In situ growth of an epitaxial $CoSi_2$ layer on a Si(100) substrate by reactive chemical vapor deposition using a cobalt metallorganic source
(반응성 금속유기화학증착법에 의한 Si(100)기판 위에서 epitaxial $CoSi_2$ layer의 in situ 성장)
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- Proceedings of the Materials Research Society of Korea Conference
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- 1999.11a
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- pp.85-85
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- 1999