cu impurities were reduced and the minority carrier lifetime increased after remote plasma-excited hydrogen. Also RMS roughness decreased by more than 30% after remote plasma-excited hydrogen cleaning. AFM analysis results also show that remote plasma-excited hydrogen cleaning causes no damage to the Si surface. TXRF analysis results show that remote plasma-excited hydrogen cleaning is effective in eliminating metallic impurities from Si surface only if it is performed under an optimum process conditions. The removal mechanism of the Cr, Ni and Cu impurities using remote plasma-excited hydrogen treatments is proposed to be the lift-off during removal of underlying chemical oxides.

• Proceedings of the Korean Society of Dyers and Finishers Conference
• /
• 2012.03a
• /
• pp.49-49
• /
• 2012

바닥재 자카드직물에 사용이 예상되는 LMP(low meltig polyester) 복합사는 사염 시 높은 수축율 및 열융착의 가능성 때문에 일반적인 폴리에스테르의 염색조건에서는 염색이 불가하다. 따라서 적정의 수축율 내에서 가능한 염색조건에 대해 고찰하였다. LMP 복합사는 웅진케미컬에서 생산된 Regular PET/LMP(75:25) 260d/48f 원사를 사용하였다. 수축율은 KS K 0215에 준하여 측정하였다. 염색은 E-type 및 S-type(Foron Dark Blue S-WF) 분산염료를 사용하였으며, E-type 중에서는 아조계(Lumacron Blue SERL 200%) 와 안트라퀴논계(Foron Blue E-BL 150)의 2 종류를 사용하였다. 염색된 시료는 현미경 단면사진을 이용하여 염료의 내부확산을 확인하였으며, 환원세정 전후의 K/S 값을 측정하였다. LMP원사의 수축율을 시험한 결과 $90^{\circ}C$에서 9% 정도의 수축율을 나타내어, $90^{\circ}C$ 이상에서는 사염이 어려운 것으로 나타났다. 따라서 염색온도는 $80^{\circ}C$와 $90^{\circ}C$로 하였다. S-type의 염료를 이용한 경우 $90^{\circ}C$에서 4일 이상 염색해도 염착이 이루어지지 않아 대상 염료에서 제외하였다. E-type 염료인 경우 아조계는 흡진율은 높았으나 내부 regular PET에의 확산이 매우 느리고, 안트라퀴논계는 상대적으로 확산이 빠른 것으로 나타났다. 안트라퀴논계 분산염료는 $80^{\circ}C$에서 내부로의 확산에 4일 이상이 소요되며, $90^{\circ}C$에서는 2일 이상이 소요되었다. 이 후 환원세정에 의한 K/S 값의 변화 및 마찰견뢰도를 시험하였으며, 환원세정 후의 섬유단면 사진을 통해 염료의 migration성을 평가하였다.

• Applied Chemistry for Engineering
• /
• v.19 no.6
• /
• pp.640-644
• /
• 2008

Lubricating oil on aluminium surfaces was cleaned by a low temperature plasma process. Oxygen plasma mixed with argon was used, and process parameters were the mixing ratio of argon in oxygen, discharge power, and negative DC potential. The aluminium surfaces were analyzed with FTIR and EDX after the cleaning. It was found that almost all of the oil was eliminated in 20 min. if the oil was pure. Elimination efficiency was highly dependent on operational conditions of the process. The highest efficiency was obtained when treated at 300 W with oxygen plasma mixed with 30% argon applying negative potential more than -500 V on the aluminium surfaces. However, efficiency higher that 60% cannot be obtained at any condition if the oil contained inorganic materials.

• Journal of Soil and Groundwater Environment
• /
• v.7 no.3
• /
• pp.79-84
• /
• 2002

The optimal operation conditions, including voltage applied, reaction time, distance between electrodes. and electrode material. were investigated for the treatment of soil flushing effluent using electrofloatation. When 3V was applied for 1 hour, 88% oil-water separation efficiency was achieved. In case of 6V and above, 90% efficiencies were achieved. As reaction time and distance between electrodes were longer, separation efficiencies were higher and lower, respectively. Separation efficiencies for different anode materials were copper > aluminum > iron > titanium. It might result from the differences of their electrical conductivities.