• Applied Chemistry for Engineering
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• v.27 no.4
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• pp.449-454
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• 2016

In this study, highly monodispersed porous carbon microcapsules with a hollow core were synthesized using polystyrene (PS) beads as a hard template. The surface of PS was first modified with polyvinylpyrollidone (PVP) for the easy attachment of inorganic silica sol. After coating the surface of PVP modified PS microspheres with SBA-16 sol, the carbon microcapsules with a hollow macroporous core were fabricated through reverse replication method by filling carbon sources in the mesopores of silica mold. The hollow carbons having a mesoporous shell structure and narrow particle size distribution could be obtained after the carbonization of carbon source and the dissolution of silica mold by HF solution. The mesoporous characteristics and electrochemical properties of hollow carbon microcapsules were characterized by XRD, SEM, TEM, $N_2$ adsorption/desorption analysis and cyclic voltammetry. They showed the high electric conductivity and capability for use as efficient electro-materials such as a supercapacitor.

• Proceedings of the International Microelectronics And Packaging Society Conference
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• 2001.11a
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• pp.205-208
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• 2001

본 연구에서는 소결온도와 치환원소에 따른 서클레이터/아이솔레이터용 YIG 페라이트의 미세구조와 전자기적 특성을 고찰하고자 하였다. Ca, V, In을 치환시킨 YIG 페라이트를 분무건조기를 사용하여 준구형 과립상태로 만들고, 일반적인 세라믹 제조 공정에 따라 12$50^{\circ}C$, 1275$^{\circ}C$, 130$0^{\circ}C$, 13$25^{\circ}C$에서 각각 소결하였다. 제조된 YIG 페라이트에 대한 기본 물성과 자기 특성을 밀도측정기, XRD, SEM, VSM, FMR(Ferromagnetic Resonance) 등을 이용하여 측정 분석하였다. $Y_{1.6}$C $a_{1.4}$F $e_4$ $V_{0.7}$I $n_{0.3}$ $O_{12}$ 조성의 YIG 페라이트에 대한 전자기적 특성 측정 결과 130$0^{\circ}C$에서 소결한 YIG 페라이트가 높은 포화자화(4$\pi$Ms) 값과 낮은 자기공명반치폭($\Delta$H)을 지닌 우수한 전자기적 특성을 나타내었다. 전자기적 특성을 나타내었다.나타내었다.다.

• Proceedings of the Korean Society of Laser Processing Conference
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• 2003.05a
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• pp.111-115
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• 2003

• Proceedings of the KIEE Conference
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• 2005.07c
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• pp.1939-1941
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• 2005

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.11a
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• pp.425-426
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• 2010

• Journal of the Institute of Electronics Engineers of Korea TC
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• v.37 no.3
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• pp.35-42
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• 2000

A cross-shaped microstripline-fed printed slot antenna having wide bandwidth Is presented in this paper. The proposed antenna is analyzed by using the Finite-Difference Time-Domain (FDTD) method. It was found that the bandwidth of the antenna depends highly on the length of the horizontal and vertical feedline as well as the offset position of the feedline. The maximum bandwidth of this antenna is from 1.975 GHz to 4.725 GHz, which is approximately 1.3 octave, for the VSWR $\leq$ 2. Experimental data for the return loss and the radiation pattern of the antenna are also presented. and they are in good agreement with the FDTD results.e FDTD results.

• Journal of the Institute of Electronics Engineers of Korea TC
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• v.44 no.11
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• pp.60-66
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• 2007

In this paper, a novel voltage-controlled oscillator (VCO) using the microstrip square open loop multiple split ring resonator (OLMSRR) is presented for reducing the phase noise property. The square-shaped multiple split ring resonator (MSRR) having the form of the microstrip square open loop is investigated to realize this property. Compared with the microstrip square open loop resonator and the microstrip square open loop split ring resonator (OLSRR) as well as the conventional microstrip line resonator, the microstrip square OLMSRR has the larger coupling coefficient value, which makes a higher Q value, and has reduced the phase noise of VCO. The VCO with 1.7V power suppIy has the phase noise of $-124.5\;{\sim}\;-122.0\;dBc/Hz$ @ 100 kHz in the tuning range, $5.746\;{\sim}\;5.84\;GHz$. The figure of merit (FOM) of this VCO is $-203.96\;{\sim}\;-201.6\;dBc/Hz$ @ 100 kHz in the same tuning range. Compared with VCO using the conventional microstrip line resonator, VCO using the microstrip square open loop resonator and VCO using microstrip square OLSRR, the phase noise property of VCO using the proposed resonator has been improved in 25.66 dB, 8.34 dB, and 4.5 dB, respectively.

• Journal of Advanced Marine Engineering and Technology
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• v.34 no.6
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• pp.840-845
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• 2010

In this paper, short-wavelength transmission line employing periodically arrayed capacitive devices (PACD) structures were developed for application to a development of miniaturized on-chip passive components on GaAs monolithic microwave integrated circuit (MMIC). The transmission line employing PACD structure showed a wavelength much shorter than conventional microstrip line. Concretely, the wavelength of the transmission line employing PACD structure was 8 % of the conventional microstrip line on GaAs substrate at 5GHz. And It was 38% of the microstrip line employing PPGM at 5GHz. It was recognized that the basic characteristics of the transmission line employing PACD structure were investigated for application to the miniaturized passive on-chip components.

• Journal of the Microelectronics and Packaging Society
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• v.12 no.2 s.35
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• pp.181-186
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• 2005

We fabricated thin films of polystyrene-block-poly(methyl methacrylate)(PS -b-PMMA) on the self-assembled monolayers(SAM) of 3-(p-methoxyphenyl)propyltrichlorosilane(MPTS) on silicon wafers. Cylindrical nanodomains of PMMA or PS were oriented perpendicular to the surface of silicon wafers due to the neutral affinity of the SAM to PS and PMMA blocks. By selective removal of the PMMA block with UV irradiation and washing, nanoporous films and nanorod assemblies were produced. The nanoporous film can be used for a nanolithographical mask.

• Journal of the Semiconductor & Display Technology
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• v.2 no.4
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• pp.37-40
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• 2003

We have studied micro-machining technologies to fabricate parts and sensors used in the semiconductor equipment. The studies were based on the silicon integrated circuit processes, and composed of the anisotropic etching of single crystal silicon to fabricate a membrane structure for hot and cold junctions in the infrared absorber. KOH and TMAH were used as etching solutions for the anisotropic wet etching for membrane structure formation. The etching characteristic was observed for the each solution, and etching rate was measured depending upon the temperature and concentration of the etching solution. The different characteristics were observed according to pattern directions and etchant concentration. The pattern was made to incline $45^{\circ}$ on the primary flat, and optimum etching property was obtained in the case of 30 wt% and $90^{\circ}C$ of KOH etching solution for the formation of the membrane structure.