• Title/Summary/Keyword: 볼츠만 수송 방정식

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The comparison of electron transport coefficients of gases for analysis of multi-term approximation of the Boltzmann equation (다항근사 볼츠만 방정식의 타당성 검토를 위한 가스의 전자수송계수 비교)

  • Song, Byoung-Doo;Ha, Sung-Chul;Jeon, Byoung-Hoon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.05e
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    • pp.69-72
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    • 2003
  • This paper describes the information for the difference between two-term and multi-term approximation of the Boltzmann. In previous paper, we calculated the electron transport coefficients in pure Oxygen and Argon gases by using two-term approximation of Boltzmann equation. Therefore, in this paper, we calculated the electron transport coefficients(W and $N{\cdot}D_L$) in pure Oxygen and Argon gases for range of E/N values from 0.01~500[Td] at the temperature was 300[K] and pressure was 1[Torr] by using multi-term approximation of the Boltzmann equation by Robson and Ness, The results of two-term and multi-term approximation of the Boltzmann equation has been compared with the experimental data for a range of E/N.

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The analysis of electron transport coefficients in Xenon gas by multi-term approximation of the Boltzmann equation (볼츠만 다항근사 방정식을 이용한 Xe 가스의 전자수송계수 해석)

  • Jeon, Byoung-Hoon;Ha, Sung-Chul;Song, Byoung-Doo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.05e
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    • pp.73-76
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    • 2003
  • This paper describes the information for quantitative simulation of weakly ionized plasma. In previous paper, we calculated the electron transport coefficients in pure Xenon gas by using two-term approximation of Boltzmann equation. Therefore, in this paper, we calculated the electron transport coefficients(W, $N{\cdot}D_L$ and $D_{L/{\mu}}$) in pure Xenon gas for range of E/N values from 0.01 ~ 500[Td] at the temperature was 300[K] and pressure was 1[Torr] by using multi-term approximation of the Boltzmann equation by Robson and Ness, The results of two-term and multi-term approximation of the Boltzmann equation has been compared with the experimental data by L. S. Frost and A. V. Phelps for a range of E/N.

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The analysis of electron transport coefficients in $CF_4$ molecular gas by multi-term approximation of the Boltzmann equation (다항근사 볼츠만 방정식에 의한 $CF_4$ 분자가스의 전자수송계수 해석)

  • Jeon, Byung-Hoon;Park, Jae-June;Ha, Sung-Chul
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.141-144
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    • 2001
  • An accurate cross sections set are necessary for the quantitatively understanding and modeling of plasma phenomena. By using the electron swarm method. we determine an accurate electron cross sections set for objective atoms or molecule at low electron energy range. In previous paper, we calculated the electron transport coefficients in pure $CF_4$ molecular gas by using two-term approximation of the Boltzmann equation. And by using this simulation method. we confirmed erroneous calculated results of transport coefficients for $CF_{4}$ molecule treated in this paper having 'C2v symmetry' as $C_{3}H_{8}$ and $C_{3}F_{8}$ which have large vibrational excitation cross sections which may exceed elastic momentum transfer cross section. Therefore, in this paper, we calculated the electron transport coefficients(W and $ND_L$) in pure $CF_4$ gas by using multi-term approximation of the Boltzmann equation by Robson and Ness which was developed at lames-Cook university, and discussed an application and/or validity of the calculation method by comparing the calculated results by two-term and multi-term approximation code.

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The analysis of electron transport coefficients in CF$_4$ molecular gas by multi-term approximation of the Boltzmann equation (다항근사 볼츠만 방정식에 의한 CF$_4$분자가스의 전자수송계수 해석)

  • 전병훈;박재준;하성철
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.141-144
    • /
    • 2001
  • An accurate cross sections set are necessary for the quantitatively understanding and modeling of plasma phenomena. By using the electron swarm method, we determine an accurate electron cross sections set for objective atoms or molecule at low electron energy range. In previous paper, we calculated the electron transport coefficients in pure CF$_4$ molecular gas by using two-term approximation of the Boltzmann equation. And by using this simulation method, we confirmed erroneous calculated results of transport coefficients for CF$_4$ molecule treated in this paper having 'C2v symmetry'as C$_3$H$_{8}$ and C$_3$F$_{8}$ which have large vibrational excitation cross sections which may exceed elastic momentum transfer cross section. Therefore, in this paper, we calculated the electron transport coefficients(W and ND$_{L}$) in pure CF$_4$ gas by using multi-term approximation of the Boltzmann equation by Robson and Ness which was developed at James-Cook university, and discussed an application and/or validity of the calculation method by comparing the calculated results by two-term and multi-term approximation code.e.

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A Numerical Study on Phonon Spectral Contributions to Thermal Conduction in Silicon-on-Insulator Transistor Using Electron-Phonon Interaction Model (전자-포논 상호작용 모델을 이용한 실리콘 박막 소자의 포논 평균자유행로 스펙트럼 열전도 기여도 수치적 연구)

  • Kang, Hyung-sun;Koh, Young Ha;Jin, Jae Sik
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.41 no.6
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    • pp.409-414
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    • 2017
  • The aim of this study is to understand the phonon transfer characteristics of a silicon thin film transistor. For this purpose, the Joule heating mechanism was considered through the electron-phonon interaction model whose validation has been done. The phonon transport characteristics were investigated in terms of phonon mean free path for the variations in the device power and silicon layer thickness from 41 nm to 177 nm. The results may be used for developing the thermal design strategy for achieving reliability and efficiency of the silicon-on-insulator (SOI) transistor, further, they will increase the understanding of heat conduction in SOI systems, which are very important in the semiconductor industry and the nano-fabrication technology.