• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2003.05a
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• pp.481-484
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• 2003

In this study, we fabricated the master metallic nano-stamper with nano pillar patterns to apply replication processes which is adequate for mass production. Master nano patterns with various hole diameters between 300 nm and 1000 nm was fabricated by e-beam lithography. After the seed layer was deposited on the master nano patterns using e-beam evaporation, the nickel was electroformed. In each step, the shape and surface roughness of their patterns were analyzed using SEM and AFM.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.10a
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• pp.493-494
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• 2006

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.06a
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• pp.89-90
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• 2009

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.10a
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• pp.671-672
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• 2009

• Proceedings of the Optical Society of Korea Conference
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• 2006.02a
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• pp.331-332
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• 2006

• Proceedings of the Korea Institute of Fire Science and Engineering Conference
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• 2006.04a
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• pp.280-285
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• 2006

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2004.05a
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• pp.202-206
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• 2004

본 연구에서는 고밀도로 백색 발광다이오드를 웨이퍼 상에 제작하기 위한 제조공정에 필요한 포토마스크를 제작하는 연구를 수행하였다. 발광다이오드 한 개의 패턴을 웨이퍼상에 연속적으로 배열하여 이를 병렬로 연결하는 금속배선을 고려하였다. AutoCAD의 DWG 파일로 캐드작업을 수행하여 이를 DXF 파일로 변환하였으며, 레이저빔으로 스켄하여 소다라임 유리판 위에 크롬을 식각함으로써 포토마스크를 제작하였다. 이는 기존에 제작된 개별칩 형태의 발광다이오드 제작공정을 집적공정화함으로써 웨이퍼상에서 전면 발광하는 조명광원의 구조를 갖는다. 또한 이를 활용하여 백색 발광다이오드 집적칩을 제작하려 한다.

• Proceedings of the Optical Society of Korea Conference
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• 2003.07a
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• pp.288-289
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• 2003

금속 박막 위의 알칸티올분자의 흡착에 의한 자기조립단분자막(SAMs)은 접착 방지, 마찰 저하 등의 기능을 가진 코팅층으로서의 응용과 분자 또는 생분자의 미세 구조물 형성을 위한 방법으로 널리 연구되어지고 있다. 이러한 연구 중에서 자기조림단분자막(SAMs)의 매우 얇은 두께(수 nm)의 특성을 활용하여 AFM tip Scratching Lithography 또는 알칸티올 포토패터닝(alkanethiol Photopatterning) 방법을 사용함으로써 microscale의 패턴을 형성하는 연구 결과가 많은 이들의 관심을 받아왔다. (중략)

• Journal of the Korean Vacuum Society
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• v.22 no.5
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• pp.262-269
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• 2013

Though focused ion beam (FIB) is one of the candidates to fabricate the nanoscale patterns, precision milling of nanoscale structures is not straightforward. Thus this poses challenges for novice FIB users. Optimal determination in FIB parameters is a crucial step to fabricate a desired nanoscale pattern. There are two main FIB parameters to consider, beam current (beam size) and dose (beam duration) for optimizing the milling condition. After fixing the dose, the proper beam current can be chosen considering both total milling time and resolution of the pattern. Then, using the chosen beam current, the metal nano hole structure can be perforated to the required depth by varying the dose. In this experiment, we found the adequate condition of $0.1nC/{\mu}m^2$ dose at 1 pA Ga ion beam current for 100 nm thickness perforation. With this condition, we perforated the periodic square array of elliptical nano holes.

• Korean Journal of Optics and Photonics
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• v.17 no.2
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• pp.203-206
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• 2006

Femtosecond laser-induced nano-patterning of an Al surface coated on a slide glass is reported in this paper. It was found that the period of the laser-induced nano-patterning was much dependent on the incident laser power and pulse number. Through finely adjusting the laser power and pulse number, uniform nano-patterns could be formed on the Al surface. It is based on the interference of the incident laser beam with some form of a surface scatted electromagnetic wave. It was also found that an Al oxide layer played an important role in forming the nano-patterning on the Al surface.