• Journal of the Korean Vacuum Society
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• v.6 no.2
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• pp.159-164
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• 1997

We have studied initial oxidation of the alkali metal(AM)/Si(111) surface using X-ray photoelectron spectroscopy(XPS) and reflection high energy electron diffraction(RHEED) at room temperature(RT) and high temperature(HT)(300~50$0^{\circ}C$). The oxidation of the Si(111)7$\times$7 surface was promoted by the adsorption of 1 momolayer(ML) AM, whereas no promotion occurred for submonolayer(<0.5 ML) adsorbed Si(111)7$\times$7 surface at RT. O Is core level spectra were measured with increasing oxygen exposure. It was found that the oxygen adsorbed on the Si(111)7$\times$7-AM surface have two different bond configuration, Si-O and Am-O, respectively. From these results, we discussed the role of AM-O bonding in the promoted oxidation. At HT(300~50$0^{\circ}C$), the AM-adsorbed surface became very inactive with the structural transformation to the 3$\times$1-AM. We present the results of the oxidation of the Si(111)3$\times$1-AM(Na, K, Cs) surface.

• Journal of the Korean Magnetics Society
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• v.16 no.1
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• pp.92-97
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• 2006

A study of the adsorption site of CO in the Ni(111)$(2\times2)$-O/CO coadsorbed phase over different sample preparation temperatures revealed that the atop site is favoured. The Ni-C spacing is given by $1.77\pm0.01\;{\AA}$. A study of the adsorption site of Co in the Ni(111)$(2\times2)$-O/CO coadsorbed phase over different sample preparation temperatures revealed that the atop site is favoured. The Ni-C spacing is given by $1.77\pm0.01\;{\AA}$. The data from the sample prepared at 265 K showed atop sites, which is well consistent with vibrational spectroscopy, whilst the data from the low temperature preparation appears the mixture of atop and hop $(35\%)$. The occupation of hop hollow sites is probably due to an incorrect pre-coverage of atomic oxygen (different from 0.25ml). Similar observation of site mixture also found in recent high resolution XPS measurements using C 1s and O 1s chemical shifts.

• Journal of the Korean Magnetics Society
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• v.3 no.1
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• pp.48-55
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• 1993

We report the photoemission (PES) studies for the Co/Pd multilayter. The Co 3d PES spectrum of Co/Pd exhibits two interesting features, one near the Fermi energy, $E_{F}$, and another at ~2.5 eV below $E_{F}$. The Co 3d peak near $E_{F}$ of Co/Pd is much narrower than that of the bulk Co, consistent with the enhanced Co magnetic moment in Co/Pd compared to that in the bulk Co. The Co 3d feature at ~-2.5 eV resembles the Pd valence band structures, which suggests a substantial hybridization between the Co and Pd sublayers. The Co 3d PES spectrum of Co/Pd is compared with the existing band structures, obtained using the local spin density functional calculations. A reasonable agreement is found concerning the bandwidth of the occupied part of the Co 3d band, whereas a narrow Co 3d peak near $E_{F}$ seems not to be described by the band structure calculations.

• Journal of the Korean Vacuum Society
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• v.22 no.3
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• pp.138-143
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• 2013

Recently, ZnO nanoparticles have been studied in various application fields due to their physico-chemical properties. In this study, we have researched on the ZnO photocatalytic activity by redox reaction. ZnO nanoparticles have low photocatalytic activity in comparison with $TiO_2$ nanoparticles because it has the disadvantage that the formation of $Zn(OH)_2$ in water solvent. Therefore, we were synthesized ZnO nanoparticles by spray-pyrolysis method, and then studied on stability in water solvent. At the results, the water treated-ZnO nanoparticles showed higher photocatalytic activity than non-treated ZnO nanoparticles because molecular $H_2O$ was increased onto the ZnO surface under the water treatment. Also, we confirmed that the ZnO nanoparticles synthesized by spray-pyrolysis method is very stable in the water solvent.

• Korean Journal of Materials Research
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• v.2 no.1
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• pp.35-42
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• 1992

Thermal behavior of residue and damaged layer formed by reactive ion etching (RIE) in $CHF_3/C_2F_6$ were investigated using X-ray photoelectron spectroscopy(XPS) and secondary ion mass spec-trometry(SIMS) techniques. Decomposition of polymer residue film begins at $200^{\circ}C$ and above $400^{\circ}C$ carbon compound as graphite mainly forms by in-situ resistive heating. It reveals that thermal decomposition of residue can be completed by rapid thermal anneal treatment above $800^{\circ}C$ under nitrogen atmosphere and out-diffusion of carbon and fluorine of damaged layer is observed.

• Journal of the Korean Vacuum Society
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• v.7 no.3
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• pp.169-175
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• 1998

The plasma etching of polysilicon was performed with the HBr/$Cl_2/He-O_2$ gas mixture. The residual layers after photoresist strip were investigated using x-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). The etch residue was identified as silicon oxide deposited on the top of the patterned polysilicon. In order to clarify the formation mechanism of the etch residue, the effects of various gas mixtures such as $Cl_2/He-O_2$and HBr/$Cl_2$were investigated. We found that the etch residue is well formed in the presence of oxygen, suggesting that the etch residue is caused by the reaction of oxvgen and non-volatile silicon halide compounds. Wet cleaning and dry etch cleaning processes were applied to remove the polysilicon etch residue, which can affect the electrical characteristics and further device processes. XPS results show that the wet cleaning is suitable for the removal of the etch residue.

• Journal of the Korean Vacuum Society
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• v.20 no.4
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• pp.252-257
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• 2011

The ring formation and electronic properties of furan adsorbed on graphene layers grown on 6H-SiC (0001) has been investigated using atomic force microscopy (AFM), near edge X-ray absorption fine structure (NEXAFS) spectra for the C K-edge, and core level photoemission spectroscopy (CLPES). Moreover, we observed that furan molecules adsorbed on graphene could be used for chemical functionalization via the lone pair electrons of the oxygen group, allowing chemical doping. We also found that furan spontaneously form rings with one of three different bonding configurations and the electronic properties of the ring formed by furan on graphene can be described using by AFM, NEXAFS and CLPES, respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.191-191
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• 1999

Extended X-ray Absorption Fine Structure (EXAFS)는 일반적으로 널리 사용하는 X선 회절분광기로 분석하기 힘든 chemical 또는 biological system의 structural analyses에 매우 유용한 분석방법이다. 특히 세라믹이나 유전체 비정질 재료의 미세 원자 구조에 관한 정보를 얻는데는 가장 강력한 분석방법중의 하나로 알려져 있다. 현재까지 대부분의 EXAFS 실험은 방사광 가속기를 이용하여 수행하였다. 그런데 신제품 개발의 순환주기가 급속하게 단축되는 현실적인 문제에 부응하기 위하여 실험실에서 EXAFS 실험을 수행할 수 있는 system을 개발하게 되었다. 개발한 XIEES 장비는 rotating anode 형의 18kW X-ray source, Optical system, Detection system, Stepping motor control system, vacuum system, Utility 등으로 구성하였다. Optical system에서의 6개의 Johanson type monochromator를 사용하여 분석가능한 x-ray energy range를 480eV에서 41keV까지 구현하였다. 이는 산소에서 우라늄까지 분석이 가능함을 의미하는 것으로, 산화물 연구에 많이 활용할 것으로 기대한다. XIEES는 투과 및 형광 X-ray를 검출할 수 있는 기능과 X-ray에 의해 여기 되는 모든(광전자, Aiger 전자, 이차전자)들을 검출할 수 있는 기능을 갖추고 있는데 이를 Total Electron Yield 측정이라고 한다. Total Electron Yield 측정은 박막 시료와 같이 투과가 되지 않는 시료를 분석할 뿐만 아니라, 경원소 분석, 낮은 에너지에서 흡수 edge가 나타나는 L-edge 측정을 통한 전자 구조 분석 등에 유용한다. 실험실용 XIEES 장비는 방사광가속기에 비해 x-ray flux가 크게 뒤지는 문제와 Total Electron Yield를 측정하는 데 있어서 source에서 나오는 x-ray beam이 진공용기 안에서 산란되어 이차전자를 여기하고 이 이차전자들이 전자검출기에 유입되어 측정에 영향을 미치는 background 문제 등이 있다. 이 두 가지 문제를 해결하기 위하여 Capillary tube를 사용하였다. 본 연구에서는 실험실용 XIEES 장비를 소개하고 이를 이용하여 Cu standard 시료에서 측정한 EXAFS 결과와 Capillary tube를 사용하여 얻은 x-ray flux 증진 및 background 제거 효과에 대해서 발표한다.

• Journal of the Korean Vacuum Society
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• v.5 no.1
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• pp.14-24
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• 1996

We have investigated atomic and electronic structures of a clean Pd(111) surface using low energy electron diffraction (LEED) and angle-resolved photoemission spectroscopy (ARPES). A typical clean LEED pattern with a 3-fold symmetry has been observed, corresponding to that for an fcc (111) surface. ARPES measurements have been performed along the $\Gamma-M,\Gamma-K,\Gamma-M$TEX> symmetry lines, from which the experimental band structure of Pd(111) has been determined. The experimental band structure and work function of Pd(111) surface are found to agree well with the calculated band structure of bulk Pd and the calculated work function of Pd(111), respectively. However, the peak positions in the experimental band structure are located closer to the Fermi level than in the theoretical band structure by 0.1~0.8 eV, depending on the $\kappa$-points in the Brillouin zone. In additin, the experimental band widths are narrower than the theoretical band widths by about 0.5eV. The effects of the localized surface Pd 4d states and the Coulomb interaction between Pd 4d bulk electrons have been discussed as possible origins of such discrepancies between experiment and theory.

• Fashion & Textile Research Journal
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• v.15 no.2
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• pp.286-293
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• 2013

This study investigates the attachment of glycyrrhizin to fabric using an X-ray photoelectron spectrophotometer( XPS). XPS spectra analysis showed that carbon content on treated fabrics with 0.2% glycyrrhizin increased to 2.699% for silk, 2.829% for nylon, 1.505% for cotton, respectively. The results show that glycyrrhizin is absorbed on treated fabrics. The glycyrrhizin extraction method makes radix glycyrrhizae powder 10g treat the first and the second treatment with ethanol, remove impurities on $75^{\circ}C$; subsequently, it is treated for 10 hours with ethanol 75% on $85^{\circ}C$ and lyophilizated. As the result, glycyrrhizin is extracted 1.7g in GL-I, 1.1 g in GL-II. As the result of abstracting glycyrrhizin with two methods, pure glycyrrhizin was abstracted 45.9% in GL-I, 74.9% in GL-II. GL-I, GL-II; in addition, glycyrrhizin( Japan) on TLC plate was separated in Rf 0.6. By GL-II extract method, this experiment obtained glycyrrhizin 15 g treated in a bath ratio set to 1: 100. Silk fabric was treated at $80^{\circ}C$, 60 min. in, nylon fabric $10^{\circ}C$, 70 min., and cotton fabric $30^{\circ}C$, 80 min.; subsequently, silk, nylon, cotton fabrics showed a 99.9% antibacterial activity for Staphylococcus aureus and Klebsiella pneumoniae.