• Clean Technology
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• v.6 no.1
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• pp.79-84
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• 2000

In this study, to reduce the consumption of chemicals in cleaning processes, Si-wafers contaiminated with metallic impurities were cleaned with electrolyzed water(EW), which was generated by the electrolysis of a diluted electrolyte solution or ultra pure water(UPW). Electrolyzed water could be controlled for obtaining wide ranges of pH and ORP(oxidation-reduction potential). The pH and oxidation-reduction potential of anode water and cathode water were measured to be 4.7 and +1000mV, and 6.3 and -550mV, respectively. To analyze the amount of metallic impurities on Si-wafer surfaces, ICP-MS was introduced. Anode water was effective for Cu removal, while cathode water was more effective for Fe removal.

• Proceedings of the KAIS Fall Conference
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• 2005.05a
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• pp.318-320
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• 2005

Antioxidation effect of reduced electrolyzed water, which has been known as antiaging agent has been investigated with very simple method. Antioxidation effect of the reaction of linoleic acid with oxygen has been measured and analyzed. Alkaline reduced electrolyzed waters are better effect, rather acidic oxidized electrolyzed waters accelerates oxidation reaction.

• Clean Technology
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• v.10 no.1
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• pp.47-51
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• 2004

현재 반도체 공정에서 사용되는 세정기술은 대부분이 1970년대 개발된 RCA 세정법인 과산화수소를 근간으로 하는 습식 세정으로, 표면의 입자를 제거하기 위한 SC-1 세정액은 강력한 산화제인 과산화수소에 의한 표면과 입자의 산화와 암모니아에 의한 표면의 에칭이 동시에 일어나 입자를 표면으로부터 분리시킨다. 금속 불순물을 제거하기 위한 SC-2 세정액은 염산과 과산화수소 혼합액을 사용하며 금속 불순물을 용해시켜 알칼리나 금속 이온을 형성하거나 용해 가능한 화합물을 형성시켜 제거한다. 또한 황산과 과산화수소를 혼합한 Piranha 세정액은 효과적인 유기물 제거제로서 웨이퍼에 오염된 유기물을 용해 가능한 화합물로 만들거나 과산화수소에 의해 형성되는 산화막내에 오염물을 포함시켜 불산 용액으로 산화막을 제거할 때 함께 제거된다. 최근 금속과 산화막을 동시에 제거하기 위해 희석시킨 불산에 과산화수소를 첨가한 세정공정이 사용되고 있으며 불산에 의해 표면의 산화막이 제거될 때 산화막내에 포함된 금속 불순물을 동시에 제거시킬 수 있다. 그러나 이와 같이 습식세정액 내에 공통적으로 포함되어 있는 과산화수소의 분해는 그만큼 가속화되어 사용되는 화학 약품의 양이 그만큼 증가하게 되고 조작하기 어려운 단점도 있다. 이를 해결하기 위해 환경친화적인 관점으로 화학약품의 사용을 최소화하는 등 RCA세정을 보완하는 연구가 계속 진행되고 있다. 본 연구에서는 RCA세정법을 환경적으로 대체할 수 있는 세정에 사용되는 전리수의 pH변화에 따른 전리수 분석을 하였다. 전리수의 제조를 위하여 전해질로는 NH4CI (HCI:H2O:NH4OH=1:1:1)를 사용하였다. pH 11 이상, ORP -700mV~-850mV인 환원수와 pH 3 이하, ORP 1000mV~1200mV인 산화수를 제조하였으며, 초순수를 첨가하여 pH 7.2와 ORP 351.1mV상태까지 조절하였다. 이렇게 만들어진 산화수와 환원수를 시간 변화와 pH 변화에 따라 Clean Room 안에서 FT-IR과 접촉각 측정기로 실험하였다. FT-IR분석에서 산화수는 pH가 높아질수록, 환원수는 낮아질수록 흡수율이 낮아졌다. 접촉각 실험에서는 산화수의 pH가 높아질수록 환원수의 pH가 낮아질수록 접촉각이 커짐을 확인하였다. 결론적으로 전리수를 이용하여 세정을 하면, 접촉성을 조절할 수 있어 반도체 세정을 가능하게 할 수 있으며, 환경친화적인 결과를 도출할 것으로 전망된다.

• Proceedings of the KAIS Fall Conference
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• 2005.05a
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• pp.290-291
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• 2005

본 연구에서는 음극전리수가 paraquat에 의한 사람 임파구 DNA의 손상에 미치는 영향을 alkaline comet assay를 사용하여 조사하였다. 또한 음극전리수가 plasmid DNA 손상에 미치는 효과도 조사하였다. 사람 임파구에 다양한 농도의 paraquat을 처리한 후, 음극전리수를 첨가하여 반응시킨 결과 paraquat에 의한 임파구 DNA의 손상은 paraquat 농도증가에 의존적으로 증가하였다. 그러나 음극전리수를 처리한 결과 DNA의 산화적 손상이 paraquat 미처리 대조군 수준으로 거의 다 복구되었다.

• Applied Biological Chemistry
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• v.48 no.2
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• pp.155-160
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• 2005

Electrolyzed reduced water (ERW), showing extremely negative oxidation-reduction potential, was used to investigate the effects of paraquat-induced damages on DNA from human lymphocyte. The effect of ERW on paraquat-induced oxidative DNA damage in human lymphocytes was evaluated by Comet assay (single-cell gel electrophoresis) quantified as percentage fluorescence in tail. Comet assay has been used widely to assess the level of the DNA damage in individual cells. Lymphocytes were oxidatively challenged with various concentrations of paraquat for 30 min at $37^{\circ}C$, and were then treated with electrolyzed reduced water for 30 min. The oxidative DNA damage by paraquat, as indicated by the fluorescent tail in DNA, increased in a dose-dependent manner. However, oxidative damage of the DNA was almost completely prevented upon treatment with electrolyzed reduced water.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.11 no.11
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• pp.4427-4432
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• 2010

Parabens have been widely used as preservatives in cosmetics due to the presumed low toxicity and long history of safe use. However, recent studies have shown the potent toxicity of parabens. In order to know if electrolyzed reduced water could suppress the oxidative DNA damage of HDF cell by methylparaben, one of the frequently used parabens, we performed comet assay in this study. As a result, interestingly, electrolyzed reduced water could suppress methylparaben-induced oxidative DNA damage in HDF cells.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2003.05a
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• pp.772-777
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• 2003

선박이 배출하는 안정수(ballast water)는 외부로부터 유해 생물들이 유입되어 전파해 오는 주요경로로써 해양환경의 매우 중요하고 위험한 일종의 하나이지만, 이에 대한 효과적인 처리방법은 아직까지도 개발되지 못하였다. 그러나 최근 강 전리방전을 이용하여 고 밀집 산소와 물분자를 고농도 수산자유기(OH: hydroxyl radical)로 전리, 활성입자를 발생시켜 신속히 확산시키면 넓은 범위에서 비교적 낮은 농도로 유해성 침입 생물을 잔류물 없이 저렴한 비용으로 살균제나 촉매제의 사용 없이 소멸시켜 처리하는 효과적인 새로운 녹색방법을 제안하였다. 또한, 수산기는 강 산화제로써(산화환원 전위는 2.80 eV), 적조생물을 신속, 효과적으로 사멸시켜 잔유물과 오염물 발생 없이 이상적으로 해양적조현상을 처리할 수 있는 활성물질이다. 고출력 강 전리장치를 활용하면 수산기 활성제의 발생 농도를 Sr104 이상으로 얻을 수 있으므로, 해양적조처리에 요구되는 문턱 값 농도(~l$\times$$10^{-6}$)를 충족시킬 수 있으며, 이 경우 적조생물 소멸처리시간은 불과 10 sec 내외이므로 선박 안정수 처리문제와 함께 적조발생의 난문제를 해양동력학적으로 동시에 해결할 수 있는 효과적인 기술이다. 실험결과로부터 시간당 1 k톤의 활성물질을 발생하는 수산기활성제 제조장치의 경우, 약 4$\times$$10^2$ $\textrm{km}^2$/h의 적조해면을 처리할 수 있으며, 그 비용은 약 US$l,000 정도에 상당하므로, 적조에 따른 경제손실과는 비교될 수 없는 저렴하고 효과적인 방법이다. 활성물질의 생성시간과 가공시간은 불과 수십 $\mu\textrm{s}$ 및 수 sec 에 불과하므로, 1 kton/h 용량의 수산기활성제 제조장치의 환산소비동력은 약 200 kW이고, 장치의 체적은 10~30 ㎥의 공간으로 충분하므로, 소형선박으로 상당면적의 적조피해를 효과적으로 해결할 수 있다.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.6 no.1
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• pp.78-82
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• 2005

Display manufacturing process has adopted RCA cleaning, applying to larger area and coping with environmental issue for last ten years. However, the approaching concept of ozonized, hydrogenised, or electrolyzed water cleaning technologies is within RCA clean paradigm. In this work, only electrolyzed anode water was applied to clean particles and organics as well as metals based on Pourbaix concept, and as a test vehicle, MgO particles were introduced to prove the new concept. The electrolyzed anode water is very oxidative with high oxidation reduction potential (ORP) and low in pH of more than 900 mV and 3.1, respectively. MgO particles were immersed in the anode water and its weight losses due to dissolution were measured with time. Weight losses were in the ranges of 100 to 500 micrograms in 250 ml anode water depending on their ORP and pH. Therefore it was concluded that the cleaning radicals in the anode water was at least in the range of 1 to $5{\times}10^{20}$ ea per 250 ml anode water equivalent to $1{\times}10^{18} ea/cm^2$. Hence it can be assumed that the anode water applied to display cleaning from now on $1{\times}10^{10}$ to $1{\times}10^{15} ea/cm^2$ ranges of contaminants are being treated. In addition, it was observed that anode water did not develop micro-roughness on hydrophobic surface while it did on the native silicon oxide.

• Journal of Life Science
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• v.27 no.6
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• pp.708-725
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• 2017

Ionizing radiation is enough energy to interact with matter to remove orbital electrons, neutrons, and protons in the atom. Ionizing radiation like this leads to oxidizing metabolism that alter molecular structure through direct and indirect interactions of radiation with the deoxyribonucleic acid in the nucleus and cytoplasmic organelles or via products of cytoplasm radiolysis. These ionization can result in tissue damage and disruption of cellular function at the molecular level. Consequently, ionizing radiation-induced modifications of ion channels and transporters have been reported. When the harmful effects exceed those of homeostatic biochemical processes, induced biological changes persist and may be propagated to progeny cells. Also, Reactive oxygen species formed on the effect of ionizing radiation can get across into neighboring cells through the cell junctions that are responsible for intercellular chemical communication, and may there bring about changes characteristic to radiation damage. Depending on radiation dose, dose-rate and quality, these protective mechanisms may or may not be sufficient to cope with the stress. This paper briefly reviewed reports on ionization radiation effects on cellular level that support the concept of radiation biology. A better understanding of the biological effects of ionizing radiation will lead to better use of and better protection from radiation.

• Korean Journal of Materials Research
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• v.11 no.4
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• pp.251-257
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• 2001

A present semiconductor cleaning technology is based upon RCA cleaning, high temperature process which consumes vast chemicals and ultra Pure water(UPW). This technology gives rise to the many environmental issues, therefore some alternatives have been studied. In this study, intentionally contaminated Si wafers were cleaned using the electrolyzed water(EW). The EW was generated by an electrolysis equipment which was composed of anode. cathode, and toddle chambers. Oxidative water and reductive water were obtained in anode and cathode chambers, respectively. In case $NH_4$Cl electrolyte, the oxidation-reduction potential(ORP) and pH for anode water(AW) and cathode water(CW) were measured to be +1050mV and 4.7, and -750mV and 9.8, respectively. For cleaning metallic impurities, AW was confirmed to be more effective than that of CW, and the particle distribution after various particle removal processes was shown to be same distribution.