• Journal of the Korea Institute of Information and Communication Engineering
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• v.10 no.10
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• pp.1815-1821
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• 2006

In this paper, the subthreshold swing has been analyzed for FinFET under channel length of 20nm. The analytical current model has been developed , including thermionic current and tunneling current models. The potential distribution by Poisson equation and carrier distribution by Maxwell-Boltzman statistics are used to calculate thermionic emission current and WKB(Wentzel-Kramers-Brillouin) approximation to tunneling current. The cutoff current is obtained by simple adding two currents since two current is independent. The subthreshold swings by this model are compared with those by two dimensional simulation and two values agree well. Since the tunneling current increases especially under channel length of 10nm, the characteristics of subthreshold swing is degraded. The channel and gate oxide thickness have to be fabricated as am as possible to decrease this short channel effects, and this process has to be developed. The subthreshold swings as a function of channel doping concentrations are obtained. Note that subthreshold swings are resultly constant at low doping concentration.

• Electrical & Electronic Materials
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• v.5 no.3
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• pp.320-327
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• 1992

Twin-tub CMOS 공정에 의해 제작된 서브마이크로미터 채널길이를 갖는 n채널 및 p채널 MOSFET의 특성을 고찰하였다. n채널 및 p채널 영역에서의 불순물 프로파일과 채널 이온주입 조건에 따른 문턱전압의 의존성 및 퍼텐셜 분포를 SUPREM-II와 MINIMOS 4.0을 사용하여 시뮬레이션하였다. 문턱전압 조정을 위한 counter-doped 보론 이온주입에 의해 p채널 MOSFET는 표면에서 대략 0.15.mu.m의 깊이에서 매몰채널이 형성되었다. 각 소자의 측정 결과, 3.3[V] 구동을 위한 충분한 여유를 갖는 양호한 드레인 포화 특성과 0.2[V]이하의 문턱전압 shift를 갖는 최소화된 짧은 채널 효과, 10[V]이상의 높은 펀치쓰루 전압과 브레이크다운 전압, 낮은 subthreshold 값을 얻었다.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.12 no.10
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• pp.1840-1844
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• 2008

In this paper, the influence of channel doping concentration, which the most important factor is as double gate MOSFET is fabricated, on transport characteristics has been analyzed in the subthreshold region. The analytical model is used to derive transport model based on Poisson equation. The thermionic omission and tunneling current to have an influence on subthreshold current conduction are analyzed, and the relationship of doping concentration and subthreshold swings of this paper are compared with those of Medici two dimensional simulation, to verify this model. As a result, transport model presented in this paper is good agreement with two dimensional simulation model, and the transport characteristics have been considered according to the dimensional parameters of double gate MOSFET.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2008.05a
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• pp.751-754
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• 2008

본 연구에서는 나노구조 FinFET 제작시 게이트산화막 특성이 서브문턱영역에서 전송특성에 미치는 영향을 분석하고자 한다. 이를 위하여 분석학적 전송모델을 사용하였으며 분석학적 모델을 유도하기 위하여 포아슨방정식을 이용하였다. 나노구조 FinFET에서 문턱전압이하의 전류전도에 영향을 미치는 열방사전류와 터널링전류에 대하여 분석하였으며 본 연구의 모델이 타당하다는 것을 입증하기 위하여 서브문턱스윙값을 이차원 시뮬레이션값과 비교하였다. 결과적으로 본 연구에서 제시한 전송특성모델이 이차원 시뮬레이션모델과 매우 잘 일치하였으며 FinFET의 전송특성이 게이트산화막의 특성에 따라 매우 큰 변화를 보이는 것을 알 수 있었다. 특히 게이트길이가 작아지면서 전송특성에 커다란 영향을 미치는 터널링특성에 대하여 집중적으로 분석하였다.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.12 no.9
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• pp.1599-1604
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• 2008

In this paper, it has been analyzed how transport characteristics is influenced on gate oxide properties in the subthreshold region as nano structure FinFET is fabricated. The analytical model is used to derive transport model, and Possion equation is used to obtain analytical model. The thermionic emission and tunneling current to have an influence on subthreshold current conduction are analyzed for nano-structure FinFET, and subthreshold swings of this paper are compared with those of two dimensional simulation to verify this model. As a result, transport model presented in this paper is good agreement with two dimensional simulation model, and this study shows that the transport characteristics have been changed by gate oxide properties. As gate length becomes smaller, funneling characteristics, one of the most important transport mechanism, have been analyzed.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.10 no.9
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• pp.1648-1653
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• 2006

In this paper, transport characteristics have been investigated using analytical current-voltage model for double gate MOSFET(DGMOSFET). Scaling down to 100nm of gate length for MOSFET can bring about various problems such as a threshold voltage roll-off and increasing off current by tunneling since thickness of oxide is down by 1.fnm and doping concentration is increased. A current-voltage characteristics have been calculated according to changing of channel length,using analytical current-voltage relation. The analytical model has been verified by calculating I-V relation according to changing of oxide thickness and channel thickness as well as channel length. A current-voltage characteristics also have been compared and analyzed for operating temperature. When gate voltage is 2V, it is shown that a current-voltage characteristic in 77K is superior to in room temperature.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.10 no.3
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• pp.479-485
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• 2006

The double gate(DG) MOSFET is a promising candidate to further extend the CMOS scaling and provide better control of short channel effect(SCE). DGMOSFETs, having ultra thin undoped Si channel for SCEs control, ale being validated for sub-20nm scaling. A novel analytical transport model for the subthreshold mode of DGMOSFETs is proposed in this paper. The model enables analysis of short channel effect such as the subthreshold swing(SS), the threshold voltage roil-off$({\Delta}V_{th})$ and the drain induced barrier lowering(DIBL). The proposed model includes the effects of thermionic emission and quantum tunneling of carriers through the source-drain barrier. An approximative solution of the 2D Poisson equation is used for the distribution of electric potential, and Wentzel-Kramers-Brillouin approximation is used for the tunneling probability. The new model is used to investigate the subthreshold characteristics of a double gate MOSFET having the gate length in the nanometer range $(5-20{\sim}nm)$ with ultra thin gate oxide and channel thickness. The model is verified by comparing the subthreshold swing and the threshold voltage roll-off with 2D numerical simulations. The proposed model is used to design contours for gate length, channel thickness, and gate oxide thickness.