• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.10a
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• pp.258-258
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• 2003

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.5 no.1
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• pp.39-44
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• 2006

Ultra precision positioning mechanism has been widely used on semiconductor manufacturing equipments, optical spectrum analyzers and cell manipulations. Ultra precision positioning mechanism consists of several actuators, sensors, guides and control systems. Its efficiency depends on each performance of components. The object of this study is to design and analyze the micro stage that is one of the equipments embodied in ultra precision positioning mechanism. The micro stage consists of PZT actuators and flexure hinges. The structural design of flexure hinge is optimized by using RSM and FEM. The control factors concerned with the design of flexure hinges of stage and arms are optimized by minimizing the equivalent stress on the hinge and maximizing 1st natural frequency based on RSM and FEM simulation under various kinds of design conditions.

• Journal of the Korean Society for Precision Engineering
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• v.16 no.3 s.96
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• pp.154-163
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• 1999

In this paper, an ultra precision positioning system has been developed using dual servo loop control. For positioning system having long distance with ultra precision , the combination of global stage and micro stage was required. A servo motor based ball screw is used as a global stage and the piezo actuator as a micro stage. For the improvement of positional precision, the digital Chebyshev filter is implemented in the developed to dual servo system. Therefore, the positional repeatability has been achieved within ${\pm}$ 10 mm, and this technique can be applied to develop precision semiconductor equipments such as lithography steppers and probers.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.10a
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• pp.285-285
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• 2003

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1394-1397
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• 2005

The object of this study was to design of micro stage, which is one of the equipments embodied in ultra precision positioning mechanism. Design factors for micro stage were decided a roundness of hinge, a thickness of hinge, a thickness of stage, a length of arms and a clearance of division. To obtain the $1^{st}$ natural frequency and equivalent stresses, FEM simulation was performed using the table of orthogonal arrays and Taguchi method was used to determine the optimal design parameters. As results of this study, the size of 1st natural frequency and equivalent stresses on micro stage was influenced significantly by a thickness of hinge and a length of arm.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 1997.10a
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• pp.539-542
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• 1997

We present a micro-positioning stage that has minimized geometrical error and can drive in the 4-axis. This stage divided into two parts: $Z\theta_x$ $\theta_y$, motion stage and$\theta_z$ motion stage. These stages are constructed in flexure hinges, piezoelectric actuators and displacement scnsors. The dynamic model for each stage is obtained and their FE (finite element) models are made. Using the Lagrange's equation, the motion of equation is found. Through the parametric analysis and FE analysis, sensitiv~ty of the design parameters is executed. Finally, fundamental frequencies, maximum stress, and displacement sensitivity for each stage are obtained. We expect that this micro-positioning stage be a useful micro-alignment device for various applications.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.05a
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• pp.161-162
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• 2012

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2008.06a
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• pp.575-576
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• 2008

• Korean Journal of Air-Conditioning and Refrigeration Engineering
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• v.27 no.10
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• pp.552-557
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• 2015

The nanostereolithography process using a femtosecond laser has been shown to have strong merits for the direct fabrication of 2D/3D micro structures. In addition, a femtosecond laser provides efficient tools for precise micromachining owing to the advantages of a small and feeble heat effect zone. In this paper, we report an effective fabrication process of 3D micro optical and fluidic devices using nanostereolithography process composed of a dual stage system. Process conditions for additive and subtractive fabrication are examined. The Piezo stage scanning system is used for 3D micro-fabrication in unit area of sub-mm scale, and the motor stage is employed in fabrication on the scale of several mm. The misalignment between the pizeo- and motor- stages is revised through rotational transformation of CAD data in the unit domain. Here, the effectiveness of the proposed process is demonstrated through examples using 3D optical and microfluidic structures.

• Journal of the Korean Society for Precision Engineering
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• v.25 no.1
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• pp.122-129
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• 2008

Two-photon stereolithography is recognized as a promising process for the fabrication of three-dimensional (3D) microstructures with 100 nm resolution. Generally, beam-scanning system has been used in the conventional process of two-photon stereolithography, which is limited to the fabrication of micro-prototypes in small area of several tens micrometers. For the applications to 3D high-functional micro-devices, the fabrication area of the process is required to be enlarged. In this paper, large-area two-photon stereolithography (L-TPS) employing stage scanning system has been developed. Continuous scanning method is suggested to improve the fabrication speed and parameter study is conducted. An objective lens of high numerical aperture (N.A.) and high strength material were employed in this system. Through this work, 3D microstructures of $600*600*100\;{\mu}m$ were fabricated.