• Title/Summary/Keyword: 구조격자계

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A Study on TE Scattering by a Conductive Strip Grating Over Two Dielectric Layers (2개 유전체층 위의 완전도체띠 격자구조에 의한 TE 산란에 관한 연구)

  • Yoon, Uei-Joong
    • The Journal of the Institute of Internet, Broadcasting and Communication
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    • v.16 no.2
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    • pp.87-92
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    • 2016
  • In this paper, the solutions of TE(transverse electric) scattering problems by a conductive strip grating over two dielectric layers are analyzed by applying the PMM(point matching method) known as a numerical method of electromagnetic field. The boundary conditions are applied to obtain the unknown field coefficients, the scattered electromagnetic fields are expanded in a series of Floquet mode functions, and the conductive boundary condition apply to analysis of conducting strip. The most normalized reflected and transmitted powers having a sharp variations are scattered in direction of the other angles except incident angle. The numerical results for the normalized reflected and transmitted powers are analyzed by according as the width and spacing of conductive strip, incident angles, and the relative permittivity and thickness of the two dielectric layers. To confirm the validity of this paper, the numerical results of presented structure are shown in good agreement compared to those of the existing papers.

A Study on TE Scattering by a Conductive Strip Grating Between a Double Dielectric Layer (2중 유전체층 사이의 완전도체띠 격자구조에 의한 TE 산란에 관한 연구)

  • Yoon, Uei-Joong
    • The Journal of the Institute of Internet, Broadcasting and Communication
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    • v.17 no.2
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    • pp.83-88
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    • 2017
  • In this paper, TE(transverse electric) scattering problems by a conductive strip grating between a double dielectric layer are analyzed by applying the PMM(point matching method) known as a numerical method of electromagnetic fileld. The boundary conditions are applied to obtain the unknown field coefficients, the scattered electromagnetic fields are expanded in a series of Floquet mode functions, and the conductive boundary condition is applied to analysis of the conductive strip. The numerical results for the normalized reflected and transmitted power are analyzed by according as the width and spacing of conductive strip, the relative permittivity and thickness of the double dielectric layers, and incident angles. The most normalized reflected powers of the sharp variations in minimum values are scattered in direction of the other angles except incident angle. The numerical results for the presented structure of this paper are shown in good agreement compared to those of the existing papers.

Analysis of the Electromagnetic Scattering of Resistive Strip Grating with Uniform Resistivity on a Grounded Dielectric Layer - H-Polarization Case - (접지된 유전체 위의 저항율이 일정한 저항띠 격자구조에 대한 전자파 산란 해석 - H-분극인 경우 -)

  • Tchoi Young-Sun;Yang Seung-In
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.31 no.3A
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    • pp.321-327
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    • 2006
  • In this paper, when a H-polarized plane wave is incident on the grating consisting of uniform resistive strips, electromagnetic scattering is analyzed using the moment of methods (MoM). The current density of each resistive strip on a grounded dielectric plane is fixed by zero at both edges. To satisfy the condition at both ends of each resistive strip, the induced surface current density is expanded in a series of cosine and sine functions. The scattered electromagnetic fields are expanded in a series of floquet mode functions. The boundary conditions are applied to obtain the unknown current coefficients. According to the variation of the involving parameters such as strip width and spacing and angle of the incident field, numerical simulations are performed by applying the Fourier-Galerkin moment method. The numerical results of the normalized reflected power for resistive strips case for zero and several resistivities are obtained.

Analysis of E-polarized Plane Wave Scattering by a Tapered Resistive Strip Grating in a Grounded Double Dielectric Layer (접지된 2중 유전체 사이의 저항 띠 격자 구조에 의한 E-분극 전자파 산란 해석)

  • Tchoi, Young-Sun;Yang, Seung-In
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.18 no.6 s.121
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    • pp.656-663
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    • 2007
  • In this paper, when a E-polarized plane wave is incident on the grating consisting of tapered resistive strips, electromagnetic scattering is analyzed using the method of moments(MoM). The induced current density of each resistive strip in a grounded double dielectric layer is expected to blow up at both edges. To satisfy this, the induced surface current density is expanded in a series of Chebyshev polynomials of the second kind. The scattered electromagnetic fields are expanded in a series of Floquet mode functions. The boundary conditions are applied to obtain the unknown current coefficients. According to the variation of the involving parameters such as strip width and spacing and angle of the incident field, numerical simulations are performed by applying the Fourier-Galerkin moment method. The numerical results of the normalized reflected power for resistive strips case for several resistivities are obtained.

A Study on TE Scattering by a Resistive Strip Grating Between a Double Dielectric Layer Using PMM (PMM을 이용한 2중 유전체층 사이의 저항띠 격자구조에 의한 TE 산란에 관한 연구)

  • Yoon, Uei-Joong
    • The Journal of the Institute of Internet, Broadcasting and Communication
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    • v.19 no.4
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    • pp.21-26
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    • 2019
  • In this paper, TE(transverse electric) scattering problems by a resistive strip grating between a double dielectric layer are analyzed by using the PMM(point matching method) known as a numerical method of electromagnetic fileld. The boundary conditions are applied to obtain the unknown field coefficients, the scattered electromagnetic fields are expanded in a series of Floquet mode functions, and the resistive boundary condition is applied to analysis of the resistive strip. The numerical results for the normalized reflected and transmitted power are analyzed by according as the width and spacing of resistive strip, the relative permittivity and thickness of the double dielectric layers, incident angles, and uniform resisitivity. Typically, the reflected power for the conductive strip increased as the value of the relative dielectric constant increased, the reflected power for the resistive strip with uniform resistivity decreased as the value of the resisvivity increased. The numerical results for the presented structure of this paper are shown in good agreement compared to those of the existing papers.

A Study on H-polarized Electromagnetic Scattering by a Resistive Strip Grating Between a Grounded Double Dielectric Layer (접지된 2중 유전체층 사이의 저항띠 격자구조에 의한 H-polarized 전자파 산란에 관한 연구)

  • Yoon, Uei-Joong
    • The Journal of the Institute of Internet, Broadcasting and Communication
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    • v.22 no.1
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    • pp.29-34
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    • 2022
  • In this paper, thr H-polarized scattering problems by a resistive strip grating in a grounded double dielectric layer are analyzed by applying the PMM(point matching method) known as a numerical method of electromagnetic fileld. The boundary conditions are applied to obtain the unknown field coefficients, the scattered electromagnetic fields are expanded in a series of Floquet mode functions, and the resistive boundary condition is applied to analysis of the resistive strip. The %error of the convergence of the reflected power according to the relative permittivity of the dielectric layer and the size of the number of rows in the square matrix was compared, as the size of the number of rows in the square matrix increased, the accuracy of the reflected power increased. As the resistivity of the resistive strip decreased, the thickness of the dielectric layers decreased, and the relative permittivity of the dielectric layers increased, the reflected power increased. The numerical results for the presented structure of this paper having a grounded double dielectric layer are shown in good agreement compared to those of the existing papers.

Solution of TE Scattering by a Resistive Strip Grating Between a Double Dielectric Layer Using FGMM (FGMM을 이용한 2중 유전체층 사이의 저항띠 격자구조에 의한 TE 산란 해)

  • Uei-Joong Yoon
    • The Journal of the Convergence on Culture Technology
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    • v.9 no.3
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    • pp.619-624
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    • 2023
  • In this paper, TE(transverse electric) scattering problems by a resistive strip grating between a double dielectric layer are analyzed by using the FGMM(fourier galerkin moment method) known as a numerical method of electromagnetic fileld. The boundary conditions are applied to obtain the unknown field coefficients, the scattered electromagnetic fields are expanded in a series of Floquet mode functions, and the resistive boundary condition is applied to analysis of the resistive strip. In order to deal with the problem of the double dielectric layer, numerical calculation was performed only when the thickness and relative permittivity of the dielectric layers had the same value. Overall, as the resistivity of the uniform resistivity increased, the current density induced in the resistive strip decreased, the reflected power decreased, and the transmitted power relatively increased. The numerical results of the structure proposed in this paper are shown in good agreement compared to the results of PMM, a numerical analysis method of the existing paper.

Solution of E-polarized Scattering by a Resistive Strip Grating Between a Double Dielectric Layer Using FGMM (FGMM을 이용한 2중 유전체층 사이의 저항띠 격자구조에 의한 TM 산란 해)

  • Uei-Joong Yoon
    • The Journal of the Convergence on Culture Technology
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    • v.9 no.3
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    • pp.641-646
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    • 2023
  • In this paper, TM(transverse magnetic) scattering problems by a resistive strip grating between a double dielectric layer are analyzed by using the FGMM(fourier galerkin moment method) known as a numerical method of electromagnetic fileld. The boundary conditions are applied to obtain the unknown field coefficients, the scattered electromagnetic fields are expanded in a series of Floquet mode functions, and the resistive boundary condition is applied to analysis of the resistive strip. Overall, as the uniform resistivity of the resistive strip increased, the size of the current density induced in the resistance band decreased, the reflected power decreased, and the transmitted power increased. In addition, As the thickness of the dielectric layer increased, the reflected power increased and the transmitted power relatively decreased. The numerical results of the structure proposed in this paper are shown in good agreement compared to the results of PMM, a numerical analysis method of the existing paper.

Effect of TiAIN-based Nanoscale Multilayered Coating on the Cutting Performance of WC-Co Insert (WC-CO 인써트의 절삭 성능에 미치는 TiAIN계 나노 다층막 코팅의 영향)

  • Lim Hee-Youl;Park Jong-Keuk;Kim Kyung-Bae;Choi Doo-Jin;Baik Young-Joon
    • Journal of the Korean Vacuum Society
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    • v.15 no.1
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    • pp.110-116
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    • 2006
  • The mechanical property and cutting performance of the cutting tools coated with nanoscale nyktukatered nitride film have been investigated. $Ti_{0.54}Al_{0.46}N-CrN$ and $Ti_{0.84}Al_{0.16}N-NlN$ systems, which showed super-lattice in nanoscale multilayered coating, were deposited on WC-Co insert by UBM sputtering, The superlattice coatings with different bilayer periods were manufactured by controlling deposition parameters. The superlattice formation and hardness of the nanoscale multilayered nitride film and the cutting performance of the insert coated with the film were examined. The hardness and cutting performance were dependent on the bilayer periods of the coatings. The flank wear of the inserts with superlattice coatings were decreased over $20\%$, compared to those of commonly used cutting tools coated with TiAIN single phase.

High Voltage Electron Microscopy of Structural Patterns of Plastid Crystalline Bodies in Sedum rotundifolium (HVEM에 의한 둥근잎꿩의 비름 (Sedum rotundifolium L.) 색소체의 결정체 구조)

  • Kim, In-Sun
    • Applied Microscopy
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    • v.36 no.2
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    • pp.73-82
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    • 2006
  • Major contributions has been made in cellular ultrastructure studies with the use of high voltage electron microscopy (HVEM) and tomography. Applications of HVEM, accompanied by appropriate image processing, have provided great improvements in the analysis of three-dimensional cellular structures. In the present study, structural patterns of the crystalline bodies that are distinguished in mesophyll plastids of CAM-performing Sedum rotundifolium L., have been investigated using HVEM and tomography. Tilting, and diffraction pattern analysis were performed during the investigation. The titlting was performed at ${\pm}60^{\circ}\;with\;2^{\circ}$ increments while examining serial sections ranging from 0.125 to $1{\mu}m$ in thickness. The young plastids exhibited crystalline inclusion bodies that revealed a peculiar structural pattern. They were irregular in shape and also variable in size. Their structural attributes affected the plastid morphology. The body consisted of a large number of tubular elements, often reaching up to several thousand in number. The tubular elements typically aggregated to form a fluster The elements demonstrated either a parallel or lattice arrangement depending on the sectioning angle. The distance between the elements was approximately 20nm as demonstrated by the diffraction analysis. HVEM examination of the serial sections revealed an occasional fusion or branching of elements within the inclusion bodies. Finally, a three-dimensional reconstruction of the plastid crystalline bodies has been attempted using two different image processing methods.