• 제목/요약/키워드: 광조형공정

검색결과 24건 처리시간 0.027초

광조형 시스템의 리코팅 공정 개선 (Improvement for Recoating Process of Stereolithography System)

  • 이은덕;심재형;안규환;백인환
    • 한국공작기계학회논문집
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    • 제12권1호
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    • pp.16-23
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    • 2003
  • Keeping the layer thickness constant is very essential for improving the shape accuracy in the stereolithography process. The layer thickness is created by recoating process, and also affected by recoating parameters such as blade speed and thickness. The created layer in this process can determine the whole accuracy of the entire parts. The aim of this paper is to improve the accuracy of the layer thickness by adjusting the recoating process parameters. Several experiments with different recoating conditions are Performed to find the optimal recoating parameters that produce the most accurate layer thickness. The effective recoating method is suggested by measuring and analyzing the cured layer thickness.

다구찌 방법을 이용한 공정변수의 최적화

  • 이수호;박원식;조형석
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 1995년도 추계학술대회 논문집
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    • pp.907-910
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    • 1995
  • Though SLA(Stereolithography Apparatus) is being recognized as an innovative technology, it still can not be used to fully practical applications since it lacks of dimensional accuracy compared to conventional processes. In SLA, the accuracy of cured part depends upon the set of process parmeters. In order to improve the accuracy of SLA, this paper quantitatively evaluates how largely each process parameter of SLA contributes to the part accuracy and estimates the optimal set of process parameter which minimizes the dimensional errors of the test part, "letter-H" part. For this purpose, we use ANOVA(analysis of variance) and S/N(signal-to-noise)ratio of Taguchi method.hi method.

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SU-8 레진을 이용한 이광자 흡수 광조형 공정에서 고강성 3 차원 마이크로 형상 제작을 위한 공정 변수 분석 (Study on Process Parameters of a SU-8 Resin in Two-photon Streolithography for the Fabrication of Robust Three-dimensional Microstructures)

  • 손용;임태우;이신욱;공홍진;박상후;양동열
    • 한국정밀공학회지
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    • 제25권1호
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    • pp.130-137
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    • 2008
  • Two-photon stereolithography (TPS) is recognized as a useful process for the fabrication of three-dimensional microstructures. Recently, the need for a two-photon curable resin with high strength increases as 3-D moicrostructures of high aspect ratio or large scale of several hundreds micrometers are required for applications of nano/micro devices in IT/BT. In this work, process parameters of TPS employing the SU-8 which is a representative two-photon curable resin with high strength have been studied for the precise fabrication of 3-D microstructures with high strength. The pre-baking and post-baking processes are studied and the parameter study of the SU-8 in TPS is conducted. Through this work, very small roughness of 12 nm and the minimum aspect ratio of ${\sim}1$ which provides a precise accumulation of layers could be obtained. Using the conditions studied in this work, some 3-D examples are fabricated.

마이크로광조형법을 이용한 미세삼차원구조물의 제조공정 중 형상정밀도 및 경화특성에 관한 연구 (Shape accuracy and curing characteristics of photopolymer during fabrication of three-dimensional microstructures using microstereolithography)

  • 정대준;김성훈;정성호
    • 한국정밀공학회지
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    • 제21권1호
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    • pp.46-50
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    • 2004
  • The curing characteristics of a liquid photopolymer during microstereolithography and the shape accuracy of thereby fabricated microstructures were investigated experimentally. A He-Cd laser with a wavelength of 442nm and a photopolymer consisted of a commercial resin from SK chemical and a photoinitiat or were used for the experiment. By varying the laser beam power and scanning speed of the focused laser beam, minimum curing thickness of 50 ${\mu}ㅡ$ was obtained. The distortion of solidified structure due to adhesion force was measured and the optimum fabrication conditions were determined. Also, the feasibility of direct fabrication of three-dimensional microstructures by Super IH process was examined.

광조형을 이용한 마스크리스 패턴형성에 관한 연구 (A Study of Mastless Pattern Fabrication using Stereolithography)

  • 정영대;조인호;손재혁;임용관;정해도
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2002년도 춘계학술대회 논문집
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    • pp.503-507
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    • 2002
  • Mask manufacturing is a high COC and COO process in developing of semiconductor devices, because of the mass production tool with high resolution. Direct writing has been thought to be one of the patterning method to cope with development or small-lot production of the device. This study focused on the development of the direct, mastless patterning process using stereolithography tool for the easy and convenient application to micro and miso scale products. Experiments are utilized by three dimensional CAD/CAM as a mask and photo-curable resin as a photo-resist in a conventional stereo-lithography apparatus. Results show that the resolution of the pattern was achieved about 300 micron because of complexity of SLA apparatus settings, inspite of 100 micro of inherent resolution. This paper concludes that photo resist and laser spot diameter should be adjusted to get finer patterns and the proposed method is significantly feasible to mastless and low cost patterning with micro and miso scale.

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광조형물의 표면 조도 향상에 관한 연구 -파라핀 코팅과 연삭 후처리 공정 이용- (A Study on Improving the Surface Roughness of Stereolithography Parts -Using Paraffin Coating and Grinding Postprocess-)

  • 안대건;김호찬;이석희
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2001년도 춘계학술대회 논문집
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    • pp.45-48
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    • 2001
  • SL(Stereolithogrphy) part is made by piling up thin layers which causes the stair stepping effect at the surface of SL parts. This effect causes excessive surface roughness and requires additional postprocess finishing such as abrasive basting which is detrimental to part geometry and time consuming. Hence paraffin coating and grinding postprocess is proposed to raise the surface quality of SL part. The paraffin which has suitable properties for the proposed postprocess is coated all over the part surface. By grinding the thin layer of coated on the SL part only, the surface roughness can be improved without any damage on the part. From the experimental result, It is verified as very practical for die casting with silicon rubber mold.

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SL 광조형 공정에서 고전적층이론을 적용한 곡률 변형 예측 (Prediction of Curl Distortion using Classical Lamination Theory in Stereolithography)

  • 김기대;이재곤
    • 한국정밀공학회지
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    • 제22권11호
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    • pp.210-217
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    • 2005
  • A curl distortion induced by shrinkage during stereolithography polymerization process is analyzed with the classical lamination theory. Test parts of different layer thickness and part thickness are manufactured and their deformations are measured with CMM. Curl distortion is generated by the differential shrinkage of the layers, where the total shrinkage includes the shrinkages due to solidification and the change of temperature. It is shown that the curl distortion increases exponentially with decreasing the total thickness of the part, whose smaller layer thickness induces larger curl distortion. It is verified that only a part of the total shrinkage plays a role in generating the curl distortion.

SL 광조형 공정에서 제작물 치수와 지지대 구조가 형상오차에 미치는 영향 (Effects of Dimension of Part and Structure of Supports on the Shape Error in Stereolithography Process)

  • 김기대
    • 한국공작기계학회논문집
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    • 제15권3호
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    • pp.32-38
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    • 2006
  • During stereolithography processes, the shape errors such as curl distortion and distortion of side face are generated due to the shrinkage of liquid resins. In this study, the effects of dimension of part and structure of supports on the shape error are examined. Cubic specimens which have different thicknesses are manufactured and their deformations are measured with CMM. Thicker part generates smaller curl distortion of top face and larger of bottom face. Also thicker part generates larger distortion of side face until part thickness increases to about 20mm. Larger stiffness of supports which is obtained by shorter spacing of the supports and line type contact instead of point type contact generates smaller shape error of the part.