• Title/Summary/Keyword: 광경화

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Synthesis and Photopolymerization Kinetics of Polyether Urethane Methacrylate Oligomers (폴리에테르 우레탄 메타아크릴레이트 올리고머의 합성 및 광중합 동역학)

  • Oh, Sungae;Park, Kwangbae;Park, Chanik;Bae, Won
    • Clean Technology
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    • v.12 no.1
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    • pp.19-25
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    • 2006
  • In this study, photo-cuarable urethane methacrylate oligomers were synthesized from polyether type polyol (PP series, GP series), isocyanate (2,4-toluene diisocyanate) and hydroxy acrylate (hydroxypropyl methacrylate). We measured basic property including color, viscosity and refractive index of resulting urethane methacrylate. Also we measured tensile strength, elongation, and Young's modulus after photo curing. Photo curing speed was investigated using photo-DSC (TA instrument). In the case of similar polyol structure, as the molecular weight of polyol is increased, tensile strength, Young's modulus, curing rate were decreased, but elongation was increased. As the number of functionality of urethane methacrylate oligomer is increased, tensile strength, Young's modulus, curing rate were increased, but elongation was decreased.

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Photopolymerization Kinetics of Urethane-acrylate Oligomer (우레탄-아크릴레이트 올리고머의 광경화 거동)

  • Kim, In-Beom;Song, Bong Jin;Lee, Myung Cheon
    • Applied Chemistry for Engineering
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    • v.17 no.1
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    • pp.33-36
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    • 2006
  • The kinetics of photopolymerization of urethane-acrylate oligomer which has many applications in photopolymerizable adhesives was analysed to investigate the influence of polymerization temperature and functionality of oligomer using the autocatalytic model. It was revealed that the maximum polymerization rate decreased as the polymerization temperature increased. The reaction rate constant, k, showed little change with the increase in polymerization temperature, while exponents m and n exhibited an increase. These results could be related to the diffusion and mobility restriction of reactive species during the cross-linking reaction. The decrease in photopolymerization rate with increase of temperature was mainly controlled by the reaction order n.

Utilization of 3D CAD and 3D Printer and UV Curavle resin Casting Defect (3D CAD, 3D 프린터 활용과 광경화수지 주물 결함)

  • Ryu, Ki-Hyu;Seo, Jin-Hwan
    • Journal of the Korea Convergence Society
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    • v.8 no.3
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    • pp.169-176
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    • 2017
  • Casting process includes wax pattern, investment, dewaxing, curing, casting, etc., and each single process is important to achieve a good result. Since 2000, 3D printers have been developed and widely used; as more prefer UV Curavle resin method over wax method, resultant casting defects have become worse. To resolve such problem, preceding research revealed casting defects of existing wax method. In particular, defects of UV Curavle resin method showed difference in investment, dewaxing, deresinating and curing compared to the existing one. Accordingly, results were presented through casting tests; especially, a temperature rising curve only for UV Curavle resin was shown rather than one for the existing method. Lastly, this research classified those not available with direct casting and suggested mold manufacturing. This research is expected to be useful for 3D printer users or those who would conduct direct casting with UV Curavle resin.

Investigating the Effect of Photoinitiator Types and Contents on the Photocuring Behavior of Photocurable Inks and Their Applications for Etching Resist Inks (광개시제 종류 및 함량에 따른 광경화형 잉크의 광경화 특성과 인쇄회로기판용 에칭 레지스트 소재로의 적용성 연구)

  • Bo-Young Kim;Subin Jo;Gwajeong Jeong;Seong Dae Park;Jihoon Kim;Eui-Keun Choi;Myong Jae Yoo;Hyunseung Yang
    • Applied Chemistry for Engineering
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    • v.34 no.4
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    • pp.444-449
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    • 2023
  • As electronic devices become smaller and more integrated, the demand for manufacturing thin, flexible printed circuit boards (FPCBs) has increased. Although FPCBs are conventionally manufactured by a photolithography method using dry film resist, this process is complicated, and the mask is specifically designed to obtain the precision of the desired circuit line width. In this regard, manufacturing FPCBs with fine patterns through the direct printing method of photocurable inks has gained growing attention. Since the manufacturing process of FPCBs is based on the direct printing method that includes etching and stripping processes utilizing acid and basic chemicals, controlling the adhesion strength, the etching resistance, and the strippability of photocured inks has drawn a lot of attention for the fabrication of fine patterns through photocurable inks. In this study, acrylic ink with various types and contents of the photoinitiator was prepared, and the curing behavior was analyzed. Also, the adhesion strength, etching resistance, and strippability were analyzed to evaluate the applicability of developed photocurable etching resist inks.

Synthesis and Characteristics of Photo-crosslinkable Hydrogel for Microbial Immobilization (미생물 고정화를 위한 광경화성 하이드로겔의 합성과 특성)

  • Kim, Cho Woong;Lee, Jung Bock;Kim, Du Hyun;Hwang, Jung Min;Cho, Chong Su;Choi, Young Hoon;Chung, Dae-Won
    • Applied Chemistry for Engineering
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    • v.10 no.6
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    • pp.852-856
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    • 1999
  • The objective of this study was to prepare hydrogel beads which were useful microbial immobilization to remove nitrogen and phosphorous in the industrial wastewater. Two different polyols(PEG, PTMG) terminated with photo-crosslinkable methacrylate groups were synthesized. Structures of the prepolymers and the UV cured hydrogels were characterized by using $^1H$-NMR and FT-IR spectroscopy. Water content, mechanical strength and pore sizes of the hydrogels having different MW of polyols and different ratios of PEG/PTMG were investigated. Hydrogels prepared from PEG(MW1000) only or the mixture of PEG(MW1000) and PTMG(MW2900) with 7:3 by weight were considered as potential candidates for the matrix for the immobilization of microorganism.

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광도파로용 광경화성 폴리머의 UV 레이저를 이용한 직접모화

  • Kang, Hee-Sin;Seo, Jung;Lee, Jehoon;Kim, Jung-O
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.05a
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    • pp.238-238
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    • 2004
  • 폴리머는 20세기 중반부터 그 사용량이 급격히 늘어나고 있고 또한 사용범위도 매우 광범위해진 중요한 재료이다. 석유화학공업의 발달과 더불어 초기의 고분자공업은 범용수지의 생산에 주로 의존하였으나 최근에는 용도가 다양해지고 기능화 되면서 소량, 고가의 기능성 고분자재료들이 많이 나타나고 있다.(중략)

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