A Study of Magnetically Confined Inductively Coupled Plasma Characteristics and Its Application to Oxide Etch for Optical Waveguide Fabrication (자장 강화된 유도결합형 플라즈마 특성 및 광도파로형 산화막 식각에의 응용)
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- Proceedings of the Materials Research Society of Korea Conference
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- 1997.10a
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- pp.100-100
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- 1997