• Title/Summary/Keyword: 분자펌프

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Dry Etching of GaAs and AlGaAs in Diffuion Pump-Based Capacitively Coupled BCl3 Plasmas (확산펌프 기반의 BCl3 축전결합 플라즈마를 이용한 GaAs와 AlGaAs의 건식 식각)

  • Lee, S.H.;Park, J.H.;Noh, H.S.;Choi, K.H.;Song, H.J.;Cho, G.S.;Lee, J.W.
    • Journal of the Korean Vacuum Society
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    • v.18 no.4
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    • pp.288-295
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    • 2009
  • We report the etch characteristics of GaAs and AlGaAs in the diffusion pump-based capacitively coupled $BCl_3$ plasma. Process variables were chamber pressure ($50{\sim}180$ mTorr), CCP power ($50{\sim}200\;W$) and $BCl_3$ gas flow rate ($2.5{\sim}10$ sccm). Surface profilometry was used for etch rate and surface roughness measurement after etching. Scanning electron microscopy was used to analyze the etched sidewall and surface morphology. Optical emission spectroscopy was used in order to characterize the emission peaks of the $BCl_3$ plasma during etching. We have achieved $0.25{\mu}m$/min of GaAs etch rate with only 5 sccm $BCl_3$ flow rate when the chamber pressure was in the range of 50{\sim}130 mTorr. The etch rates of AlGaAs were a little lower than those of GaAs at the conditions. However, the etch rates of GaAs and AlGaAs decreased significantly when the chamber pressure increased to 180 mTorr. GaAs and AlGaAs were not etched with 50 W CCP power. With $100{\sim}200\;W$ CCP power, etch rates of the materials increased over $0.3{\mu}m$/min. It was found that the etch rates of GaAs and AlGaAs were not always proportional to the increase of CCP power. We also found the interesting result that AlGaAs did not etched at 2.5 sccm $BCl_3$ flow rate at 75 mTorr and 100 W CCP power even though it was etched fast like GaAs with more $BCl_3$ gas flow rates. By contrast, GaAs was etched at ${{\sim}}0.3{\mu}m$/min at the 2.5 sccm $BCl_3$ flow rate condition. A broad molecular peak was noticed in the range of $500{\sim}700\;mm$ wavelength during the $BCl_3$ plasma etching. SEM photos showed that 10 sccm $BCl_3$ plama produced more undercutting on GaAs sidewall than 5 sccm $BCl_3$ plasma.

Synthesis of Characterization of Poly(alkylene oxide) Copolyols by Catioinc Ring Opening Polymerization and Their Azide Functionalized Copolyols (양이온 개환중합에 의한 폴리알킬렌 옥사이드 코폴리올의 합성과 아지드화 코폴리올의 특성 연구)

  • Lee, Jae-Myung;Seol, Yang-Ho;Kwon, Jung-Ok;Jin, Yong-Hyun;Noh, Si-Tae
    • Applied Chemistry for Engineering
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    • v.31 no.3
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    • pp.267-276
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    • 2020
  • Poly(epichlorohydrin) copolyol series (PECH copolyols) were synthesized via cationic ring-opening copolymerization (ROCP) of oxirane-based monomers and effects of reaction temperature, solvent type, and initiator were studied. As a comonomer, two types of alkylene oxides were used, and polymerization conditions were conducted both with diethylene glycol (DEG) as an initiator in methylene chloride (MC) solvent and tripropylene glycol (TPG) in toluene solvent. In order to induce the active monomer (AM) mechanism in the ring-opening copolymerization reaction, the monomer was injected by an incremental monomer addition (IMA) method using a syringe pump, and the polymerization was performed at -5 ℃. PECH copolyol, a synthesized ephichorohydrin (ECH)-based copolyol, was converted to glycidyl azide-based energy-containing copolyol (GAP copolyol) by azadizing the ECH unit through a substitution reaction. It was confirmed that the synthesized azide copolyol had little effects on changes of the solvent and the initiator. Also, the molecular weight increased 500 after the azide reaction, thereby the GAP copolyol was polymerized as designed. As the content of the comonomer increased, both the Tg and viscosity tended to decrease due to the influence of the alkyl chain length. It is possible to fundamentally prevent CH3N3 amount produced in the azide reaction process, and it is expected that a large-scale process could be achievable.

$CF_4$/Ar를 이용한 유기고분자 기판의 펄스 직류전원 건식 식각

  • Kim, Jin-U;Choe, Gyeong-Hun;Park, Dong-Gyun;Jo, Gwan-Sik;Lee, Je-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.91-91
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    • 2010
  • 본 논문은 펄스 직류전원 (Pulse DC) 플라즈마 소스와 반응성 가스인 $CF_4$와 불활성 가스인 Ar를 혼합하여 산업에서 널리 사용되는 유기고분자인 Polymethylmethacrylate (PMMA), Polyethylene terephthalate (PET), 그리고 Polycarbonate (PC) 샘플을 건식 식각한 결과에 대한 것이다. 각각의 샘플은 감광제 도포 후에 자외선을 조사하는 포토레지스트 방법으로 마스크를 만들었다. 펄스 직류전원 플라즈마 시스템을 사용하면 다양한 변수를 줄 수 있다는 장점이 있다. 공정 변수는 Pulse DC Voltage는 300 - 500 V, Pulse DC reverse time $0.5{\sim}2.0\;{\mu}s$, Pulse DC Frequency 100~250 kHz 이었다. 변수 각각의 값이 높아질수록 고분자의 식각률이 높아졌다. 특히, PMMA의 식각률이 가장 높았으며 PET, PC 순이었다. 샘플 중 PC의 식각률이 가장 낮은 이유는 고분자 결합 중에 이중결합의 벤젠 고리 모양을 포함하고 있어 분자 결합력이 비교적 높기 때문으로 사료된다. 기계적 펌프만을 사용한 공정 전 압력은 30 mTorr이었다. 쓰로틀 밸브를 완전 개방한 상태에서 식각 공정 중 진공 압력은 $CF_4$ 가스유량이 늘어날수록 증가하였다. 식각률 역시 $CF_4$ 가스유량(총 가스 유량은 10 sccm)이 많을수록 증가함을 보여주었다 (PMMA: 10 sccm $CF_4$에서 330 nm/min, 3.5 sccm $CF_4$/6.5 sccm Ar에서 260 nm/min., PET: 10 sccm $CF_4$에서 260 nm/min, 3.5 sccm $CF_4$/6.5 sccm Ar에서 210 nm., PC: 10 sccm $CF_4$에서 230 nm, 3.5 sccm $CF_4c$/6.5 sccm Ar에서 160 nm). 이는 펄스 직류전원 플라즈마 식각에서 $CF_4$와 Ar의 가스 혼합비를 조절함으로서 고분자 소재의 식각률을 적절히 변화시킬 수 있다는 것을 의미한다. 표면 거칠기는 실험 후 표면단차 측정기와 전자 현미경 등을 이용하여 식각한 샘플의 표면을 측정하여 알 수 있었다. 실험전 기준 샘플 표면 거칠기는 PMMA는 1.53nm, PET는 3.1nm, PC는 1.54nm 이었다. 식각된 샘플들의 표면 거칠기는 PMMA는 3.59~10.59 nm, PET은 5.13~11.32 nm, PC는 1.52~3.14 nm 범위였다. 광학 발광 분석기 (Optical emission spectroscopy)를 이용하여 식각 공정 중 플라즈마 발광특성을 분석한 결과, 탄소 원자 픽 (424.662 nm)과 아르곤 원자 픽 (751.465 nm, 763.510 nm)의 픽의 존재를 확인하였다. 이 때 탄소 픽은 $CF_4$ 가스에서 발생하였을 것으로 추측한다. 본 발표를 통해 펄스 직류전원 $CF_4$/Ar의 고분자 식각 결과에 대해 보고할 것이다.

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Detection of Multidrug Resistance Using Molecular Nuclear Technique (분자핵의학 기법을 이용한 다약제내성 진단)

  • Lee, Jae-Tae;Ahn, Byeong-Cheol
    • The Korean Journal of Nuclear Medicine
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    • v.38 no.2
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    • pp.180-189
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    • 2004
  • Although the outcome of cancer patients after cytotoxic chemotherapy is related diverse mechanisms, multidrug resistance (MDR) for chemotherapeutic drugs due to cellular P-glycoprotein (Pgp) or multidrug-resistance associated protein (MRP) is most important factor in the chemotherapy failure to cancer. A large number of pharmacologic compounds, including verapamil, quinidine, tamoxifen, cyclosporin A and quinolone derivatives have been reported to overcome MDR. Single photon emission computed tomography (SPECT) and positron emission tomography (PET) are available for the detection of Pgp and MRP-mediated transporter. $^{99m}Tc$-MIBI and other $^{99m}Tc$-radiopharmaceuticals are substrates for Pgp and MRP, and have been used in clinical studies for tumor imaging, and to visualize blockade of PgP-mediated transport after modulation of Pgp pump. Colchicine, verapamil and daunorubicin labeled with $^{11}C$ have been evaluated for the quantification of Pgp-mediated transport with PET in vivo and reported to be feasible substrates with which to image Pgp function in tumors. Leukotrienes are specific substrates for MRP and $N-[^{11}C]acetyl-leukotriene$ E4 provides an opportunity to study MRP function non-invasively in vivo. SPECT and PET pharmaceuticals have successfully used to evaluate pharmacologic effects of MDR modulators. Imaging of MDR and reversal of MDR with bioluminescence in a living animal is also evaluated for future clinical trial. We have described recent advances in molecular imaging of MDR and reviewed recent publications regarding feasibility of SPECT and PET imaging to study the functionality of MDR transporters in vivo.

Identification of Antagonistic Bacteria, Pseudomonas aurantiaca YC4963 to Colletotri­chum orbiculare Causing Anthracnose of Cucumber and Production of the Antibiotic Phenazine-l-carboxylic acid (Colletotrichum orbiculare에 대한 길항세균 Pseudomonas aurantiaca YC4963의 분리 동정 및 항균물질 Phenazine-1-carboxylic acid의 생산)

  • Chae Hee-Jung;Kim Rumi;Moon Surk-Sik;Ahn Jong-Woong;Chung Young-Ryun
    • Korean Journal of Microbiology
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    • v.40 no.4
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    • pp.342-347
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    • 2004
  • A bacterial strain YC4963 with antifungal activity against Colletotrichum orbiculare, a causal organism of cucumber anthracnose was isolated from the rhizosphere soil of Siegesbeckia pubescens Makino in Korea. Based on physiological and biochemical characteristics and 16S ribosomal DNA sequence analysis, the bac­terial strain was identified as Pseudomonas aurantiaca. The bacteria also inhibited mycelial growth of several plant fungal pathogens such as Botrytis cinerea, Fusarium oxysporum and Rhizoctonia solani on PDA and 0.1 TSA media. The antifungal activity was found from the culture filtrate of this isolate and the active compound was quantitatively bound to XAD adsorption resin. The antibiotic compound was purified and identified as phenazine-l-carboxylic acid on the basis of combined spectral and chemical analyses data. This is the first report on the production of phenazine-l-carboxylic acid by Pseudomonas aurantiaca.