An Optimization of Tungsten Plug Chemical Mechanical Polishing(CMP) using the Different Sets of Slurry and Pad (슬러리와 패드변화에 따른 텅스텐 플러그 CMP 공정의 최적화)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.13 no.7
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- pp.568-574
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- 2000