• Proceedings of the Korean Vacuum Society Conference
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• 2006.02a
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• pp.173-173
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• 2006

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.30 no.5
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• pp.168-173
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• 2020

To analyze and describe the behavior and mechanisms occurring in the thermal oxidation process of AlN, bulk AlN single crystals were thermally treated with different temperatures. As a result, it was confirmed that full-scale oxidation of bulk AlN and growth of Al-oxide occurred from the temperature of 800℃, which confirmed that the weight% of O elements tended to increase while the N elements decreased with increasing the temperature. In the case of thermal treatment at 900℃, the grown Al-oxides were merged with neighboring Al-oxides and began to form α-Al₂O₃ poly-crystals. During thermal treatment at the temperature of 1000℃, hexagonal pyramidal shaped poly-crystalline α-Al₂O₃ was clearly observed. Through the X-ray diffraction pattern analysis, the changes of surface crystal structure according to the temperature of bulk AlN were investigated in detail.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.9 no.2
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• pp.141-148
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• 1999

High quality pure and Nb-doped $PbWO_{4}$ Single Crystal were grown from a 50 %~50 % mixture of Lead oxide (PbO) and Tungsten oxide $(WO_{3})$ by Czochralski method in Iridium crucible. The stoichiometric deviation correspond to the selective loss of the crystal constituents is found to be responsible for the yellowish coloration of $PbWO_{4}$. Through the X-ray powder diffraction experiment, we have investigated the lattice constant variations of each $PbWO_{4}$ crystals. We also present information on their photoluminescence (PL), optical absoption properties and Raman spectra. The temperature dependence of PL intensity and FWHM (Full Width Half Maximum) were measured in the temperature range 10 K~300 K. One observes a slight temperature dependence in the low temperature region and PL intensity decreases over 200 K by thermal quenching. The activation energy, Huang-Rhys coupling constant and inhomogenious brodenning acquired from their temperature dependence.

• Fire Science and Engineering
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• v.34 no.4
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• pp.45-51
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• 2020

The aim of this study is to investigate the gas temperature and velocity during sprinkler activation considering the fire growth scenario based on the thermal response model of the sprinkler. The fire source is assumed to have time square fire growth scenarios with a maximum heat release rate of 3 MW. Eight types of standard and fast-response sprinkler heads with an operating temperature range of 65-105 ℃ and a response time index range of 25-171 m^1/2s^1/2 were adopted. The temperature difference between the gas stream and the sensing element of the sprinkler head decreased as the fire growth slowed down, and the RTI value decreased. The overall gas temperature and velocity conditions predicted using the FDS model at sprinkler activation were in reasonable agreement with those of standard test conditions of the sprinkler head response. However, the sprinkler head could be activated at lower limits of gas temperature and velocity under the current test conditions for a slowly growing fire scenario.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.11 no.1
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• pp.14-19
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• 2001

The crystal size was determined as a function of reaction temperature, during the crystallization process of NaX zeolite. The measured rate constants for linear growth were as 0.0441$\mu\textrm{m}$/h at $80^{\circ}C$, 0.0595$\mu\textrm{m}$/h at $90^{\circ}C$ and 0.0972$\mu\textrm{m}$/h at $100^{\circ}C$, respectively. The activation energy calculated from the relation between the linear growth rate an the reaction temperature was 43.243kJ/mol. The reaction of crystal growth were revealed as 20 days at $80^{\circ}C$, 16 days at $90^{\circ}C$ and 9 days at $100^{\circ}C$, respectively. Both the final product crystal size an the crystallization time were decreased with increasing reaction temperature.

• Korean Journal of Crystallography
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• v.14 no.2
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• pp.84-92
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• 2003

The fast pulling is easy to modify the distribution of grown-in defects toward fine size, which can be readily removed by additional treatment. In this experiment, The fast pulled crystals with high pulling late over 1.0 mm/min were grown and their grown-in defect distributions were investigated. In our recent developments in the growth of Cz-Si, it could be found that the cooling rate in a specific temperature range and the uniformity of temperature gradient at solid/liquid interface are more important for the formation of grown-in defect than the pulling rate itself. We analyzed these cooling rates and temperature gradients for the various fast pulled crystals and compared them to the observed formation behavior of the grown-in defects. The effective factor (Ω) for the void defect formation was introduced and it could explain the radial distribution of void defects in the fast-pulled crystals effectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.399-399
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• 2011

본 논문에서는 Indium tin oxide (ITO) 투명전극의 성장온도($T_G$)가 Cu(In,Ga)$Se_2$ (CIGS) 박막태양전지에 미치는 영향을 살펴 보았다. ITO 박막은 radio-frequency magnetron sputtering을 이용하여 상온에서 $350^{\circ}C$까지의 다양한 $T_G$ 조건에서 i-ZnO/ glass와 i-ZnO/CdS/CIGS/Mo/glass 기판에 증착되었다. ITO의 비저항과 CdS/CIGS 계면 특성은 $T_G$에 크게 영향을 받았다. $T_G{\leq}200^{\circ}C$에서는 $T_G$가 증가할수록 ITO 저항이 감소하였고 이에 따른 series 저항 감소가 태양전지 성능 향상에 기여하였다. 하지만 $T_G$ > $200^{\circ}C$에서는 CdS 버퍼층의 Cd이 CIGS 층으로 확산되어 소자의 p-n 계면이 파괴되는 것을 발견하였다. $T_G=200^{\circ}C$에서 ITO를 증착한 CIGS 태양전지의 경우 가장 높은 광전변환효율을 보였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.126-126
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• 2010

본 연구에서는 catalyst-free 유기금속 화학증착법 (MOCVD)를 이용하여 사파이어 (0001)면 위에 직접 InN nanorods를 성장하였다. InN 박막의 성장에서 TMIn과 $NH_3$를 전구체로 사용하였으며, 캐리어 가스로는 질소를 사용하였다. 성장 전, 기판에 $1100^{\circ}C$에서 3분간 nitridation 처리를 거친 후 온도를 낮춰 $630{\sim}730^{\circ}C$의 온도범위 에서 InN 박막을 성장하였다. 이때 $710^{\circ}C$의 온도에서 박막은 columnar growth의 특성을 보였으며 동일조건에서 80분간 성장시킨 결과 InN nanorods가 성장되었다. 성장시킨 InN nanorod는 X-선 회절 측정법, 주사 전자 현미경 그리고 투과 전자 현미경을 이용하여 그 특성을 분석하였다. 투과 전자 현미경을 통한 분석결과 지름이 150~200 nm이며 그 길이는 수 ${\mu}m$인 InN nanorod가 성공적으로 성장되었음을 확인하였다. 또한 X-선 회절 측정법과 주사 전자 현미경을 통한 분석에서 이들 nanorods가 대부분 c 방향으로 수직하게 정렬되어 있음을 확인하였다. 또한 Ti/Au (120/80 nm)를 전극으로 사용하여 개개의 nanorod의 전기적 특성을 분석한 결과 linear한 I-V특성이 관찰되었으며 비저항은 평균적으로 $0.0024\;{\Omega}cm$ 이었다. transfer 특성의 측정결과 -50V까지 게이트 전압을 인가하여도 드레인 전류의 변화는 매우 적어 doping level이 상당히 높다고 예상가능하다. 또한 mobility는 $133\;cm^2/Vs$로 도출되었다.

• Journal of the Mineralogical Society of Korea
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• v.18 no.4 s.46
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• pp.237-248
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• 2005

Results from in-situ high temperature X-ray diffraction measurements show that $Mg_{2}SiO_{4}{-}$spinel converts back to olivine phase only when heated in vacuum, and that at some high temperature, the olivine phase grows with time at the expense of the spinel phase strongly suggesting a 'nucleation and growth' type transition. In order to obtain the activation energy of spinel-olivine back transformation, kinetics measurements were performed on $Mg_{2}SiO_{4}{-}$spinel in vacuum at high temperatures between 1023 and 1116 K. Activation energy was determined using 'time to a given fraction method'. By employing the Avrami equation, it was found that n values generally increase with increasing temperature in a wide range implying that the nucleation and growth mechanism is probably temperature-dependent. It is likely that in spinel, at a relatively lower transformation temperature, after nucleation sites saturated, the growth of the new phase starts on the surface and gradually moves inwards. At high temperatures, however, after nucleation sites saturated, the growth starts both on the surface as well as at the interior.

• Journal of Sensor Science and Technology
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• v.8 no.6
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• pp.476-480
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• 1999

PbSe thin films were grown using PLD method on the p-Si(100) substrate. To determine what crystalline structure of PbSe thin films have according to the growth temperature, the films were prepared under a substrate temperature changing between a room temperature and $400^{\circ}C$. As a result of analyzing XRD patterns of PbSe thin films prepared at various substrate temperatures and FWHM of PbSe(200) rocking curve, it was found that PbSe thin film obtained at the growth temperature of $200^{\circ}C$ was best crystallized. In addition, the surface morphology of PbSe thin film observed using AFM found itself having the most regularly arranged particles in case of growing the film at $200^{\circ}C$. The measurement of Hall effect indicated that PbSe thin films were n-type semiconductors and that current-voltage characteristic curve exhibit the typical p-n junction phenomenon. In addition, electric conductivity of PbSe thin films was found somewhat higher than that of general semiconductors.